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公开(公告)号：DE69223233D1
公开(公告)日：1998-01-02
申请号：DE69223233
申请日：1992-08-12
Applicant: TORAY INDUSTRIES
Inventor： TSUKAMOTO JUN , ICHIJO CHIKARA , IMAZU EMI
Abstract: This invention relates to a double-layer resist characterized by comprising a thin film whose principal constituent is a conjugated system polymer and resist, wherein a thin film excellent in shading capability, anti-reflection property, and uniformity is provided and, thus, a radiation-sensitive double-layer resist to create fine resist patterns stable in workability can be provided.
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公开(公告)号：DE69223233T2
公开(公告)日：1998-04-16
申请号：DE69223233
申请日：1992-08-12
Applicant: TORAY INDUSTRIES
Inventor： TSUKAMOTO JUN , ICHIJO CHIKARA , IMAZU EMI
Abstract: This invention relates to a double-layer resist characterized by comprising a thin film whose principal constituent is a conjugated system polymer and resist, wherein a thin film excellent in shading capability, anti-reflection property, and uniformity is provided and, thus, a radiation-sensitive double-layer resist to create fine resist patterns stable in workability can be provided.
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公开(公告)号：JPH0637011A
公开(公告)日：1994-02-10
申请号：JP18531592
申请日：1992-07-13
Applicant: TORAY INDUSTRIES
Inventor： TSUKAMOTO JUN , ICHIJO TSUTOMU , IMAZU EMI
IPC: H01L21/205 , H01L21/027
Abstract: PURPOSE:To suppress the reflection of radiation from a substrate, and to facilitate processing processes by forming a area where a catalyst is vaporized and the catalyst thus vaporized is adsorbed to the surface of the substrate and the area where the substrate adsorbing the catalyst is brought into contact with a monomer gas to produce a polymer thin film over the surface of the substrate. CONSTITUTION:A silicon wafer is carried to a load chamber 'b', and is transferred to a reaction chamber 1 (c). Triethylamine that is vaporized by subjecting a nitrogen gas to bubbling is introduced into the reaction chamber 1 (c), and a catalyst is adsorbed to the surface of a substrate. The substrate is then transferred to a reaction chamber 2 (d). A nitrogen gas bubbling cyanoacetylene gas is introduced into the reaction chamber 2 (d), and a cyanoacetylene polymer thin film is formed on the substrate. The substrate is then transferred to a heat processing chamber 'e' via a carrying chamber 'a', and is subjected to heat processing. The substrate that has undergone the heat processing is then transferred to an unload chamber 'f' via the carrying chamber 'a', and the substrate on which a desired polymer thin film is formed is unloaded.
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公开(公告)号：JPH03221129A
公开(公告)日：1991-09-30
申请号：JP1663890
申请日：1990-01-26
Applicant: TORAY INDUSTRIES
Inventor： FUSAOKA YOSHINARI , IMAZU EMI , FUJII YOSHINARI
IPC: B01D71/44
Abstract: PURPOSE:To improve permselectivity of organic substances and given high durability and film-formability by forming a separation membrane using a hydrophobic polymer containing a low molecular weight organic substance and a host molecule which forms a host-guest complex with the low molecular weight organic substance. CONSTITUTION:The surface of a solid or a support is coated with a blend solution of a low molecular weight organic substance, a host molecule which forms a host-guest complex with the low molecular weight organic substance, and a hydrophobic polymer in a prescribed thickness. Then, after the solvent is vaporized, the solvent is replaced with a coagulating solvent to form a separation membrane. As the host molecule, a molecule having a formula I (R1 stands for phenyl, dimethylphenyl, methylchlorophenyl, isopropyl; R2 stands for hydrogen, methyl) is preferable. As the hydrophobic polymer, cross-linked polysiloxianes, substituted acetylene polymers, vinyl polymers, etc., are preferable.
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Patent Agency Ranking
公开(公告)号：JPH06116305A
公开(公告)日：1994-04-26
申请号：JP26889692
申请日：1992-10-07
Applicant: TORAY INDUSTRIES
Inventor： IMAZU EMI , TSUKAMOTO JUN
Abstract: PURPOSE:To obtain a thin film suitable as a double-layer resist for forming a desired pattern by contacting a substrate with a compound having tertiary amino group and contacting with a reactive monomer to effect the polymerization of the monomer. CONSTITUTION:A substrate (e.g. silicon or an indium compound) is placed in a reaction vessel and made to contact with (A) a compound having tertiary amino group and having a boiling point of >=110 deg.C under normal pressure in gaseous or liquid state. The substrate is then made to contact with (B) a reactive monomer, preferably a substituted acetylene compound, especially preferably cyanoacetylene in vapor phase to effect the polymerization of the monomer and obtain the objective thin film suitable as the lower layer film of a resist having a double-layer structure. This thin film is effective in suppressing the reflection, etc., of radiation and suitable for forming a desired pattern by micro- processing in the production of semiconductor device.
