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公开(公告)号：CA2865562C
公开(公告)日：2021-01-12
申请号：CA2865562
申请日：2012-12-18
Applicant: VALSPAR SOURCING INC
Inventor： DECKER OWEN H , ROGOZINSKI JEFFREY D , BREITZMAN ROBERT D , CONCHA CARLOS A
Abstract: Methods and systems for coating metal substrates are provided. The methods and systems include sequential application of low flow and high flow powder coatings followed by a single simultaneous cure. The methods and systems include a marker that allows coating uniformity to be monitored and assessed during application. The described methods provide coatings with optimal surface smoothness and edge coverage.
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