公开(公告)号：US20160290937A1

公开(公告)日：2016-10-06

申请号：US15035420

申请日：2014-01-22

Applicant: UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA

Inventor： Yalin Lu ,  Yangchao Tian ,  Kun Gao ,  Gang Liu ,  Zhili Wang

IPC: G01N23/04 ,  A61B6/00

CPC classification number: G01N23/04 ,  A61B6/4035 ,  A61B6/4291 ,  A61B6/484 ,  G01N23/20075

Abstract: A hard X-ray grating phase-contrast imaging apparatus with large field-of-view, high contrast and low dose and the method thereof. The apparatus includes a source emitter (31), a source grating (G0), a beam splitting grating (G1), an analyzer grating (G2) and a detector (32) arranged in sequence on a transmission path of the source emitter (31). The beam splitting grating (G1) has a period of 30 to 50 μm and a depth to width ratio not greater than 20. The apparatus can provide a high image contrast and a low radiation dose and realize a phase-contrast imaging with high energy and a large field-of-view by increasing the grating period, increasing a duty cycle of the beam splitting grating while increasing the distance between an object and the analyzer grating. The apparatus can also utilize the conventional polychromatic X-ray sources and available process for manufacturing gratings, and be suitable for clinical use.

Abstract translation: 具有大视野，高对比度和低剂量的硬X射线光栅相位对比成像装置及其方法。 该装置包括源极发射器（31），源极光栅（G0），分束光栅（G1），分析器光栅（G2）和检测器（32），其依次排列在源极发射极（31）的传输路径上 ）。 分束光栅（G1）的周期为30〜50μm，深宽比不大于20.该装置可以提供高的图像对比度和低的辐射剂量，并实现高能量的相位对比成像 通过增加光栅周期来获得较大的视野，增加了分束光栅的占空比，同时增加了物体与分析器光栅之间的距离。 该设备还可以利用传统的多色X射线源和用于制造光栅的可用工艺，并且适用于临床应用。

公开(公告)号：US10436722B2

公开(公告)日：2019-10-08

申请号：US15311879

申请日：2014-05-22

Applicant: University Of Science And Technology Of China

Inventor： Kun Gao ,  Jian Chen ,  Renfang Hu ,  Zhili Wang ,  Dajiang Wang ,  Zhiyun Pan ,  Wangsheng Chu ,  Shiqiang Wei

IPC: G02B27/00 ,  G01N23/083 ,  G02B5/18 ,  B05D1/00 ,  C23F1/00 ,  G21K1/06 ,  G02B27/44 ,  G21K7/00

Abstract: The invention provides a positive/negative phase shift bimetallic zone plate and production method thereof, wherein the positive/negative phase shift bimetallic zone plate comprises: a first metallic material having a positive phase shift; a second metallic material having a negative phase shift at a working energy point; wherein the first metallic material and the second metallic material are alternately arranged, so that the second metallic material replaces the blank portion in a cycle of a traditional zone plate.

公开(公告)号：US20170082560A1

公开(公告)日：2017-03-23

申请号：US15311879

申请日：2014-05-22

Applicant: University of Science And Technology of China

Inventor： Kun Gao ,  Jian Chen ,  Renfang Hu ,  Zhili Wang ,  Dajiang Wang ,  Zhiyun Pan ,  Wangsheng Chu ,  Shiqiang Wei

IPC: G01N23/083 ,  B05D1/00 ,  C23F1/00 ,  G21K1/06 ,  G21K7/00

CPC classification number: G01N23/083 ,  B05D1/005 ,  C23F1/00 ,  G02B5/18 ,  G02B27/44 ,  G21K1/06 ,  G21K1/067 ,  G21K7/00

Abstract: The invention provides a positive/negative phase shift bimetallic zone plate and production method thereof, wherein the positive/negative phase shift bimetallic zone plate comprises: a first metallic material having a positive phase shift; a second metallic material having a negative phase shift at a working energy point; wherein the first metallic material and the second metallic material are alternately arranged, so that the second metallic material replaces the blank portion in a cycle of a traditional zone plate.