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公开(公告)号：ZA949086B
公开(公告)日：1996-08-16
申请号：ZA949086
申请日：1994-11-16
Applicant: WESTAIM TECHNOLOGIES INC
Inventor： BURRELL ROBERT EDWARD , MORRIS LARRY ROY , APTE PRASAD SHRIKRISHNA , SANT SUDHINDRA BHARAT , GILL KASHMIR SINGH
IPC: A01N20060101 , A01N59/00 , A01N59/16 , A61L20060101 , A61L27/00 , A61L31/00 , C01G20060101 , C04B37/00 , A01N , A61L , C01G
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公开(公告)号：PL314683A1
公开(公告)日：1996-09-16
申请号：PL31468394
申请日：1994-11-01
Applicant: WESTAIM TECHNOLOGIES INC
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公开(公告)号：GR3033632T3
公开(公告)日：2000-10-31
申请号：GR20000401319
申请日：2000-06-08
Applicant: WESTAIM TECHNOLOGIES INC
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公开(公告)号：IN183688B
公开(公告)日：2000-03-18
申请号：IN1650MA1997
申请日：1997-07-23
Applicant: WESTAIM TECHNOLOGIES INC
Inventor： BURRELL ROBERT EDWARD , APTE PRASAD SHRIKRISHNA , GILL KASHMIR SINGH , PRECHT RODERICK JOHN , MORRIS LARRY ROY , MCINTOSH CATHERINE LAURIE , SANT SUDHINDRA BHARAT
IPC: A61K33/00
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公开(公告)号：HUT75526A
公开(公告)日：1997-05-28
申请号：HU9601344
申请日：1994-11-01
Applicant: WESTAIM TECHNOLOGIES INC
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Patent Agency Ranking
公开(公告)号：ZA9409086B
公开(公告)日：1996-08-16
申请号：ZA9409086
申请日：1994-11-16
Applicant: WESTAIM TECHNOLOGIES INC
Inventor： BURRELL ROBERT EDWARD , MORRIS LARRY ROY , APTE PRASAD SHRIKRISHNA , SANT SUDHINDRA BHARAT , GILL KASHMIR SINGH
IPC: A01N20060101 , A01N59/00 , A01N59/16 , A61L20060101 , A61L27/00 , A61L31/00 , C01G20060101 , C04B37/00 , A01N , A61L , C01G
CPC classification number: A01N59/16 , A61B2018/00119
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公开(公告)号：HU9601344D0
公开(公告)日：1996-07-29
申请号：HU9601344
申请日：1994-11-01
Applicant: WESTAIM TECHNOLOGIES INC
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公开(公告)号：AT190195T
公开(公告)日：2000-03-15
申请号：AT94931472
申请日：1994-11-01
Applicant: WESTAIM TECHNOLOGIES INC
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公开(公告)号：NZ331330A
公开(公告)日：2000-02-28
申请号：NZ33133094
申请日：1994-11-01
Applicant: WESTAIM TECHNOLOGIES INC
Inventor： BURRELL ROBERT EDWARD , APTE PRASAD SHRIKRISHNA , GILL KASHMIR SINGH , PRECHT RODERICK JOHN , MORRIS LARRY ROY , MCINTOSH CATHERINE LAURIE , SANT SUDHINDRA BHARAT
IPC: A61L2/16 , A01N37/50 , A01N47/30 , A01N59/00 , A01N59/16 , A01N59/20 , A01N59/26 , A61L17/14 , A61L29/10 , C23C14/00 , C23C14/02 , C23C14/06 , C23C14/08 , C23C14/14 , C23C14/16 , C23C14/35 , C23C14/58
Abstract: A method of forming anti-microbial metal coatings, foils and powders which provide a sustained release of anti-microbial metal species when in contact with an alcohol or electrolyte. The method comprises creating atomic disorder in the material under conditions which limit diffusion such that sufficient atomic disorder is retained in the material to provide release of atoms, ions, molecules or clusters of at least one of the metals so providing a localized anti-microbial effect. Also claimed is a fine grain (less than 200nm) anti-microbial material comprising one or more anti-microbial metals selected from the group Ag, Au, Pt, Pd, Ir, Sn, Cu, Sb, Bi and Zn or alloys thereof, that is formed into a matrix with atoms or molecules of a different material selected from inert biocompatible metals (Ta, Ti, Nb, B, Hf, Zn, Mo, Si and Al), oxygen, nitrogen, hydrogen, boron, sulphur, oxides, nitrides, carbides, borides, sulphides and halides.
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公开(公告)号：NZ331329A
公开(公告)日：2000-02-28
申请号：NZ33132994
申请日：1994-11-01
Applicant: WESTAIM TECHNOLOGIES INC
Inventor： BURRELL ROBERT EDWARD , APTE PRASAD SHRIKRISHNA , GILL KASHMIR SINGH , PRECHT RODERICK JOHN , MORRIS LARRY ROY , MCINTOSH CATHERINE LAURIE , SANT SUDHINDRA BHARAT
IPC: A61L2/16 , A01N37/50 , A01N47/30 , A01N59/00 , A01N59/16 , A01N59/20 , A01N59/26 , A61L17/14 , A61L29/10 , C23C14/00 , C23C14/02 , C23C14/06 , C23C14/08 , C23C14/14 , C23C14/16 , C23C14/35 , C23C14/58
Abstract: Anti-microbial coatings and powders and method of forming same on medical devices are provides. The coatings are preferably formed by depositing an anti-microbial biocompatible metal by vapour deposition techniques to produce atomic disorder in the coating such that a sustained release of metal ions sufficient to produce an anti-microbial effect is achieved. Preferred deposition conditions to achieve atomic disorder include a lower than normal substrate temperature, and one or more of a higher than normal working gas pressure and a lower than normal angle of incidence of coating flux. Anti-microbial powders formed by vapour deposition or altered by mechanical working to produce atomic disorder are also provided. The anti-microbial effect of the coatings or powders may be further activated or enhanced by irradiating with a low linear energy transfer form of radiation such as gamma radiation. Novel anti-microbial silver materials are defined, characterized by having a positive rest potential, a Trec/Tm less than 0.33, and a grain size less than 200 nm. Anti-microbial fine grain or nanocrystalline materials are provided, together with methods of preparation, wherein the anti-microbial metal if deposited in a matrix with atoms or molecules of a different material such as other biocompatible metals (ex. Ta), trapped or absorbed oxygen, or compounds of anti-microbial metals or biocompatible metals (ex. Ag0 or TaO). The invention also extends to a method of producing an anti-microbial effect with silver materials that form complex silver ions other than Ag+, Ag2+ and Ag3+.
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