公开(公告)号：AT127862T

公开(公告)日：1995-09-15

申请号：AT92922951

申请日：1992-10-28

Applicant: UNITED TECHNOLOGIES CORP

Inventor： BREWE SUSAN ,  DEAN ROBERT W ,  JAWOROWSKI MARK R ,  LORETTE TIMOTHY J ,  PACKER LOUIS L ,  ZAVODJANCIK JOHN P

IPC: C25D5/02 ,  C23G1/14 ,  C23G5/00 ,  C23G5/02 ,  H05K3/18 ,  H05K3/26 ,  C23G5/024 ,  C09D9/00 ,  C10G73/00

Abstract: The method involves removing wax from a substrate using a non-chlorinated solvent process. The substrate is dipped in a hot wax bath or heated in an oven to remove substantially all of the wax. The substrate is then submerged in either a single or a series of hot mineral oil baths to remove any remaining wax. The oil is then removed by a semi-aqueous or light organic cleaner. The semi-aqueous cleaner is subsequently removed in an alkaline-base cleaner bath. Following the alkaline-base cleaner is a cleansing with a rinsing solution preferably a countercurrent series of rinses. Finally, the substrate is dried.

公开(公告)号：ES2078065T3

公开(公告)日：1995-12-01

申请号：ES92922951

申请日：1992-10-28

Applicant: UNITED TECHNOLOGIES CORP

Inventor： BREWE SUSAN ,  DEAN ROBERT W ,  JAWOROWSKI MARK R ,  LORETTE TIMOTHY J ,  PACKER LOUIS L ,  ZAVODJANCIK JOHN P

IPC: C25D5/02 ,  C23G1/14 ,  C23G5/00 ,  C23G5/02 ,  H05K3/18 ,  H05K3/26 ,  C23G5/024 ,  C09D9/00 ,  C10G73/00

Abstract: The method involves removing wax from a substrate using a non-chlorinated solvent process. The substrate is dipped in a hot wax bath or heated in an oven to remove substantially all of the wax. The substrate is then submerged in either a single or a series of hot mineral oil baths to remove any remaining wax. The oil is then removed by a semi-aqueous or light organic cleaner. The semi-aqueous cleaner is subsequently removed in an alkaline-base cleaner bath. Following the alkaline-base cleaner is a cleansing with a rinsing solution preferably a countercurrent series of rinses. Finally, the substrate is dried.