凹版滚筒用铜镀敷方法及装置

    公开(公告)号:CN101184870A

    公开(公告)日:2008-05-21

    申请号:CN200680018346.8

    申请日:2006-05-23

    Abstract: 本发明提供无论凹版滚筒的尺寸大小,都能够在不产生麻点或凹坑等缺陷的情况下,在凹版滚筒的全长上实施均匀的厚度的铜镀敷,能够自动管理铜镀敷液的浓度,并且能够降低添加剂的消耗量,能够在短时间内进行镀敷处理,能够降低电力供给成本,视觉辨认性良好且容易操作的凹版滚筒用铜镀敷方法及装置。在长度方向的两端夹持中空圆筒状凹版滚筒,并将所述凹版滚筒收容在填满铜镀敷液的镀敷槽中,使所述凹版滚筒以规定速度旋转,并按照成为阴极的方式向所述凹版滚筒通电,并且使一对长条箱状阳极室保留规定间隔接近所述凹版滚筒的两侧面,向凹版滚筒的外周表面实施铜镀敷,所述阳极室是在所述镀敷槽内滑动自如地垂设于凹版滚筒的两侧,且内设有被通电为阳极的不溶性阳极。

    Method of forming uniform thin coatings on large substrates
    6.
    发明授权
    Method of forming uniform thin coatings on large substrates 失效
    在大基材上形成均匀薄涂层的方法

    公开(公告)号:US5853815A

    公开(公告)日:1998-12-29

    申请号:US922001

    申请日:1997-09-02

    CPC classification number: B41N3/032 C23C4/134 C23C4/137

    Abstract: A plasma system forms a dense, uniform coating of metallic oxide or other material on a relatively large substrate of metal foil or other composition located a substantial distance from the plasma gun so that the plasma stream covers the entire width of the substrate. A large pressure differential between the pressure inside the plasma gun and the ambient pressure outside of the plasma gun creates a shock pattern within the exiting plasma stream so as to disperse the plasma stream and maintain a high energy level therein, as well as thoroughly mixing a coating material introduced into the plasma stream within the gun. Mixing of the coating material within the plasma stream is further enhanced by introducing the coating material into the plasma stream either in liquid form or in the form of very small particles. In one arrangement, the plasma stream is delivered in a long, narrow configuration across the width of the substrate by a nozzle with a slit-like opening at the lower end of the plasma gun. In still other arrangements, a plasma stream of elongated configuration is provided by a plasma gun of elongated configuration having an elongated cathode assembly disposed within the hollow interior of an elongated anode having a nozzle-forming slot therein. Arc gas introduced into the space between the cathode and adjacent portions of the anode flows out of the slot to form a broad plume plasma stream, in conjunction with spray material introduced in powder form into the spaces between the cathode and the opposite portions of the anode along the length of the plasma gun. The cathode assembly may be of integral construction along the length of the anode, or it may be divided into plural segments disposed in spaced-apart relation along the length of the anode.

    Abstract translation: 等离子体系统在与等离子体枪相距很远的金属箔或其它组合物的相对较大的基底上形成致密均匀的金属氧化物或其它材料的涂层,使得等离子体流覆盖基底的整个宽度。 等离子体枪内部的压力与等离子体枪外部的环境压力之间的大的压力差在离开的等离子体流中产生冲击模式,从而分散等离子体流并在其中保持高的能量水平,以及彻底混合 将涂料引入枪内的等离子体流中。 通过将涂层材料以液体形式或以非常小的颗粒的形式引入等离子体流中,进一步提高了等离子体流中涂层材料的混合。 在一种布置中,等离子体流通过在等离子体枪的下端处具有狭缝状开口的喷嘴沿着基板的宽度以长而窄的结构输送。 在另外的布置中,细长结构的等离子体流由细长结构的等离子体枪提供,其具有设置在其中具有喷嘴形成槽的细长阳极的中空内部的细长阴极组件。 引入阴极和阳极相邻部分之间的空气中的电弧气体流出槽,以形成宽的羽流等离子流,结合以粉末形式引入阴极和阳极相对部分之间的空间的喷雾材料 沿等离子枪的长度。 阴极组件可以沿着阳极的长度为整体结构,或者可以沿着阳极的长度被分成以间隔开的关系设置的多个部分。

    Method of preparing support for lithographic printing plate
    7.
    发明授权
    Method of preparing support for lithographic printing plate 失效
    制备平版印刷版支撑剂的方法

    公开(公告)号:US5013399A

    公开(公告)日:1991-05-07

    申请号:US422312

    申请日:1989-10-16

    CPC classification number: B41N3/032 C23F1/02

    Abstract: A method of preparing a support for a lithographic printing plate is described, which comprises roughening the support surface by laser irradiation performed under the condition that the support is placed in a liquid or in a gaseous atmosphere, thereby achieving improved stain resistance upon printing and excellent printing press life.

