公开(公告)号：US20250006467A1

公开(公告)日：2025-01-02

申请号：US18293321

申请日：2022-07-19

Applicant: PSK INC.

Inventor： Paul YANG ,  Jung Hyun KANG ,  Soo Yeong YANG ,  Chi Young LEE

IPC: H01J37/32

Abstract: Provided is an apparatus for processing a substrate, the apparatus including: a housing having a processing space for processing a substrate; a window unit for covering an upper portion of the processing space so that the processing space is sealed; a support unit for supporting the substrate in the processing space; a gas supply unit including a nozzle for supplying gas to the processing space; and a plasma unit disposed outside the processing space, and generating plasma from the gas, in which the nozzle may include: a body formed with an internal space and an outlet for supplying the gas in the internal space to the processing space; and an insertion member inserted into a top end of the body.