Fan-out electronic device
    4.
    发明授权

    公开(公告)号:US11410875B2

    公开(公告)日:2022-08-09

    申请号:US16225875

    申请日:2018-12-19

    Abstract: An electronic device (100) includes a substrate (110) and an integrated circuit (120) provided on the substrate (110) having a surface facing away from the substrate (110). An insulating layer (150) extends over the substrate (110) and around the integrated circuit (120) to define an interface (154) between the insulating layer (150) and the integrated circuit (120). An electrically conductive via (130) is provided on the surface of the integrated circuit (120). An insulating material (140) extends over the via (130) and includes an opening (142) exposing a portion of the via (130). A repassivation member (162) extends over the insulating layer (150) and has a surface (164) aligned with the interface (154). An electrically conductive redistribution member (181) is electrically connected to the via (130) and extends over the repassivation member (162) into contact with the insulating layer (150).

    BUMP BOND STRUCTURE FOR ENHANCED ELECTROMIGRATION PERFORMANCE

    公开(公告)号:US20200035633A1

    公开(公告)日:2020-01-30

    申请号:US16047888

    申请日:2018-07-27

    Abstract: A microelectronic device has a pillar connected to an external terminal by an intermetallic joint. Either the pillar or the external terminal, or both, include copper in direct contact with the intermetallic joint. The intermetallic joint includes at least 90 weight percent of at least one copper-tin intermetallic compound. The intermetallic joint is free of voids having a combined volume greater than 10 percent of a volume of the intermetallic joint; and free of a void having a volume greater than 5 percent of the volume of the intermetallic joint. The microelectronic device may be formed using solder which includes at least 93 weight percent tin, 0.5 weight percent to 5.0 weight percent silver, and 0.4 weight percent to 1.0 weight percent copper, to form a solder joint between the pillar and the external terminal, followed by thermal aging to convert the solder joint to the intermetallic joint.

    HYBRID QUAD FLAT PACKAGE ELECTRONIC DEVICE

    公开(公告)号:US20250140653A1

    公开(公告)日:2025-05-01

    申请号:US18494027

    申请日:2023-10-25

    Abstract: An electronic device includes opposite first and second sides, opposite third and fourth sides spaced apart along a first direction, and opposite fifth and sixth sides spaced apart along a second direction orthogonal to the first direction, the first and second sides being spaced apart along a third direction orthogonal to the first and second directions. The electronic device includes a molded package, first leads exposed outside the molded package along the first side, and the first leads extending outward from the molded package along a respective one of the third and fourth sides, and second leads exposed outside the molded package along the first side, the second leads having a lateral side exposed outside the molded package along a respective one of the fifth and sixth sides, and the lateral side of the individual second leads being flush with a respective side of the molded package.

    Bump bond structure for enhanced electromigration performance

    公开(公告)号:US11450638B2

    公开(公告)日:2022-09-20

    申请号:US17009648

    申请日:2020-09-01

    Abstract: A microelectronic device has a pillar connected to an external terminal by an intermetallic joint. Either the pillar or the external terminal, or both, include copper in direct contact with the intermetallic joint. The intermetallic joint includes at least 90 weight percent of at least one copper-tin intermetallic compound. The intermetallic joint is free of voids having a combined volume greater than 10 percent of a volume of the intermetallic joint; and free of a void having a volume greater than 5 percent of the volume of the intermetallic joint. The microelectronic device may be formed using solder which includes at least 93 weight percent tin, 0.5 weight percent to 5.0 weight percent silver, and 0.4 weight percent to 1.0 weight percent copper, to form a solder joint between the pillar and the external terminal, followed by thermal aging to convert the solder joint to the intermetallic joint.

    Bump bond structure for enhanced electromigration performance

    公开(公告)号:US10763231B2

    公开(公告)日:2020-09-01

    申请号:US16047888

    申请日:2018-07-27

    Abstract: A microelectronic device has a pillar connected to an external terminal by an intermetallic joint. Either the pillar or the external terminal, or both, include copper in direct contact with the intermetallic joint. The intermetallic joint includes at least 90 weight percent of at least one copper-tin intermetallic compound. The intermetallic joint is free of voids having a combined volume greater than 10 percent of a volume of the intermetallic joint; and free of a void having a volume greater than 5 percent of the volume of the intermetallic joint. The microelectronic device may be formed using solder which includes at least 93 weight percent tin, 0.5 weight percent to 5.0 weight percent silver, and 0.4 weight percent to 1.0 weight percent copper, to form a solder joint between the pillar and the external terminal, followed by thermal aging to convert the solder joint to the intermetallic joint.

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