    Abstract translation: 描述了制备平版印刷版支撑体的方法,该方法包括通过在将载体置于液体或气氛中的条件下进行的激光照射来粗糙化支撑表面,从而在印刷时获得改善的耐污染性 印刷机的使用寿命。

    METHOD OF TREATING A METAL SURFACE
    8.
    发明公开
    METHOD OF TREATING A METAL SURFACE 失效
    方法处理金属表面

    公开(公告)号:EP0723490A4

    公开(公告)日:1996-06-05

    申请号:EP94931828

    申请日:1994-10-07

    Abstract: Substantial surface areas can be treated by continuously magnetically moving an electric arc around a general loop direction such as a circle, ellipse or oval and moving the surface so that the arc treats a substantial surface area. The arc treatment can be used to clean or increase surface area, or both, and a reactant or treatment agent can be brought to the arc contact site to alter the surface treated with the arc. Auxiliary treatments for the surface can precede or follow the arc treatment, or both. The invention produces very desirable surface properties including a mild roughness or matte condition suitable even for critical applications such as aluminum lithoplate. Other surface characteristics can include one or more of: capillarity, adhesion, emissivity, stable oxide, paintability, and others. Applications and advantages are believed to include lithoplate, hydrophilic heat exchanger finstock, capacitor foil, can sheet, venetian blind stock, adhesive bonded laminates and other bonded structural materials or structures, welding rod, aluminum brazing sheet, interrogatable strips for optical control instruments, enhanced, high current contacts, improved, controlled or differential friction characteristics for forming and shaping, automotive and other sheet, hot roll bonding, galvanizing and zinc coating of steel, texturing mill rolls, pretreatment for thermal spray treatments, organic coating adhesion, improved paint hiding performance, prosthetics, biohost or catalyst support and others. The process is applicable to aluminum, steel and other metals and other materials capable of carrying current sufficiently to maintain an electric arc.

    COPPER PLATING METHOD AND APPARATUS FOR A GRAVURE CYLINDER
    9.
    发明申请
    COPPER PLATING METHOD AND APPARATUS FOR A GRAVURE CYLINDER 审中-公开
    铜镀层方法和设备

    公开(公告)号:US20090095633A1

    公开(公告)日:2009-04-16

    申请号:US11913257

    申请日:2006-05-23

    Abstract: The present invention provides a copper plating method and apparatus for a gravure cylinder in which copper plating with more uniform thickness can be provided over a full length of a gravure cylinder without causing defects such as rashes and pits irrespective of a size of the gravure cylinder, concentration of a copper plating solution can be managed automatically, a consumption amount of an additive is reduced to make it possible to perform a plating treatment within a short period of time, a power supply cost is reduced, and handling is easy with excellent visibility. A gravure cylinder in a hollow cylindrical shape is held at both ends in a longitudinal direction. The gravure cylinder is accommodated in a plating bath filled with a copper plating solution. The gravure cylinder is energized so that the gravure cylinder functions as a cathode while being rotated at a predetermined speed. A pair of anode chambers in a long box shape, in which insoluble anodes are provided upright slidably to both sides of the gravure cylinder in the plating bath and energized so as to function as an anode, are brought close to both side surfaces of the gravure cylinder at a predetermined interval. Copper plating is provided on an outer peripheral surface of the gravure cylinder.

    Abstract translation: 本发明提供了一种用于凹版滚筒的镀铜方法和设备,其中可以在凹版滚筒的全长上提供具有更均匀厚度的镀铜,而不会产生诸如皮疹和凹坑之类的缺陷,而与凹版滚筒的尺寸无关, 可以自动地管理镀铜液的浓度,减少添加剂的消耗量,使得能够在短时间内进行电镀处理,降低电力供应成本,并且处理容易且具有良好的可见性。 中空圆柱形的凹版滚筒在纵向两端保持。 凹版滚筒容纳在填充有镀铜溶液的镀浴中。 凹版滚筒通电,使得凹版滚筒用作阴极,同时以预定速度旋转。 一对长箱形阳极室,其中不溶性阳极可滑动地设置在电镀槽中的凹版滚筒的两侧并且被赋能以用作阳极,靠近凹版的两个侧表面 圆柱体以预定的间隔。 在凹版滚筒的外周面上设置镀铜。

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