UNDERWATER COMMUNICATION DEVICE AND UNDERWATER COMMUNICATION METHOD

    公开(公告)号:US20220014279A1

    公开(公告)日:2022-01-13

    申请号:US17272597

    申请日:2019-08-30

    Abstract: The invention is to provide an underwater communication device and an underwater communication method that can be applied to mobile communication in water. An underwater communication device 10 includes: a transmitter 12 configured to transmit an electric signal; and a receiver 14 arranged away from the transmitter 12 via water and configured to receive the electric signal, in which the receiver 14 includes an field effect transistor 23 having a channel region 39 provided at a position in contact with the water, and a drive circuit 26 configured to generate a potential difference between a source region 31 and a drain region 33 of the field effect transistor 23.

    Method for treating surface of diamond thin film, method for forming transistor, and sensor device
    3.
    发明授权
    Method for treating surface of diamond thin film, method for forming transistor, and sensor device 有权
    金刚石薄膜表面处理方法,晶体管形成方法及传感器装置

    公开(公告)号:US09373506B2

    公开(公告)日:2016-06-21

    申请号:US14467153

    申请日:2014-08-25

    Abstract: A method for treating a surface of a diamond thin film according to one aspect of the present invention performs one of a first substitution process for substituting part of hydrogen-terminals of a diamond thin film with fluorine-terminals in the absence of a fluorocarbon deposition on the surface of diamond thin film and a second substitution process for substituting part of hydrogen-terminals of a diamond thin film with fluorine-terminals in the presence of the fluorocarbon deposition on the surface of diamond thin film based on required surface properties of the diamond thin film.

    Abstract translation: 根据本发明的一个方面的用于处理金刚石薄膜的表面的方法,在不存在碳氟化合物沉积的情况下进行用氟端子取代金刚石薄膜的一部分氢端子的第一取代过程 基于金刚石薄片的所需表面性质,在金刚石薄膜的表面上,在金刚石薄膜的表面上,在金刚石薄膜的表面上存在金刚石薄膜的表面和第二取代过程,用于在氟碳沉积的存在下用氟端子取代金刚石薄膜的一部分氢端子 电影。

    DIAMOND FIELD EFFECT TRANSISTOR AND METHOD FOR PRODUCING SAME

    公开(公告)号:US20230136477A1

    公开(公告)日:2023-05-04

    申请号:US17910325

    申请日:2021-02-17

    Abstract: Provided are a diamond field effect transistor using a silicon oxide film as a gate insulating film including a silicon-terminated layer containing C—Si bonds in order to reduce an interface state density, and a method for producing the same. A FET 100A includes a silicon oxide film 3A formed on a surface of a non-doped diamond layer 2A, a non-doped diamond layer 4A formed on a surface of the non-doped diamond layer 2A using the silicon oxide film 3A as a mask, a silicon-terminated layer 5A formed at an interface between the non-doped diamond layer 2A and the silicon oxide film 3A and at an interface between the non-doped diamond layer 4A and the silicon oxide film 3A, and a gate electrode 12A formed on the silicon oxide film 3A. The FET 100A operates using the silicon oxide film 3A and an insulating film 10A formed on the silicon oxide film 3A as a gate insulating film 11A and using the non-doped diamond layer 4A as each of a source region and a drain region.

Patent Agency Ranking