MEASUREMENT EQUIPMENT WITH OUTLIER FILTER
    1.
    发明申请
    MEASUREMENT EQUIPMENT WITH OUTLIER FILTER 审中-公开
    带过滤器的测量设备

    公开(公告)号:WO2018027214A1

    公开(公告)日:2018-02-08

    申请号:PCT/US2017/045720

    申请日:2017-08-07

    Abstract: A surface topography analysis invokes a sensor device for receiving a series of values from a sensor element of measurement equipment adapted to quantify an input stimuli into a surface height value, and computes consecutive curvatures from the received series of values. An aggregate value (sum) of the consecutive curvatures is compared to a threshold, and based on the comparison, the approach concludes that at least one of the consecutive curvatures corresponds to an outlier. The set of values are based on a signal that is continuous, although not necessarily differentiable, as received from the measurement equipment. Such measurement equipment embodying the sensor device may further comprise at least one of atomic probe microscopes, interferometric microscopes, confocal microscopes, scanning laser microscopes, profiling instruments, scanners, and CMMs.

    Abstract translation: 表面形貌分析调用传感器设备,用于接收来自测量设备的传感器元件的一系列值,该传感器元件适于将输入激励量化为表面高度值,并且从接收的一系列 值。 将连续曲率的总值(总和)与阈值进行比较,并且基于该比较,该方法推断连续曲率中的至少一个对应于异常值。 该组值是基于从测量设备接收到的连续信号,尽管不一定是可微分的。 体现传感器装置的这种测量设备还可以包括原子探针显微镜,干涉显微镜,共焦显微镜,扫描激光显微镜,成像仪器,扫描仪和CMM中的至少一个。

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