MEMS STRUCTURE
    3.
    发明公开
    MEMS STRUCTURE 审中-公开

    公开(公告)号:US20230331546A1

    公开(公告)日:2023-10-19

    申请号:US17724157

    申请日:2022-04-19

    Abstract: A MEMS package is provided. The MEMS package includes a metallization layer, a planarization structure, a MEMS device structure, a cap structure and a pressure adjustment element. The planarization structure has an inner sidewall defining a first cavity exposing the metallization layer. The MEMS device structure is bonded to the planarization structure. The MEMS device structure includes a movable element over the first cavity. The cap structure is bonded to the MEMS device structure and has an inner sidewall defining a second cavity facing the movable element. The pressure adjustment element is disposed in the second cavity.

    METHODS OF POLISHING SAPPHIRE SURFACES
    4.
    发明申请
    METHODS OF POLISHING SAPPHIRE SURFACES 有权
    抛光SAPPHIRE表面方法

    公开(公告)号:US20140263170A1

    公开(公告)日:2014-09-18

    申请号:US14206947

    申请日:2014-03-12

    Abstract: Described herein are compositions, kits and methods for polishing sapphire surfaces using compositions having colloidal aluminosilicate particles in an aqueous acidic solution. In some aspects, the methods for polishing a sapphire surface may include abrading a sapphire surface with a rotating polishing pad and a polishing composition. The polishing composition may include an amount of a colloidal aluminosilicate and may have a pH of about 2.0 to about 7.0.

    Abstract translation: 本文描述了使用在酸性水溶液中具有胶体硅铝酸盐颗粒的组合物来抛光蓝宝石表面的组合物,试剂盒和方法。 在一些方面,抛光蓝宝石表面的方法可包括用旋转抛光垫和抛光组合物研磨蓝宝石表面。 抛光组合物可以包括一定量的胶体硅铝酸盐,并且可以具有约2.0至约7.0的pH。

    METHODS OF POLISHING SAPPHIRE SURFACES
    6.
    发明申请
    METHODS OF POLISHING SAPPHIRE SURFACES 审中-公开
    抛光SAPPHIRE表面方法

    公开(公告)号:WO2014150884A1

    公开(公告)日:2014-09-25

    申请号:PCT/US2014/024455

    申请日:2014-03-12

    Abstract: Described herein are compositions, kits and methods for polishing sapphire surfaces using compositions having colloidal aluminosilicate particles in an aqueous acidic solution. In some aspects, the methods for polishing a sapphire surface may include abrading a sapphire surface with a rotating polishing pad and a polishing composition. The polishing composition may include an amount of a colloidal aluminosilicate and may have a pH of about 2.0 to about 7.0.

    Abstract translation: 本文描述了使用在酸性水溶液中具有胶体硅铝酸盐颗粒的组合物来抛光蓝宝石表面的组合物,试剂盒和方法。 在一些方面,抛光蓝宝石表面的方法可包括用旋转抛光垫和抛光组合物研磨蓝宝石表面。 抛光组合物可以包括胶体硅铝酸盐的量,并且可以具有约2.0至约7.0的pH。

    METHODS OF POLISHING SAPPHIRE SURFACES
    8.
    发明公开
    METHODS OF POLISHING SAPPHIRE SURFACES 有权
    VERFAHREN ZUM POLIEREN VONOBERFLÄCHENAUS SAPHIR

    公开(公告)号:EP2969391A4

    公开(公告)日:2017-02-01

    申请号:EP14770101

    申请日:2014-03-12

    Applicant: ECOLAB USA INC

    Abstract: Described herein are compositions, kits and methods for polishing sapphire surfaces using compositions having colloidal aluminosilicate particles in an aqueous acidic solution. In some aspects, the methods for polishing a sapphire surface may include abrading a sapphire surface with a rotating polishing pad and a polishing composition. The polishing composition may include an amount of a colloidal aluminosilicate and may have a pH of about 2.0 to about 7.0.

    Abstract translation: 本文描述了使用在酸性水溶液中具有胶体硅铝酸盐颗粒的组合物来抛光蓝宝石表面的组合物,试剂盒和方法。 在一些方面,抛光蓝宝石表面的方法可包括用旋转抛光垫和抛光组合物研磨蓝宝石表面。 抛光组合物可以包括一定量的胶体硅铝酸盐,并且可以具有约2.0至约7.0的pH。

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