Abstract:
@ Apparatus for measuring displacement comprises a member, such as a reading head, which carries a stepped index diffraction grating (14) and is movable with respect to a reflective scale grating (16). The head also carries a source (10) and lens for directing light on to the index grating and thence on to the scale grating for reflection to the index grating, with the resultant Moire bands detected by a photodetector (18) on the reading head. In order to determine the phase separation or offset, and to avoid high sensitivity thereof to the spacing between the gratings, the index grating (14) has a square-stepped profile resulting in graded, increasing thickness. Alternatively, a conventional index grating may be employed in conjunction with a stepped profile optical element interposed between the two gratings.
Abstract:
Die Erfindung betrifft ein digitales Phasengitter für einen optischen Leistungs- und Farbteiler, welcher ein Mischbündel aus optischen Signalen zweier verschiedener Wellenlängen λ₁ und λ₂ in Einzelbündel aufteilt, die räumlich voneinander getrennt sind und jeweils nur Signale einer einzigen Wellenlänge führen, wobei für jede Wellenlänge mindestens zwei Einzelbündel gebil det werden. Um die Anzahl der optischen Komponenten zu verringern, wird vorgeschlagen, dass die Struktur des Phasengit ters hinsichtlich Stufenbreite, optischer Wegdifferenz (Stufen höhe) und Stufenabstand entsprechend einer Überlagerung zweidimensionaler Stufenstrukturen eines gedachten binären leistungsteilenden Phasengitters G₁ mit der optischen Wegdiffe renz S₁, welches die Signale der Wellenlänge in ungerade Beugungsordnungen zu verteilen vermag, sowie eines gedach ten binären leistungsteilenden Phasengitters G₂ mit der opti schen Wegdifferenz S₂, welches die Signale der Wellenlänge λ₂ in gerade Beugungsordnungen zu verteilen vermag, in der Weise, dass die gedachten Gitter für die jeweils fremde Wellen länge beugungslos durchlässig sind.
Abstract:
A material has a reflective surface which bears a light diffracting pattern in the form of a series of well-defined grooves and ridges, wherein the transverse cross-section of the surface has a non-cyclical sequence of peaks and troughs. The pattern is produced by a method involving the interference of a first reference beam of coherent light (12) with a second beam of coherent light (13), the second beam consisting of a bundle of divergent beams (22) all of which illuminate the same area (16) as the first beam. Apparatus for this method has a special lens system for producing the second beam.
Abstract:
Das unverspiegelte Gitter (23) sitzt auf einem optisch transparenten Körper (21) und wird mit Strahlung durch diesen transparenten Körper beaufschlagt, die mit einem Winkel auf die Flanken der Gitterfurchen trifft, der größer ist als der Grenzwinkel der Totalreflexion.
Abstract:
An optical device comprising a transparent plate (6) having planar first reflecting surface (6-a) and second reflecting surface (6-b), a reflector (8) and a screen (9) for forming interference fringes thereon. When a beam (5) is incident on the transparent plate (6), a portion (5-a) of the beam is reflected from the first reflecting surface (6-a), while the other portion (5-d) of the beam (5) enters the interior of the plate (6) and is reflected at the second reflecting surface (6-b). The beam (5-a) reflected from the frist reflecting surface and further reflected from the reflector (8)and the beam (5-d) reflected at the second reflecting surface (6-b) are superposed on the screen (9) to produce interference fringes. The period of the interference fringes is easily variable by rotating the reflector (8) and the screen (9) around the line of their intersection.
Abstract:
A method of manufacturing a curved diffraction grating is disclosed. The grating is made of a single crystalline silicon substrate, one major plane thereof being provided with a plurality of asymmetric triangular grooves, each having a wall inclined by an angle 8 with respect to the major surface so as to satisfy an equation where 0 represents the blaze angle, P the grating constant of the groove, λ B the blazing wavelength, and m the order of diffraction. The walls of each groove receiving incident light are covered with a metal coat. The diffraction grating is prepared by using an {hkl} plane (where h = k) inclined by 0 with respect to the {111} plane of the single crystalline silicon as a major surface, and then anisotropic etching the major surface through an etching mask having stripes of sufficiently smaller width than the constant. The planar diffraction grating thus obtained is mounted on a curved surface of a supporting member and, by applying pressure, curved to conform with the curved surface. Preferably, following the anisotropic etching, isotropic etching is performed for the major surface.
Abstract:
The present invention provides a process for producing a blazed diffraction grating by using a transmission modulation diffraction grating as a photomask in photolithography. The photomask (5) is composed of a relief modulation diffraction grating (2) made of a transparent material and a blazed diffraction grating (4) made of a material containing a ray absorbing agent. The diffraction grating (2) and the diffraction grating (4) are mated with each other through their grating surfaces.