公开(公告)号：JP2002060927A

公开(公告)日：2002-02-28

申请号：JP2000242531

申请日：2000-08-10

Applicant: TORAY INDUSTRIES

Inventor： NAKAGAWARA HISAYA ,  OGAWA MASAYUKI

IPC: C23C14/04 ,  C23C16/04

Abstract: PROBLEM TO BE SOLVED: To provide a mask for thin film pattern deposition with which an excellent color filter where a desired thin film pattern is deposited particularly on a multiple printing color filter can be obtained. SOLUTION: In addition to the primary pattern openings in the mask for thin film pattern deposition, dummy openings are further provided to their peripheries. Moreover, the occupancy of the dummy openings in the mask ranges from 2 to 20%.

公开(公告)号：JPS62174367A

公开(公告)日：1987-07-31

申请号：JP1573186

申请日：1986-01-29

Applicant: TORAY INDUSTRIES

Inventor： ABE KAZUHIKO ,  OGAWA MASAYUKI ,  KIMURA MASATAMI

IPC: C23C14/22 ,  C23C14/00

Abstract: PURPOSE:To easily shorten the time required to start the operation of a large- sized high vacuum apparatus ad to easily reduce the amount of a gas charged during the operation by placing a louver type variable resistance means in the exhaust path of the apparatus so as to enable the variable control of the exhaust resistance of the exhaust path. CONSTITUTION:This high vacuum apparatus is composed essentially of a vacuum vessel 1, a high vacuum pump 3 and a variable resistance means placed in an exhaust path 2 connecting the vessel 1 to the pump 3. The variable resistance means is a variable louver device 12 having a shutter whose degree of opening can be varied in steps and the exhaust resistance of the exhaust path 2 is variably regulated with the device 12. The vacuum vessel 1 is kept at a high degree of vacuum while an inert gas is charged into the vessel 1 through a feed pipe 19.

公开(公告)号：JPS5271254A

公开(公告)日：1977-06-14

申请号：JP14685875

申请日：1975-12-11

Applicant: TORAY INDUSTRIES

Inventor： HAYASHI KENJI ,  OGAWA MASAYUKI ,  OOTAKI TOSHIHIRO ,  SOUYAMA TAKEO

IPC: G02B26/02 ,  G02F1/01 ,  G03B7/18

公开(公告)号：JPS5219295A

公开(公告)日：1977-02-14

申请号：JP9469775

申请日：1975-08-05

Applicant: TORAY INDUSTRIES

Inventor： SOUYAMA TAKEO ,  HAYASHI KENJI ,  OGAWA MASAYUKI ,  TANIMURA MASAMITSU ,  ADACHI KOUICHI

IPC: H01B5/14 ,  G09F9/00 ,  G09F9/30 ,  H01B1/00 ,  H01B5/00

Abstract: PURPOSE:A high quality highly transparent conductive vilm capable of satisfying both transparency and electroconductivity.

公开(公告)号：JP2004012846A

公开(公告)日：2004-01-15

申请号：JP2002166715

申请日：2002-06-07

Applicant: TORAY INDUSTRIES

Inventor： OKAMURA MASANORI ,  OGAWA MASAYUKI ,  KOBAYASHI YASUSHI

IPC: G02B5/20 ,  C23C14/08 ,  C23C14/34 ,  G02B1/10 ,  G02B1/16 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a color filter which is formed with a transparent conductive film on the back and does not degrade the resistance value of the transparent conductive film even after heating of a substrate in an ensuing step. SOLUTION: The color filter has at least a colored layer on the transparent substrate and is formed with the transparent conductive film on the surface on the side not formed with the colored layer of the transparent substrate. The grain size of the transparent conductive film is ≤300 nm. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2002030434A

公开(公告)日：2002-01-31

申请号：JP2000218521

申请日：2000-07-19

Applicant: TORAY INDUSTRIES

Inventor： OKAMURA MASANORI ,  OGAWA MASAYUKI ,  OKAMOTO TORU

IPC: G02B5/20 ,  C23C14/50 ,  G02F1/1343 ,  H01B13/00

Abstract: PROBLEM TO BE SOLVED: To provide a film deposition system, by which combined use of masks different in thickness can be facilitated while preventing the deformation of the masks due to thermal expansion. SOLUTION: In the deposition system for a transparent conductive film, the use of masks of arbitrary thickness can be facilitated by providing a spacer 5 between a mask 2 and a main plate 1, in a method for selectively depositing a transparent conductive film on the prescribed part alone of a color pattern 3 by using the mask 2.

