公开(公告)号：EP2367058A1

公开(公告)日：2011-09-21

申请号：EP10290142.8

申请日：2010-03-17

Applicant: Université Jean-Monnet

Inventor： Parriaux Olivier ,  Lyndin Nikolay ,  Tonchev Svetlen

IPC: G03F7/24 ,  G03F7/20 ,  G01D5/00

CPC classification number: G03F7/24 ,  G01D5/3473 ,  G03F7/201 ,  G03F7/703

Abstract: The present invention solves the stitching problem and the problem of a predetermine integer number of grating lines per closed circle of a cylindrical grating by resorting to a novel phase mask method which proposes to geometrically transform and to optically transfer a standard planar radial grating pattern (1) into a cylindrical photoresist pattern (9) at the circularly cylindrical wall (7) of a given element (3). The planar radial grating pattern can be easily written with an integer number of lines having strictly constant period without any stitching problem by means of the available tools of planar technologies such as a laser or electron beam generator and reactive ion etching. The photolithographic transfer is made by illumination means (19) which permit the needed geometrical transformation from a planar radial grating to a circularly cylindrical grating, in particular by providing a cylindrical wave having a non-zero axial component and the same central axis (A) as said circularly cylindrical wall or a spherical wave (B) with its center on this central axis.

Abstract translation: 本发明通过采用一种新颖的相位掩模方法解决了拼接问题和圆柱形光栅每个闭环预定整数光栅线的问题，该方法提出了几何变换和光学传输标准平面辐射光栅图案（1 ）到给定元件（3）的圆柱形壁（7）处的圆柱形光致抗蚀剂图案（9）。 通过诸如激光或电子束发生器和反应离子蚀刻的平面技术的可用工具，可以容易地用整数数目的具有严格恒定周期的行编写平面径向光栅图案，而无任何缝合问题。 光刻传输由照明装置（19）制成，其允许从平面径向光栅到圆柱形光栅的必要几何变换，特别是通过提供具有非零轴向分量和相同中心轴线（A）的圆柱波， 作为所述圆柱形壁或其中心在该中心轴上的球面波（B）。