公开(公告)号：JP2001053225A

公开(公告)日：2001-02-23

申请号：JP22179399

申请日：1999-08-04

Applicant: UNITED MICROELECTRONICS CORP

Inventor： SHU JUNBOKU

IPC: H01L21/822 ,  H01L27/04

Abstract: PROBLEM TO BE SOLVED: To manufacture an inductor element on a substrate in which loss is easy to produce, to effectively lower an induced substrate current and to reduce the loss of the substrate by forming depletion regions between the first conductivity injected region and the second conductivity injected region and a lower region along the second conductivity injected region. SOLUTION: A spiral conductive film 14 is formed on the first conductivity substrate 10. The second conductivity injected regions 24 are formed on the substrate 10 and at positions adjacent to a surface. The first conductivity injected region 22 surrounding the second conductivity injected regions 24 and being not brought into contact directly with the second conductivity injected regions 24 at a regular interval to the second conductivity injected regions 24 is formed. The first conductivity injected region 22 and the second conductivity injected regions 24 are connected electrically, and positive bias is applied to the second conductivity injected regions 24. A depletion region 20 is formed between the first conductivity injected region 22 and the second conductivity injected region 24 and in a lower region along the second conductivity injected region 24.