公开(公告)号：US20020022124A1

公开(公告)日：2002-02-21

申请号：US09946115

申请日：2001-09-04

Applicant: Washington University

Inventor： Rodney S. Ruoff

IPC: B32B003/00 ,  G03C001/76

CPC classification number: G03F7/00 ,  B81C99/008 ,  B81C2201/034 ,  C23C14/0005 ,  C23C14/042 ,  Y10T428/24372 ,  Y10T428/24802 ,  Y10T428/24893 ,  Y10T428/25 ,  Y10T428/252 ,  Y10T428/259 ,  Y10T428/2982

Abstract: Micron-sized particles are produced in quantity by one of various methods, including generally the steps of preparing a substrate surface through a lithographic process, the surface being characterized by defining a plurality of elements, depositing a layer of particle material on the substrate surface including the elements, processing the substrate surface to isolate the material deposited on the elements, and separating the particles from the elements. The size and shape of the elements predetermine the size and shape of the particles. The elements may comprise, inter alia, pillars of photoresist or spaces on the substrate surrounded and defined by photoresist.

Abstract translation: 通过各种方法之一量产生微米尺寸的颗粒，包括通常通过平版印刷工艺制备衬底表面的步骤，该表面的特征在于限定多个元件，在衬底表面上沉积颗粒材料层，包括 元件，处理衬底表面以分离沉积在元件上的材料，并将颗粒与元件分离。 元素的大小和形状预先决定了粒子的大小和形状。 这些元件尤其可以包括光致抗蚀剂的支柱或被光致抗蚀剂包围和限定的衬底上的空间。