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公开(公告)号：JP2011153903A
公开(公告)日：2011-08-11
申请号：JP2010015406
申请日：2010-01-27
Applicant: Toshiba Corp , 株式会社東芝
Inventor： FUJII TAKAYOSHI , KONNO YUSAKU , OKADA NAOTADA , SHIOZAWA KAZUNORI , HASHIMOTO SUSUMU , INOUE HIROSHI , FUJIWARA TAKESHI , OKUDA KENTARO , KITAMI HIDEYUKI
Abstract: PROBLEM TO BE SOLVED: To provide a pattern inspection device and a pattern inspection method capable of detecting finer defects and at a higher speed.
SOLUTION: The pattern inspection device includes an X-ray source for generating an X-ray; a narrowing means for narrowing an X-ray emitted from the X-ray source into a point-shaped parallel light to irradiate a sample therewith; a mask for blocking direct light of the X-ray transmitted through the sample, and diffracted light of the X-ray diffracted by a pattern formed on the sample; a two-dimensional detector for detecting a two-dimensional pattern of the X-ray which is not blocked by the mask; a difference calculation means for calculating the difference of each two-dimensional pattern, acquired respectively by irradiating two corresponding spots of the sample with the point-shaped X-ray; and a determination means for determining the existence of a defect based on the difference.
COPYRIGHT: (C)2011,JPO&INPITAbstract translation: 要解决的问题：提供能够检测更细的缺陷和更高速度的图案检查装置和图案检查方法。 解决方案：图案检查装置包括用于产生X射线的X射线源; 用于使从X射线源发射的X射线变窄为点状平行光以使样本照射的变窄装置; 用于阻挡通过样品透射的X射线的直射光的掩模和由形成在样品上的图案衍射的X射线的衍射光; 用于检测未被掩模阻挡的X射线的二维图案的二维检测器; 差分计算装置，用于通过用点状X射线照射样品的两个相应斑点来计算分别获得的每个二维图案的差异; 以及确定装置，用于基于该差异来确定缺陷的存在。 版权所有（C）2011，JPO＆INPIT
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2.发明专利
公开(公告)号：JP2010223838A
公开(公告)日：2010-10-07
申请号：JP2009072944
申请日：2009-03-24
Applicant: TOSHIBA CORP
Inventor： SAWA EIJI , OKUDA KENTARO , FUJIWARA TAKESHI
IPC: G01B11/24
Abstract: PROBLEM TO BE SOLVED: To provide a pattern inspection apparatus for improving the inspection accuracy for inspecting a pattern, a pattern inspection method and a manufacturing method of a microstructure. SOLUTION: The pattern inspection apparatus for inspecting the pattern by comparing a reference data regarding the pattern formed in a to-be-inspected object with a detection data obtained by detecting the pattern is provided which includes: a correcting/processing section for dividing the pattern into a plurality of areas, obtaining correction conditions in a plurality of the areas or between a plurality of the areas, applying the corresponding correction conditions at least in a plurality of the area or between a plurality of the areas, and creating the reference data. COPYRIGHT: (C)2011,JPO&INPIT
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3.发明专利
公开(公告)号：JP2004070249A
公开(公告)日：2004-03-04
申请号：JP2002233254
申请日：2002-08-09
Applicant: Toshiba Corp , 株式会社東芝
Inventor： OKUDA KENTARO , FUJIWARA TAKESHI
Abstract: PROBLEM TO BE SOLVED: To provide an illumination apparatus and a phase plate to uniformly illuminate the object for inspection with laser light, and to provide an inspection apparatus, an inspection method and a method for manufacturing a mask by using the illumination apparatus and the phase plate. SOLUTION: A rotating plate 2 rotating at a specified rotation with the output side face tilted from the optical axis is disposed in front of the laser light source 1 on the optical axis. A fixed phase plate 3 is disposed in front of the rotation plate 2, and further a condenser lens 5 is disposed in front of the fixed phase plate 3. COPYRIGHT: (C)2004,JPO
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4.发明专利
公开(公告)号：JP2003101003A
公开(公告)日：2003-04-04
申请号：JP2001297417
申请日：2001-09-27
Applicant: TOSHIBA CORP
Inventor： INOUE HIROSHI , NOMURA TAKEHIKO , FUJIWARA TAKESHI
IPC: G01N21/956 , G02B21/36 , G03F1/84 , H01L27/14 , H01L31/0232 , H04N5/335 , H04N5/372 , G03F1/08
Abstract: PROBLEM TO BE SOLVED: To provide a photoelectric sensor, from which the influence of interference fringe is removed, and to provide a pattern-inspecting device using the sensor, a microscope and the manufacturing method of a mask. SOLUTION: The face facing the light-receiving face 2 of the light-receiving element 1 of protection glass 3 is disposed obliquely with respect to the light- receiving face 2.
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公开(公告)号：JP2000206329A
公开(公告)日：2000-07-28
申请号：JP544899
申请日：1999-01-12
Applicant: TOSHIBA CORP
Inventor： FUJIWARA TAKESHI
Abstract: PROBLEM TO BE SOLVED: To execute phase quantity measurement highly precisely by securing the intensity of illumination light sufficiently without receiving the influence of a speckle noise by a laser. SOLUTION: A slit plate 40 having a lengthened slit length in the vertical direction to the shearing direction is installed on a detector 28. A laser beam of DUV is separated into two linear polarized light having lanes of polarization perpendicular to each other and irradiated on a phase shift mask 9. The two linear polarized light passing through the phase shift mask 9 are synthesized to thereby generate interference light, and the interference light is made to pass through the rectangular slit plate 40, and the phase quantity of a phase shifter 9b is measured based on the intensity of the interference light passing through the slit plate 40.
