公开(公告)号：NL2003819C

公开(公告)日：2011-12-28

申请号：NL2003819

申请日：2009-11-18

Applicant: USHIO ELECTRIC INC

Inventor： YAMATANI DAIKI

IPC: H05G2/00

CPC classification number: H05G2/001 ,  G01T1/00 ,  G03F7/70033 ,  G03F7/70133 ,  G03F7/70166 ,  G03F7/7085 ,  G21K1/06 ,  G21K2201/064 ,  H05G2/00

公开(公告)号：NL2003819C2

公开(公告)日：2011-12-28

申请号：NL2003819

申请日：2009-11-18

Applicant: USHIO ELECTRIC INC

Inventor： YAMATANI DAIKI

IPC: H05G2/00

Abstract: An extreme ultraviolet (EUV) light source to detect fluctuations in the angular distribution of its output radiation wherein a solid raw material is irradiated with a laser beam to generate a vapor. The vapor is subjected to an electrical arc generated between a pair of discharge electrodes to generate a high temperature plasma that emits EUV radiation. The EUV radiation is collected along an optical axis toward a focal point by a plurality of concentrically arranged reflectors. A plurality of EUV radiation detectors are arranged around a circular ring centering on the optical axis of the concentrically arranged reflectors. Each EUV radiation detector includes two spaced apart diaphragms with a pinhole. The pinholes are aligned with a virtual line connecting with the focal point. EUV radiation passing through the pinholes strikes a light detecting element in the detectors. The angular distribution fluctuation of the EUV radiation collected at the focal point is obtained based upon irradiance data provided by the light detectors.

公开(公告)号：NL2003819A

公开(公告)日：2010-05-21

申请号：NL2003819

申请日：2009-11-18

Applicant: USHIO ELECTRIC INC

Inventor： YAMATANI DAIKI

IPC: H05G2/00

Abstract: An extreme ultraviolet (EUV) light source to detect fluctuations in the angular distribution of its output radiation wherein a solid raw material is irradiated with a laser beam to generate a vapor. The vapor is subjected to an electrical arc generated between a pair of discharge electrodes to generate a high temperature plasma that emits EUV radiation. The EUV radiation is collected along an optical axis toward a focal point by a plurality of concentrically arranged reflectors. A plurality of EUV radiation detectors are arranged around a circular ring centering on the optical axis of the concentrically arranged reflectors. Each EUV radiation detector includes two spaced apart diaphragms with a pinhole. The pinholes are aligned with a virtual line connecting with the focal point. EUV radiation passing through the pinholes strikes a light detecting element in the detectors. The angular distribution fluctuation of the EUV radiation collected at the focal point is obtained based upon irradiance data provided by the light detectors.

公开(公告)号：JP2006351435A

公开(公告)日：2006-12-28

申请号：JP2005178230

申请日：2005-06-17

Applicant: USHIO ELECTRIC INC

Inventor： YAMATANI DAIKI ,  NIIMI KOTA

IPC: H05H1/24 ,  G21K5/08 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a plasma generating apparatus, wherein a worker can touch a gas inlet device in operation of the apparatus without being concerned regarding electric shocks, and the energy that should used for generation of a high-density and high-temperature plasma is not lost. SOLUTION: The plasma generating apparatus has a gas-introducing metal-made gas pipe 5, connected between the gas inlet device 2 and an annular discharge voltage impressing electrode 9, to introduce a discharge gas from the gas inlet device 2 into a vacuum vessel 13; and generates a high-density and high-temperature plasma of the discharge gas between the discharge voltage impressing electrode 9 and a grounding electrode 11, by impressing high-voltage pulses between the discharge voltage impressing electrode 9 and the grounding electrode 11 by a high-voltage pulse generator 7. An insulating pipe 6 is inserted in a part of the metal-made gas pipe 5, and the gas inlet device 2 is grounded. COPYRIGHT: (C)2007,JPO&INPIT