公开(公告)号：DE69320472D1

公开(公告)日：1998-09-24

申请号：DE69320472

申请日：1993-05-19

Applicant: WESTAIM TECHNOLOGIES INC

Inventor： BURRELL ROBERT ,  MORRIS LARRY

IPC: A61L31/00 ,  A01N59/16 ,  A61L17/14 ,  A61L27/30 ,  A61L27/54 ,  A61L29/10 ,  A61L29/16 ,  A61L31/02 ,  A61L31/16 ,  B22F1/02 ,  B22F9/04 ,  C22C5/06 ,  C22C45/00 ,  C23C14/00 ,  C23C14/02 ,  C23C14/06 ,  C23C14/08 ,  C23C14/14 ,  C23C14/16 ,  C23C14/20 ,  C23C14/22 ,  C23C14/35 ,  C23C14/58 ,  A61L29/00 ,  C22F1/00

Abstract: Anti-microbial coatings and method of forming same on medical devices are provided. The coatings are formed by depositing a biocompatible metal by vapor deposition techniques to produce atomic disorder in the coating such that a sustained release of metal ions sufficient to produce an anti-microbial effect is achieved. Preferred deposition conditions to achieve atomic disorder include a lower than normal substrate temperature, and one or more of a higher than normal working gas pressure and a lower than normal angle of incidence of coating flux. Anti-microbial powders formed by mechanical working to produce atomic disorder are also provided. The invention extends to other metal coatings and powders similarly formed so as to provide enhanced solubility.

公开(公告)号：DE69320472T2

公开(公告)日：1998-12-24

申请号：DE69320472

申请日：1993-05-19

Applicant: WESTAIM TECHNOLOGIES INC

Inventor： BURRELL ROBERT ,  MORRIS LARRY

IPC: A61L31/00 ,  A01N59/16 ,  A61L17/14 ,  A61L27/30 ,  A61L27/54 ,  A61L29/10 ,  A61L29/16 ,  A61L31/02 ,  A61L31/16 ,  B22F1/02 ,  B22F9/04 ,  C22C5/06 ,  C22C45/00 ,  C23C14/00 ,  C23C14/02 ,  C23C14/06 ,  C23C14/08 ,  C23C14/14 ,  C23C14/16 ,  C23C14/20 ,  C23C14/22 ,  C23C14/35 ,  C23C14/58 ,  A61L29/00 ,  C22F1/00

Abstract: Anti-microbial coatings and method of forming same on medical devices are provided. The coatings are formed by depositing a biocompatible metal by vapor deposition techniques to produce atomic disorder in the coating such that a sustained release of metal ions sufficient to produce an anti-microbial effect is achieved. Preferred deposition conditions to achieve atomic disorder include a lower than normal substrate temperature, and one or more of a higher than normal working gas pressure and a lower than normal angle of incidence of coating flux. Anti-microbial powders formed by mechanical working to produce atomic disorder are also provided. The invention extends to other metal coatings and powders similarly formed so as to provide enhanced solubility.