公开(公告)号：JP2000214573A

公开(公告)日：2000-08-04

申请号：JP937999

申请日：1999-01-18

Applicant: UNITED MICROELECTRONICS CORP

Inventor： RIN SHIMIN

IPC: H01L21/302 ,  G03F1/76 ,  G03F1/78 ,  H01L21/027 ,  G03F1/08

Abstract: PROBLEM TO BE SOLVED: To simultaneously manufacture patterns on both sides of a photomask by installing two sets of pattern forming devices for each on both sides of a masking plate. SOLUTION: A both-side photomask production system consists of a first particle source, a second particle source, a first focusing assembly 200a, a second focusing assembly 200b and a mechanical stage. The mechanical stage is used to mount a masking plate 240 and to move a substrate 242 to a prescribed position. The first and second particle sources are the electron beams generated by an electron gun. The first focusing assembly 200a and the second focusing assembly 200b act simultaneously to respectively converge the two electronic beams onto photoresist layers 248a and 248b. Then, the patterns on the photoresist layers 248a and 248b are transferred to antireflection layers 246a and 246b and masking layers 244a and 244b, by which the both-side photomask are formed.