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公开(公告)号：CA2045917A1
公开(公告)日：1991-12-30
申请号：CA2045917
申请日：1991-06-28
Inventor： BASSETT, DAVID R. , AMSTUTZ, GARY A.
IPC: G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
Abstract: A positive photoresist composition containing (i) a quinone diazide polymer formed by reacting a cresol-formaldehyde novolac resin and an o-quinonediazide compound, and (ii) a sulfonamide development enhancement agent.
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