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Patent Agency Ranking
公开(公告)号：JPH1078648A
公开(公告)日：1998-03-24
申请号：JP23427096
申请日：1996-09-04
Applicant: TOSHIBA CORP
Inventor： FUJIWARA TAKESHI , OHASHI KATSUKI , ONO AKIRA
Abstract: PROBLEM TO BE SOLVED: To measure the phase amt. of a phase shifter with high accuracy without influenced by speckles and to improve the reliability. SOLUTION: UV laser beam emitted from a UV laser light source 10 is transmitted through a diffusion plate 30 which rotates around the optical axis of the UV laser beam, and the beam enters an illumination optical system 12. The beam is divided into two beams of linearly polarized beam having polarizing planes perpendicular to each other by the illumination optical system 12 to irradiate a phase shift mask 3. The two linearly polarized light beams transmitted through the phase shift mask 3 are overlapped by a detection optical system 20 to interfere with each other. The phase amt. of the phase shifter 2 of the phase shift mask 3 is determined based on the interference.
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公开(公告)号：JPH1062682A
公开(公告)日：1998-03-06
申请号：JP21370596
申请日：1996-08-13
Applicant: TOSHIBA CORP
Inventor： OHASHI KATSUKI , FUJIWARA TAKESHI
Abstract: PROBLEM TO BE SOLVED: To simply sense focusing condition even with a specimen having no pattern without lowering the S/N of a image of specimen. SOLUTION: A beam of light for observation is passed through a transverse lattice plate 27 and an vertical lattice plate 28, reflected by an aperture mirror 20, and cast onto a semiconductor glass mask 1, and the reflected image from the glass mask 1 is reflected again by the mirror 20 and put incident to an image take-in sensor 31, and the focusing condition of the image of the mask 1 with respect to another image take-in sensor 11 is sensed on the basis of the contrasts at this time of the transverse lattice striation and vertical lattice striation.
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公开(公告)号：JPH0894338A
公开(公告)日：1996-04-12
申请号：JP22988294
申请日：1994-09-26
Applicant: TOSHIBA CORP
Inventor： FUJIWARA TAKESHI , SASAKI KENJI , ONO AKIRA
IPC: G01B11/30 , G01M11/00 , G01N21/88 , G01N21/956 , G03F1/84 , H01L21/027 , G03F1/08
Abstract: PURPOSE: To inspect a mask used for the exposure treatment of a short wavelength. CONSTITUTION: Excimer laser beams with the same short wavelength as that of exposure light are applied to a mask 20 by a lighting optical system for inspection which is set to the same numerical aperture as the lighting optical system of an exposure device and pattern light through the mask 20 is projected by an observation optical system for inspection set to the same number of openings as the projection system of the exposure device for observing the image, thus applying light with a short wavelength, for example excimer laser beams with the wavelength of DUV (248-nm) and VUV (193nm), to the mask 20 and inspecting the fine mask 20.
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公开(公告)号：JPH06168671A
公开(公告)日：1994-06-14
申请号：JP31916892
申请日：1992-11-30
Applicant: TOSHIBA CORP , TOSHIBA ELECTRONIC ENG
Inventor： OHAMA SHINJI , FUJIWARA TAKESHI , FUKUOKA AKIRA
Abstract: PURPOSE:To prevent color fluctuation by reducing vibration of a mask body caused by external vibration. CONSTITUTION:In a color image receiving tube, plural tongue piece parts 37 are formed in a notch shape in a skirt part formed in the peripheral part of a mask body 31 of a shadow mask 30, and a mask frame 32 is fixed to the mask body through these tongue piece parts, and assuming that plate thickness of these tongue piece parts is (t) [mm], and a distance from the notch end to a fixing part to the mask frame is 1 [mm], and narrowest part width is (w) [mm], and the total number of the tongue piece parts is N, and mask body weight is (m) [kg], the whole tongue piece parts are formed in the relationship of an expression.
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公开(公告)号：JPH05114367A
公开(公告)日：1993-05-07
申请号：JP27591891
申请日：1991-10-24
Applicant: TOSHIBA CORP
Inventor： OHAMA SHINJI , FUKUDA KUMIO , FUJIWARA TAKESHI
IPC: H01J29/07
Abstract: PURPOSE:To restrain the vibration of a mask frame from being transferred to a mask main body to prevent colors from being incorrectly positioned by forming an external raised part in the skirt part of the mask main body in opposition to the external raised part of a mask frame. CONSTITUTION:The tip of the skirt part of a shadow mask main body 31 located in opposition to a fluorescent screen 3 inside a panel 1 is bent outwardly to form an external raised part 35. The raised part 35 is provided in opposition to an external raised part 39. This constitution increases the flexural strength and spring coefficient of the skirt part of a mask main body 31 and the sidewall part of a mask frame 32 and restrains the torsional vibration of the mask frame 31 as well as the transfer of the amplitude of the mask frame 31 to the mask main body to provide a color picture tube which rarely causes colors to be incorrectly positioned.
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