公开(公告)号：US09799541B1

公开(公告)日：2017-10-24

申请号：US14576054

申请日：2014-12-18

Applicant: TruTag Technologies, Inc.

Inventor： Tam Kim ,  Craig Leidholm

IPC: C25D11/32 ,  C25D17/08 ,  C25D21/04 ,  C25F3/12 ,  C25F7/00 ,  H01L21/673 ,  H01L21/3063 ,  H01L21/67 ,  H01L21/306 ,  C25D17/06 ,  C25D17/00 ,  C25D11/00

CPC classification number: H01L21/67086 ,  C25D11/005 ,  C25D11/022 ,  C25D11/32 ,  C25D17/004 ,  C25D17/008 ,  C25D17/06 ,  C25D17/08 ,  C25D21/04 ,  C25D21/10 ,  C25F3/12 ,  C25F7/00 ,  H01L21/30604

Abstract: An etcher comprises a bath, a plurality of blades, and a tunnel. The bath includes a first electrode at a first end and a second electrode at a second end. The plurality of blades is configured to fit in the bath. At least one blade of the plurality of blades holds a wafer. At least one tunnel is configured to fit between adjacent blades of the plurality of blades in the bath.

公开(公告)号：US20180005853A1

公开(公告)日：2018-01-04

申请号：US15707688

申请日：2017-09-18

Applicant: TruTag Technologies, Inc.

Inventor： Tam Kim ,  Craig Leidholm

IPC: H01L21/67 ,  C25F7/00 ,  C25F3/12 ,  C25D17/08 ,  C25D11/00 ,  C25D17/06 ,  C25D17/00 ,  C25D11/32 ,  H01L21/306 ,  C25D21/04

CPC classification number: H01L21/67086 ,  C25D11/005 ,  C25D11/022 ,  C25D11/32 ,  C25D17/004 ,  C25D17/008 ,  C25D17/06 ,  C25D17/08 ,  C25D21/04 ,  C25D21/10 ,  C25F3/12 ,  C25F7/00 ,  H01L21/30604

Abstract: An etcher comprises a bath, a plurality of blades, and a tunnel. The bath includes a first electrode at a first end and a second electrode at a second end. The plurality of blades is configured to fit in the bath. At least one blade of the plurality of blades holds a wafer. At least one tunnel is configured to fit between adjacent blades of the plurality of blades in the bath.