公开(公告)号：US11887742B2

公开(公告)日：2024-01-30

申请号：US17579042

申请日：2022-01-19

Applicant: Worcester Polytechnic Institute

Inventor： Christopher J. Massar ,  Bryer C. Sousa ,  Danielle L. Cote

IPC: G21F1/02 ,  G21F1/10

CPC classification number: G21F1/026 ,  G21F1/106

Abstract: Radiation shield and methods for manufacturing a radiation shield are provided herein, the method includes identifying a substrate for the radiation shield; identifying at least one material for cold spraying on the substrate; applying by cold spray a coating of the at least one material on the substrate thereby obtaining a radiation shield. The radiation shield is lighter, thinner, and more efficient compared to conventional radiation shields.

公开(公告)号：US20220328206A1

公开(公告)日：2022-10-13

申请号：US17579042

申请日：2022-01-19

Applicant: Worcester Polytechnic Institute

Inventor： Christopher J. Massar ,  Derek G. Tsaknopoulos ,  Bryer C. Sousa ,  Kyle Tsaknopoulos ,  Danielle L. Cote

IPC: G21F1/02 ,  G21F1/10

Abstract: Radiation shield and methods for manufacturing a radiation shield are provided herein, the method includes identifying a substrate for the radiation shield; identifying at least one material for cold spraying on the substrate; applying by cold spray a coating of the at least one material on the substrate thereby obtaining a radiation shield. The radiation shield is lighter, thinner, and more efficient compared to conventional radiation shields.