SPUTTERING TARGET FABRICATION METHOD

    公开(公告)号:CA1112015A

    公开(公告)日:1981-11-10

    申请号:CA316466

    申请日:1978-11-20

    Abstract: SPUTTERING TARGET FABRICATION METHOD A method for producing a cooled sputtering target assembly is described. The resultant target is also described. The material to be sputtered is provided in the form of powder which is hot isostatically pressed in a toroidal metallic container under conditions which promote compaction and bonding of the powder particles to form a fully dense material. The container is then partially removed from the target material except for a remnant around the outer surface. A cooling jacket is then fabricated and attached to the remnant of the container.

    SPUTTERING TARGET FABRICATION METHOD

    公开(公告)号:AU4217578A

    公开(公告)日:1979-06-28

    申请号:AU4217578

    申请日:1978-12-04

    Abstract: A method for producing a cooled sputtering target assembly is described. The resultant target is also described. The material to be sputtered is provided in the form of powder which is hot isostatically pressed in a toroidal metallic container under conditions which promote compaction and bonding of the powder particles to form a fully dense material. The container is then partially removed from the target material except for a remnant around the outer surface. A cooling jacket is then fabricated and attached to the remnant of the container.

Patent Agency Ranking