公开(公告)号：JP2002203846A

公开(公告)日：2002-07-19

申请号：JP2000383735

申请日：2000-12-18

Applicant: UNITED MICROELECTRONICS CORP

Inventor： FAN JUN-SHUN ,  FAMU JUN-MIN ,  CHUN KIN-CHOAN ,  U SHON-CHU

IPC: C23C16/44 ,  H01L21/31

Abstract: PROBLEM TO BE SOLVED: To provide a gas treatment system having an efficient washing and an improved working process. SOLUTION: The joining device 88 of a heating furnace processing gas treatment system joins a semiconductor processing gas discharge conduit with a wet type washing system. The joining device 88 is provided with the first end of a tapering upper part connected to the gas discharge conduit, and a rigid circular casing a second end connected to the wet type washing system. A connector 92 is provided with the second end side wall of the lower end of the casing, and connected to the detachable porous nozzle 96 of the inside of the casing through an L-shaped connection pipe 94. The nozzle 96 is advanced from the connector 92, liquid is sprayed on the inner wall of the casing, mixed with processing gas, and the mixture is converted into a water phase for collection.