公开(公告)号：JPH10152776A

公开(公告)日：1998-06-09

申请号：JP31055196

申请日：1996-11-21

Applicant: TORAY INDUSTRIES

Inventor： HATANAKA KUNIHIRO ,  GOTO TETSUYA ,  OGAWA MASAYUKI

IPC: C23C14/50

Abstract: PROBLEM TO BE SOLVED: To provide a support for a substrate and a supporting method of the substrate by which holding and transportation of a mask, transfer and positioning thereof to and on a glass substrate can be simply and surely executed, handling property is excellent in detaching the mask, folding can be prevented from occurring and a color pattern of an glass substrate is not hurt and further ITO of a edge part of the mask is keen-edged to generates no blotting and shadow. SOLUTION: The support for the substrate is provided with a plate 1 on which opening parts are formed, the substrate 3 on which the color pattern is formed and the mask 2 made of a magnetic material on which opening parts are formed so as to oppose to a region where the color pattern is formed. The substrate 3 is fixed between the plate 1 and the mask 2. In this case, the plate 1 is provided with a permanent magnet 9 and electromagnets 8A, 8B capable of changing magnetic force and a magnetic pole.

公开(公告)号：JPS62185873A

公开(公告)日：1987-08-14

申请号：JP2574386

申请日：1986-02-10

Applicant: TORAY INDUSTRIES

Inventor： ABE KAZUHIKO ,  OGAWA MASAYUKI

IPC: H01L21/285 ,  C23C14/35 ,  C23C14/36 ,  H01L21/203

Abstract: PURPOSE:To obtain a film of a uniform thickness by sputtering by extending a circular magnetic field region formed over the surface of a target on both sides of a base material in the lateral direction so as to make the amount of metallic particles flying from the target uniform over the whole region of the base material. CONSTITUTION:A target 28 is placed opposite to a base material 22 traveling in a vacuum vessel 21. Magnets 34, 35 having different polarities are arranged on the rear side of the target 28 so that a circular magnetic field region 75 is formed between the magnets 34, 35. At this time, the area of each of parts of the region 75 on both sides of the base material 22 in the lateral direction is made larger than the area of the remaining part.

公开(公告)号：JPS60150508A

公开(公告)日：1985-08-08

申请号：JP757684

申请日：1984-01-18

Applicant: NISSHA PRINTING ,  TORAY INDUSTRIES

Inventor： HATAKEYAMA HIROSHI ,  OGAWA MASAYUKI ,  MATSUMURA KOUZOU ,  NAKAGAWA EIJI

IPC: H01B5/14 ,  G02F1/1333 ,  G09F9/30 ,  H01B13/00 ,  H01H1/06 ,  H01H11/04 ,  H01L31/0224 ,  H01L31/0392 ,  H01L31/18 ,  H05B33/20 ,  H05K3/04

公开(公告)号：JPS5590954A

公开(公告)日：1980-07-10

申请号：JP16180278

申请日：1978-12-29

Applicant: TORAY INDUSTRIES

Inventor： OOSHIMA KATSUNORI ,  OGAWA MASAYUKI

IPC: G03G5/07

Abstract: PURPOSE:To produce well-balanced, long-length photoreceptor being inexpensive, pollution-free, and high in durability, transparency and sensitivity, by using a compound material of polymer containing p-phenylene sulfide unit by 70mol% or more and sensitizer in a photoconductive layer. CONSTITUTION:After orienting biaxially, preferably, a polymer film containing p-phenylene sulfide unit shown in the formula by 70mol% or more, a sensitizer (trinitrofluolenone or the like) is evaporated. A conductive layer such as palladium is formed thereon by sputtering or other method to produce a electrophotographic material. The sensitizer may be blended in the polymer film, or laminated by coating. Thus, by using a polymer excelling in transparency and mechanical and thermal durability, electrophotographic photosensitive master, electrophotographic microfilms, etc. may be manufactured easily and at low cost.