公开(公告)号：IN7159DEN2014A

公开(公告)日：2015-04-24

申请号：IN7159DEN2014

申请日：2014-08-26

Applicant: VALSPAR SOURCING INC

Inventor： DECKER OWEN ,  ROGOZINSKI JEFFREY ,  BREITZMAN ROBERT ,  CONCHA CARLOS

IPC: C23C24/00 ,  C23C28/00

Abstract: Methods and systems for coating metal substrates are provided. The methods and systems include sequential application of low flow and high flow powder coatings followed by a single simultaneous cure. The methods and systems include a marker that allows coating uniformity to be monitored and assessed during application. The described methods provide coatings with optimal surface smoothness and edge coverage.

公开(公告)号：CA2865562A1

公开(公告)日：2013-09-26

申请号：CA2865562

申请日：2012-12-18

Applicant: VALSPAR SOURCING INC

Inventor： DECKER OWEN ,  ROGOZINSKI JEFFREY ,  BREITZMAN ROBERT ,  CONCHA CARLOS

IPC: C23C24/00 ,  C23C28/00

Abstract: Methods and systems for coating metal substrates are provided. The methods and systems include sequential application of low flow and high flow powder coatings followed by a single simultaneous cure. The methods and systems include a marker that allows coating uniformity to be monitored and assessed during application. The described methods provide coatings with optimal surface smoothness and edge coverage.

公开(公告)号：CO7160017A2

公开(公告)日：2015-01-15

申请号：CO14210154

申请日：2014-09-23

Applicant: VALSPAR SOURCING INC

Inventor： DECKER OWEN ,  ROGOZINSKI JEFFREY ,  BREITZMAN ROBERT ,  CONCHA CARLOS

IPC: C23C24/00

Abstract: Se proporciona métodos y sistemas para el revestimiento de sustratos metálicos. Los métodos y sistemas incluyen aplicación secuencial de revestimientos en polvo de flujo bajo y flujo alto seguidos por un curado único y simultáneo. Los métodos y sistemas incluyen un marcador que permite uniformidad de revestimiento para monitorearse y evaluarse durante la aplicación. Los métodos descritos proporcionan revestimientos con lisura de superficie y cobertura de bordes óptimas.

公开(公告)号：EP2828418A4

公开(公告)日：2016-06-01

申请号：EP12871787

申请日：2012-12-18

Applicant: VALSPAR SOURCING INC

Inventor： DECKER OWEN ,  ROGOZINSKI JEFFREY ,  BREITZMAN ROBERT ,  CONCHA CARLOS

IPC: C23C24/10 ,  C23C30/00

CPC classification number: C09D5/03 ,  C23C24/10 ,  C23C30/00 ,  Y10T428/31678

Abstract: Methods and systems for coating metal substrates are provided. The methods and systems include sequential application of low flow and high flow powder coatings followed by a single heating step to provide a cured coating. The methods and systems include a marker that allows coating uniformity to be monitored and assessed during application. The described methods provide coatings with optimal surface smoothness and edge coverage.