公开(公告)号：US20090251673A1

公开(公告)日：2009-10-08

申请号：US12488059

申请日：2009-06-19

Applicant: Wilfried CLAUSS

Inventor： Wilfried CLAUSS

IPC: G03B27/52 ,  C01F7/00

CPC classification number: C04B35/443 ,  C04B35/44 ,  C04B35/6455 ,  C04B2235/6582 ,  C04B2235/664 ,  C04B2235/72 ,  C04B2235/721 ,  C04B2235/724 ,  C04B2235/726 ,  C04B2235/764 ,  C04B2235/9653 ,  G02B1/02 ,  G03F7/70341 ,  G03F7/70958

Abstract: A transmitting optical element of polycrystalline material that includes crystallites of magnesium spinel MgAl2O4 or lutetium-aluminum garnet Lu3Al5O12, wherein the polycrystalline material includes an average total concentration of foreign element contamination caused by Y, Sc, Co, Ni, Zr, Mo, Sn and/or Nb of less than 50 ppm, preferably of less than 20 ppm, and more preferably of less than 15 ppm.

Abstract translation: 一种多晶材料的发射光学元件，其包括镁尖晶石MgAl 2 O 4或镥 - 铝石榴石Lu 3 Al 5 O 12的微晶，其中多晶材料包括由Y，Sc，Co，Ni，Zr，Mo，Sn引起的异物污染物的平均总浓度， /或Nb小于50ppm，优选小于20ppm，更优选小于15ppm。

公开(公告)号：US20130038929A1

公开(公告)日：2013-02-14

申请号：US13525233

申请日：2012-06-15

Applicant: Stephan MUELLENDER ,  Joern WEBER ,  Wilfried CLAUSS ,  Hans-Jochen PAUL ,  Gerhard BRAUN ,  Sascha MIGURA ,  Aurelian DODOC ,  Christoph ZACZEK ,  Gisela VON BLANCKENHAGEN ,  Roland LOERCHER

Inventor： Stephan MUELLENDER ,  Joern WEBER ,  Wilfried CLAUSS ,  Hans-Jochen PAUL ,  Gerhard BRAUN ,  Sascha MIGURA ,  Aurelian DODOC ,  Christoph ZACZEK ,  Gisela VON BLANCKENHAGEN ,  Roland LOERCHER

IPC: G02B5/08

CPC classification number: G02B5/0891 ,  B82Y30/00 ,  G02B1/10 ,  G02B1/105 ,  G02B1/14 ,  G02B5/0816 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70958

Abstract: A mirror (1a; 1a′; 1b; 1b′; 1c; 1c′) for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P′″) consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include two individual layers composed of different materials for a high refractive index layer (H′″) and a low refractive index layer (L′″), wherein the layer arrangement includes at least one surface protecting layer (SPL, Lp) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.

Abstract translation: 用于EUV波长范围的反射镜（1a; 1a'; 1b; 1b'; 1c; 1c'），并具有衬底（S）和层布置，其中层布置包括至少一个表层系统（P' ）由各层的至少两个周期（P3）的周期性序列组成，其中周期（P3）包括由用于高折射率层（H“”）和低折射率层（H“”）的不同材料组成的两个单独层 L“），其中所述层布置包括至少一个表面保护层（SPL，Lp）或至少一个具有大于20nm，优选大于50nm的厚度的表面保护层系统（SPLS）。

公开(公告)号：US20120327384A1

公开(公告)日：2012-12-27

申请号：US13531315

申请日：2012-06-22

Applicant: Wilfried CLAUSS

Inventor： Wilfried CLAUSS

IPC: G02B5/08 ,  G03B27/54 ,  B05D3/12 ,  B05D5/06 ,  B05D3/06

CPC classification number: C03C23/0005 ,  C03B32/005 ,  C03B2201/42 ,  C03C17/00 ,  C03C17/40 ,  C03C2218/31 ,  G02B1/12 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70316 ,  G03F7/7095 ,  G21K1/062

Abstract: A method for the production of a mirror element (10) that has a reflective coating (10a) for the EUV wavelength range and a substrate (10b). The substrate (10b) is pre-compacted by hot isostatic pressing, and the reflective coating (10a) is applied to the pre-compacted substrate (10b). In the method, either the pre-compacting of the substrate (10b) is performed until a saturation value of the compaction of the substrate (10b) by long-term EUV irradiation is reached, or, for further compaction, the pre-compacted substrate (10b) is irradiated, preferably homogeneously, with ions (16) and/or with electrons in a surface region (15) in which the coating (10a) has been or will be applied. A mirror element (10) for the EUV wavelength range associated with the method has a substrate (10b) pre-compacted by hot isostatic pressing. Such a mirror element (10) is suitable to be provided in an EUV projection exposure system.

Abstract translation: 一种用于生产具有用于EUV波长范围的反射涂层（10a）的反射镜元件（10）的方法和一种基板（10b）。 基板（10b）通过热等静压进行预压实，并将反射涂层（10a）施加到预压实的基板（10b）上。 在该方法中，进行基板（10b）的预压实，直到达到通过长期EUV照射的基板（10b）的压实的饱和值，或者为了进一步压缩，预压实基板 （10b）在涂层（10a）已经或将被施加的表面区域（15）中与离子（16）和/或电子被优选均匀地照射。 用于与该方法相关联的EUV波长范围的镜元件（10）具有通过热等静压预压制的基底（10b）。 这种镜子元件（10）适合于设置在EUV投影曝光系统中。

公开(公告)号：US20120212721A1

公开(公告)日：2012-08-23

申请号：US13399615

申请日：2012-02-17

Applicant: Wilfried CLAUSS ,  Martin WEISER

Inventor： Wilfried CLAUSS ,  Martin WEISER

IPC: G03B27/54 ,  G03F1/52

CPC classification number: G03F7/70958 ,  G02B1/12 ,  G02B5/0891

Abstract: Mirrors having a reflecting coating for the EUV wavelength region and a substrate. A surface region of the substrate extends uniformly below the reflecting coating along this coating and, seen from the surface of the substrate, has a depth of down to 5 μm. Here, this surface region has a 2% higher density than the remaining substrate. Also disclosed are substrates that likewise have such surface regions and methods for producing such mirrors and substrates having such surface regions by irradiation using ions or electrons.

Abstract translation: 具有用于EUV波长区域的反射涂层的反射镜和基板。 衬底的表面区域沿着该涂层均匀地延伸到反射涂层的下方，并且从衬底的表面看，其深度为5μm。 这里，该表面区域的密度比剩余的基板高2％。 还公开了同样具有这样的表面区域的基板和通过使用离子或电子照射来制造这种反射镜和具有这种表面区域的基板的方法。