公开(公告)号：JP2002055438A

公开(公告)日：2002-02-20

申请号：JP2000228578

申请日：2000-07-28

Applicant: UNITED MICROELECTRONICS CORP

Inventor： RIU EN-CHOAN ,  PON CHAO-RIN ,  LEE TAI-YUAN

IPC: G03F1/00 ,  G03F1/40 ,  H01L21/027 ,  G03F1/14

Abstract: PROBLEM TO BE SOLVED: To provide a discharge protection function by which static charges are discharged into air through discharge peaks by a neutralization discharge reaction to a photomask so as to avoid damage by the neutralization discharge reaction to thin circuit edges of a circuit pattern on the photomask. SOLUTION: The photomask comprises a transparent substrate, a patterned shield layer disposed on a prescribed region of the surface of the substrate and an electrostatic discharge(ESD) protection layer disposed on the surface of the substrate. The ESD protection layer encloses the shield layer and comprises plural discharge peaks used for discharging static electricity into air so as to eliminate electric charges from the photomask.