Displacement measuring apparatus and method
    1.
    发明公开
    Displacement measuring apparatus and method 失效
    位移测量装置和方法

    公开(公告)号:EP0132978A3

    公开(公告)日:1986-09-17

    申请号:EP84304695

    申请日:1984-07-10

    CPC classification number: G01D5/38

    Abstract: @ Apparatus for measuring displacement comprises a member, such as a reading head, which carries a stepped index diffraction grating (14) and is movable with respect to a reflective scale grating (16). The head also carries a source (10) and lens for directing light on to the index grating and thence on to the scale grating for reflection to the index grating, with the resultant Moire bands detected by a photodetector (18) on the reading head. In order to determine the phase separation or offset, and to avoid high sensitivity thereof to the spacing between the gratings, the index grating (14) has a square-stepped profile resulting in graded, increasing thickness. Alternatively, a conventional index grating may be employed in conjunction with a stepped profile optical element interposed between the two gratings.

    Digital phase gating for an optical power and colour splitter
    3.
    发明公开
    Digital phase gating for an optical power and colour splitter 失效
    用于光功率和颜色分割器的数字相位增益

    公开(公告)号:EP0193993A3

    公开(公告)日:1988-05-25

    申请号:EP86200310

    申请日:1986-02-28

    Abstract: Die Erfindung betrifft ein digitales Phasengitter für einen optischen Leistungs- und Farbteiler, welcher ein Mischbündel aus optischen Signalen zweier verschiedener Wellenlängen λ₁ und λ₂ in Einzelbündel aufteilt, die räumlich voneinander getrennt sind und jeweils nur Signale einer einzigen Wellenlänge führen, wobei für jede Wellenlänge mindestens zwei Einzelbündel gebil det werden. Um die Anzahl der optischen Komponenten zu verringern, wird vorgeschlagen, dass die Struktur des Phasengit ters hinsichtlich Stufenbreite, optischer Wegdifferenz (Stufen höhe) und Stufenabstand entsprechend einer Überlagerung zweidimensionaler Stufenstrukturen eines gedachten binären leistungsteilenden Phasengitters G₁ mit der optischen Wegdiffe renz S₁, welches die Signale der Wellenlänge in ungerade Beugungsordnungen zu verteilen vermag, sowie eines gedach ten binären leistungsteilenden Phasengitters G₂ mit der opti schen Wegdifferenz S₂, welches die Signale der Wellenlänge λ₂ in gerade Beugungsordnungen zu verteilen vermag, in der Weise, dass die gedachten Gitter für die jeweils fremde Wellen länge beugungslos durchlässig sind.

    Abstract translation: 该光栅将两个不同波长λ1和λ2的混合的光信号分组成彼此空间分离的各组,并且在每种情况下仅传送单个波长的信号,为每个波长形成至少两个单一组 。 为了减少光学部件的数量,提出了相位光栅的结构相对于步长,光程差(步长)和步距分布,根据虚拟的二维步长结构的叠加 具有能够将波长λ1的信号分散到奇数级的光程差S1的二进制功率分配相位光栅G1和具有光程差S2的虚数二进制功率分配相位光栅G2, 能够将波长λ2的信号分散成偶数次的衍射,使得在每种情况下,假想光栅对于外来波长是无衍射的透明的。

    A decorative surface and a method of producing it
    4.
    发明公开
    A decorative surface and a method of producing it 失效
    装饰表面及其生产方法

    公开(公告)号:EP0251815A3

    公开(公告)日:1988-04-20

    申请号:EP87305918

    申请日:1987-07-03

    CPC classification number: B44F1/00 G02B5/1842 Y10S359/90

    Abstract: A material has a reflective surface which bears a light diffracting pattern in the form of a series of well-defined grooves and ridges, wherein the transverse cross-section of the surface has a non-cyclical sequence of peaks and troughs. The pattern is produced by a method involving the interference of a first reference beam of coherent light (12) with a second beam of coherent light (13), the second beam consisting of a bundle of divergent beams (22) all of which illuminate the same area (16) as the first beam. Apparatus for this method has a special lens system for producing the second beam.

    Optical device
    7.
    发明公开
    Optical device 失效
    光学装置

    公开(公告)号:EP0176812A3

    公开(公告)日:1987-11-25

    申请号:EP85111367

    申请日:1985-09-09

    CPC classification number: G02B5/1857 G02B5/32

    Abstract: An optical device comprising a transparent plate (6) having planar first reflecting surface (6-a) and second reflecting surface (6-b), a reflector (8) and a screen (9) for forming interference fringes thereon. When a beam (5) is incident on the transparent plate (6), a portion (5-a) of the beam is reflected from the first reflecting surface (6-a), while the other portion (5-d) of the beam (5) enters the interior of the plate (6) and is reflected at the second reflecting surface (6-b). The beam (5-a) reflected from the frist reflecting surface and further reflected from the reflector (8)and the beam (5-d) reflected at the second reflecting surface (6-b) are superposed on the screen (9) to produce interference fringes. The period of the interference fringes is easily variable by rotating the reflector (8) and the screen (9) around the line of their intersection.

    A method of manufacturing a curved diffraction grating structure
    9.
    发明公开
    A method of manufacturing a curved diffraction grating structure 失效
    制造弯曲衍射结构的方法

    公开(公告)号:EP0059304A3

    公开(公告)日:1982-11-10

    申请号:EP82100228

    申请日:1979-07-16

    Abstract: A method of manufacturing a curved diffraction grating is disclosed. The grating is made of a single crystalline silicon substrate, one major plane thereof being provided with a plurality of asymmetric triangular grooves, each having a wall inclined by an angle 8 with respect to the major surface so as to satisfy an equation
    where 0 represents the blaze angle, P the grating constant of the groove, λ B the blazing wavelength, and m the order of diffraction. The walls of each groove receiving incident light are covered with a metal coat. The diffraction grating is prepared by using an {hkl} plane (where h = k) inclined by 0 with respect to the {111} plane of the single crystalline silicon as a major surface, and then anisotropic etching the major surface through an etching mask having stripes of sufficiently smaller width than the constant. The planar diffraction grating thus obtained is mounted on a curved surface of a supporting member and, by applying pressure, curved to conform with the curved surface. Preferably, following the anisotropic etching, isotropic etching is performed for the major surface.

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