Abstract:
A coated metal-substrate disk for magnetic-recording applications is disclosed having a first coating selected from the group consisting of nitrides, carbides, or borides of titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, or tungsten, or the group consisting of aluminum nitride, silicon nitride, or silicon carbide on the metal substrate and a magnetic-recording material coating on the first coating. The first coatings are applied by evaporative reactive ion plating or by reactive sputtering.
Abstract:
Disclosed is a sputtering apparatus and method for deposition of a thin film on a substrate with means for exciting a plasma by ultrahigh radio frequency or microwave at the electron cyclotron resonance to create a region of plasma which is devoid of magnetic field and at least one high-radio frequency planar disk diode positioned within the region devoid of magnetic field, a target attached to said rf planar diode, and a high-radio frequency substrate biasing electrode parallel to the planar diode.
Abstract:
A magnetic-recording disk (100) comprising a metal substrate disk having a textured annular first surface area (103) with an outer diameter which is substantially less than the diameter of the metal substrate is disclosed herein. The metal substrate disk further has a smooth annular second surface area (104) between the first surface area's outer diameter and the metal substrate's circumferential edge. The textured annular first surface area (103) has a laser-etched circular pattern. Furthermore the metal disk substrate of an aluminum alloy, a titanium alloy, or an austenitic stainless steel has a thin-film coating selected from the group consisting of nitrides, carbides, or borides of titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum or tungsten.