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公开(公告)号：JPH0669121A
公开(公告)日：1994-03-11
申请号：JP21770192
申请日：1992-08-17
Applicant: TORAY INDUSTRIES
Inventor： TSUKAMOTO JUN , ICHIJO TSUTOMU , IMAZU EMI
IPC: H01L21/027
Abstract: PURPOSE:To restrict dimensional deviation of a resist pattern due to reflection on pulverized basic material by gasifying a catalyst and adsorbing the gasified catalyst onto the surface of a basic material while furthermore bringing the gasified catalyst into contact with monomer gas thereby forming a thin polymer film on the surface of the basic material onto which the catalyst is adsorbed. CONSTITUTION:A silicon wafer is placed in a reactor filled with nitrogen gas under normal pressure and then catalyst, i.e., triethylamine gas, is introduced while bubbling with the nitrogen gas into the reactor. On the other hand, a basic material is placed in another reactor into which monomer gas, i.e., cyanoacetylene, is introduced with nitrogen gas as carrier gas. When it is left as it is, vapor-phase polymerization of cyanoacetylene takes place on the basic material and a thin film of cyanoacetylene polymer excellent in step coverage is formed on the silicon wafer. The basic material is then placed in an oven of nitrogen gas atmosphere and heat treated for 30min. Consequently, a cyanoacetylene polymer thin film is formed and used as a lower layer resist.
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公开(公告)号：JPH06242614A
公开(公告)日：1994-09-02
申请号：JP2545693
申请日：1993-02-15
Applicant: TORAY INDUSTRIES
Inventor： ICHIJO TSUTOMU , TSUKAMOTO JUN , IMAZU EMI
IPC: G03F7/11 , G03F7/26 , H01L21/027
Abstract: PURPOSE:To avert the problem due to reflection from a substrate by consisting the two-layer-structural photoresist of a thin film contg. a polymer having a specific structural unit and a photoresist. CONSTITUTION:The two-layer-structural photoresist consisting of the thin film contg. the polymer and the photoresist contains the polymer having at least the structural units expressed by formula I and formula II. The structure expressed by the formula I is the basic skeleton of a cyanoacetylene polymer. Its antireflection performance is further enhanced by having the structure of the formula II. These structural units are used preferably in terms of the antireflection effect if the value obtd. by dividing the number of the structural units of the formula I by the number of the structural units of the formula II is specified to 0.1 to 10. The ratio of the respective structures of the formula I and the formula II are known from the intensity relating to the 1S electron orbit of nitrogen atom and the intensity distribution relating to the 1S electron orbit of carbon atom by using, for example, an X-ray electron spectroscopy.
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公开(公告)号：JPH02222715A
公开(公告)日：1990-09-05
申请号：JP4170289
申请日：1989-02-23
Applicant: TORAY INDUSTRIES
Inventor： FUSAOKA YOSHINARI , IMAZU EMI , FUJII YOSHINARI
Abstract: PURPOSE:To obtain a practical membrane having superior separating performance, especially a high velocity of permeation by specifying the density of substd. acetylene polymer grains in both surface layers and the inner layer of a membrane so that the membrane is made asymmetric. CONSTITUTION:When a membrane contg. substd. acetylene polymer grains is formed, the density (A) of the grains in one of both surface layers of the membrane is regulated to 250-15,000 grains/10 m , the density (B) of the grains in the inner layer to 0.6-0.9A and the density (C) of the grains in the other to 0.05-0.5A. The structure and fine structure of the membrane are controlled as mentioned above to make the membrane asymmetric and a membrane having superior permeability, especially a high velocity of permeation is obtd. This membrane has high practicality in separation and concentration of a liq. and/or gas.
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公开(公告)号：JPH07296793A
公开(公告)日：1995-11-10
申请号：JP8323094
申请日：1994-04-21
Applicant: TORAY INDUSTRIES
Inventor： TSUKAMOTO JUN , IMAZU EMI
Abstract: PURPOSE:To provide a high performance secondary battery minimized in initial capacity loss by dipping carbon fibers in a solution of a specified charge-transfer type complex to form an electrode for secondary battery, and using this electrode to form a secondary battery. CONSTITUTION:Carbon fibers are subjected to dipping treatment with a solution of a charge-transfer type complex consisting of lithium and a condensed polycyclic aromatic compound such as naphthalene. After this treatment, the carbon fibers subjected to delithiumnizing treatment are formed into an electrode for secondary battery, and this electrode is sued to form a secondary battery. Thus, a high performance electrode for secondary battery and secondary battery capable of reducing the initial capacity loss can be provided.
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