Abstract:
PROBLEM TO BE SOLVED: To provide parts comprising a silicon-containing substrate having a barrier layer to prevent formation of gaseous species of Si when exposed to a high temperature aqueous environment. SOLUTION: The barrier layer for the silicon-containing substrate to prevent formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises aluminosilicate of group IIA and/or group IIIB such as barium - strontium aluminosilicate and an oxide of group VB. COPYRIGHT: (C)2003,JPO
Abstract:
A method for producing ceramic articles having a complex geometry. Temporary tooling is provided having cavities corresponding in shape to the desired ceramic article. The cavities are filled with a ceramic slurry which is solidified by freezing or gelation of a polymer. The ceramic is treated to remove the original liquid portion of the slurry and the temporary tooling is removed. The ceramic is then sintered. The ceramic article thus obtained may be used to investment cast a metal article.
Abstract:
A turbomachine includes a rotor hub that has a central opening there through. A shaft extends through the central opening. A clamp is coupled with the shaft and the rotor hub such that the rotor hub is rotatable with the shaft.
Abstract:
A method for producing ceramic articles having a complex geometry. Temporary tooling is provided having cavities corresponding in shape to the desired ceramic article. The cavities are filled with a ceramic slurry which is solidified by freezing or gelation of a polymer. The ceramic is treated to remove the original liquid portion of the slurry and the temporary tooling is removed. The ceramic is then sintered. The ceramic article thus obtained may be used to investment cast a metal article.
Abstract:
The present invention relates to a process for the deposition of protective coatings on complex shaped Si-based substrates which are used in articles and structures subjected to high temperature, aqueous environments comprises a non-line-of-sight process, particularly, electrophoretic deposition (EPD) process. The deposition process comprises steps of: providing a complex shaped Si-containing substrate; depositing an electrically conductive layer on the substrate; and depositing at least one barrier layer by electrophoretic deposition (EPD) as a protective coating.
Abstract:
An article comprises a silicon based substrate, a bond layer and a protective top layer. The top layer is selected from the group consisting of rare earth disilicates, yttrium disilicates, rare earth monosilicates, yttrium monosilicates, silica and mixtures thereof. The protective layer described above is used in combination with a bond layer provided between the protective layer and the silicon based substrate which functions as oxygen getter and includes an oxygen gettering agent. By oxygen gettering agent is meant a refractory metal oxide former which forms an oxide at operational condition of (high temperature and aqueous environment) having a melting point of greater than 1500 DEG C wherein the negative free energy of formation of the refractory metal oxide from the refractory metal is more than 100 Kcal/mole. Suitable oxygen gettering agents include silicon and other refractory metals. An oxygen gettering agent may also be added to the protective layer.
Abstract:
An article comprises a silicon based substrate, a bond layer and a protective top layer. The top layer is selected from the group consisting of rare earth disilicates, yttrium disilicates, rare earth monosilicates, yttrium monosilicates, silica and mixtures thereof. The protective layer described above is used in combination with a bond layer provided between the protective layer and the silicon based substrate which functions as oxygen getter and includes an oxygen gettering agent. By oxygen gettering agent is meant a refractory metal oxide former which forms an oxide at operational condition of (high temperature and aqueous environment) having a melting point of greater than 1500 DEG C wherein the negative free energy of formation of the refractory metal oxide from the refractory metal is more than 100 Kcal/mole. Suitable oxygen gettering agents include silicon and other refractory metals. An oxygen gettering agent may also be added to the protective layer.
Abstract:
An article comprises a silicon based substrate, a bond layer and a protective top layer. The top layer is selected from the group consisting of rare earth disilicates, yttrium disilicates, rare earth monosilicates, yttrium monosilicates, silica and mixtures thereof. The protective layer described above is used in combination with a bond layer provided between the protective layer and the silicon based substrate which functions as oxygen getter and includes an oxygen gettering agent. By oxygen gettering agent is meant a refractory metal oxide former which forms an oxide at operational condition of (high temperature and aqueous environment) having a melting point of greater than 1500 DEG C wherein the negative free energy of formation of the refractory metal oxide from the refractory metal is more than 100 Kcal/mole. Suitable oxygen gettering agents include silicon and other refractory metals. An oxygen gettering agent may also be added to the protective layer.
Abstract:
A heating unit (14) includes a flame holder (2) that has a plurality of randomly distributed pores and comprises at least about 50 wt % ceramic particles that have an emissivity of at least about 0.7. The heating unit (14) also has means for conveying a fuel/air mixture to the flame holder (2), means (18) for igniting the fuel/air mixture so it forms a flame in proximity to the flame holder, means (20) for transferring heat from the flame to a heat transfer medium, and means (26) for exhausting combustion products from the heating unit. A fuel/air mixture may be directed through the flame holder (2) and burned to form a flame in proximity to the flame holder such that the flame and flame holder interact to produce emissions of less than about 10 ng/J NOx.
Abstract:
A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises an aluminosilicate of Group IIA and/or Group IIIB and a Group VB oxide. In one preferred embodiment, the barrier layer comprises 25 to 75 wt.% of the Group VB oxide (Ta, Nb and mixtures thereof) with the balance being barium-strontium aluminosilicate.