中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

14 records (took 0.024 seconds)

    Autodeposition coating composition containing a self-crosslinkable polymer
    4.
    发明公开
    Autodeposition coating composition containing a self-crosslinkable polymer 失效
    Selbstvernetzbares Polymer enthaltende，selbsttätigabscheidbareÜberzugszusammensetzung。

    公开(公告)号：EP0050235A1

    公开(公告)日：1982-04-28

    申请号：EP81107694.2

    申请日：1981-09-28

    Applicant: UNION CARBIDE CORPORATION

    Inventor： Bassett, David Robinson ,  Wang, Alan Enkuang

    IPC: C09D5/02 ,  C09D3/727 ,  B05D7/16

    CPC classification number: C09D125/14 ,  B05D7/142 ,  C09D5/088

    Abstract: Autodeposition coating compositions containing a polymer which is comprised of from 1 to 30 weight percent of N-(alkoxymethyl) acrylamide will crosslink upon curing. The resulting coating exhibits improved block resistance and solvent resistance over heretofore availalble autodeposition coatings.

    Abstract translation: 含有1〜30重量％N-（烷氧基甲基）丙烯酰胺的聚合物的自动沉积涂料组合物在固化时将交联。 所得到的涂层比以前可用的自沉积涂层显示出改进的抗粘连性和耐溶剂性。

    Process for the preparation of (2,2)-paracyclophane
    5.
    发明公开
    Process for the preparation of (2,2)-paracyclophane 失效
    Verfahren zur Herstellung von（2,2）-Paracyclophan。

    公开(公告)号：EP0294651A1

    公开(公告)日：1988-12-14

    申请号：EP88108340.6

    申请日：1988-05-25

    Applicant: UNION CARBIDE CORPORATION

    Inventor： Lee, Chinsoo ,  Bassett, David Robinson

    IPC: C07C13/70 ,  C07C1/32

    CPC classification number: C07C1/323 ,  C07C2603/92 ,  C07C13/70

    Abstract: An improved process is provided for the preparation of the dimer, 2,2-paracyclophane, which is useful as the starting material for parylene conformal coatings used in the electronics industry for the protection of various sensitive electronic components.
    The process comprises optimization of the normally low yield of dimer formed by the Hofmann elimination reaction of p-methylbenzyltrimethyl­ammonium halide by conducting the elimination reaction in the presence of dimethylsulfoxide and certain reaction promoters.

    Abstract translation: 提供了一种用于制备二聚体2,2-双环戊烷的改进方法，其可用作电子工业中用于保护各种敏感电子部件的聚对二甲苯保形涂层的起始材料。 该方法包括通过在二甲基亚砜和某些反应促进剂的存在下进行消除反应来优化通过对甲基苄基三甲基卤化铵的霍夫曼消除反应形成的二聚体的通常低产率。

    Process for the preparation of dichloro-[2,2] paracyclophane
    6.
    发明公开
    Process for the preparation of dichloro-[2,2] paracyclophane 失效
    Verfahren zur Herstellung von Dichlor [2,2] paracyclophan。

    公开(公告)号：EP0291889A1

    公开(公告)日：1988-11-23

    申请号：EP88107766.3

    申请日：1988-05-13

    Applicant: UNION CARBIDE CORPORATION

    Inventor： Lee, Chinsoo ,  Bassett, David Robinson

    IPC: C07C17/26 ,  C07C25/22 ,  C07C211/62

    CPC classification number: C07C17/263 ,  C07C25/22

    Abstract: A process is provided for the preparation of the dimer, dichloro-[2,2]paracyclophane, which is useful as the starting material for the deposition of conformal parylene coatings employed, for example, in the electronics industry for the protection of various sensitive electronic components.
    The process avoids the normally low yields of chlorinated dimer formed by the chlorination of 2,2-­paracycophane and instead utilizes the Hofmann elimination of 2(3)-chloro-p-methylbenzyltrimethyl­ammonium hydroxide by conducting the elimination reaction under carefully controlled conditions of reaction temperature and profile, reaction feed configuration, water concentration in the reactor and the use of a cosolvent, certain reaction promoters, or a combination thereof.

    Abstract translation: 提供了一种制备二聚体，二氯 - [2,2]对二环戊烷的方法，其可用作沉积用于保护各种敏感电子学的电子工业中的保形聚对二甲苯涂层的起始材料 组件。 该方法避免了通过2,2-二十四烷酸氯化生成的氯代二聚体的通常低产率，而是通过在仔细控制的反应温度条件下进行消除反应，利用2（3） - 氯对甲基苄基三甲基氢氧化铵的Hofmann消除 和反应进料构型，反应器中的水浓度和共溶剂的使用，某些反应促进剂或其组合。

    Process for the preparation of 2,2-paracyclophane
    10.
    发明公开
    Process for the preparation of 2,2-paracyclophane 失效
    Verfahren zur Herstellung von [2,2] Paracyclophan。

    公开(公告)号：EP0299164A1

    公开(公告)日：1989-01-18

    申请号：EP88107439.7

    申请日：1988-05-09

    Applicant: UNION CARBIDE CORPORATION

    Inventor： Lee, Chinsoo ,  Bassett, David Robinson

    IPC: C07C13/70 ,  C07C1/32

    CPC classification number: C07C1/323 ,  C07C2603/92 ,  C07C13/70

    Abstract: An improved process is provided for the preparation of the dimer, 2,2-paracyclophane, which is useful as the starting material for parylene conformal coatings used in the electronics industry for the protection of various sensitive electronic components.
    The process comprises optimization of the normally low yield of dimer formed by the Hofmann elimination reaction of p-methylbenzyltrimethyl­ammonium hydroxide by conducting the elimination reaction in the presence of a cosolvent and certain reaction promoters.

    Abstract translation: 提供了一种用于制备二聚体2,2-双环戊烷的改进方法，其可用作电子工业中用于保护各种敏感电子部件的聚对二甲苯保形涂层的起始材料。 该方法包括通过在共溶剂和某些反应促进剂的存在下进行消除反应来优化通过对甲基苄基三甲基氢氧化铵的霍夫曼消除反应形成的二聚体的通常低产率。

Patent Agency Ranking