公开(公告)号：US06484414B2

公开(公告)日：2002-11-26

申请号：US09781298

申请日：2001-02-13

Applicant: Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

Inventor： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC: F26B1330

CPC classification number: H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

Abstract: A wafer conveyor system for use in a vacuum processing apparatus wherein the conveyor structure is provided with a robot disposed in the conveyor chamber of the vacuum loader. The robot includes an arm which is extendible into the lock chambers which are connected to the conveyor structure.

Abstract translation: 一种用于真空处理设备的晶片输送系统，其中输送机结构设置有设置在真空装载机的输送室中的机器人。 该机器人包括可延伸到连接到输送机结构的锁定室中的臂。

公开(公告)号：US06467187B2

公开(公告)日：2002-10-22

申请号：US09782192

申请日：2001-02-14

Applicant: Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

Inventor： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC: F26B1330

CPC classification number: H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

Abstract: A vacuum processing system, including a vacuum processing chamber for processing wafers, provides a controller for controlling a wafer processing mode and a cleaning mode for the processing chamber. The vacuum processing system further provides for a wafer moving mechanism which is controlled by the controller and allows for the transferring of a dummy wafer into the processing chamber when the cleaning mode is started and then returning the dummy wafer when the cleaning mode is finished.

Abstract translation: 包括用于处理晶片的真空处理室的真空处理系统提供用于控制处理室的晶片处理模式和清洁模式的控制器。 真空处理系统进一步提供由控制器控制的晶片移动机构，并且当清洁模式开始时允许将虚设晶片转移到处理室中，然后当清洁模式结束时返回虚设晶片。

公开(公告)号：US06436356B1

公开(公告)日：2002-08-20

申请号：US09535805

申请日：2000-03-28

Applicant: Yuri Kopyt

Inventor： Yuri Kopyt

IPC: B01J808

CPC classification number: C01B13/324 ,  B01J3/006 ,  B01J6/008 ,  B01J12/02 ,  B01J19/14 ,  B01J2219/00191 ,  C01B21/076 ,  C01B32/90

Abstract: The present invention relates to an apparatus for self-propagating high temperature synthesis of an inorganic compound from a combustible charge mixture of initial ingredients. The apparatus comprises mechanisms for continuously feeding the combustible charge into a reaction chamber and removing the synthesized compound therefrom. The apparatus also contains sensors to control and contain the combustion inside a combustion zone of the reaction chamber.

Abstract translation: 本发明涉及一种用于从初始成分的可燃混合物自发传播无机化合物的高温合成装置。 该装置包括用于将可燃电荷连续地供给到反应室中并从其中除去合成化合物的机构。 该装置还包含用于控制和容纳在反应室的燃烧区内的燃烧的传感器。

公开(公告)号：US20010037585A1

公开(公告)日：2001-11-08

申请号：US09767834

申请日：2001-01-24

Inventor： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC: F26B013/30

CPC classification number: H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

公开(公告)号：US20010008050A1

公开(公告)日：2001-07-19

申请号：US09781293

申请日：2001-02-13

Inventor： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC: F26B013/30

CPC classification number: H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

Abstract translation: 本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。 当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中， 通过产生等离子体对真空处理室进行干洗。 在完成干洗之后，虚拟衬底返回到虚设衬底存储装置。因此，不需要用于清洁目的的特定机构，并且可以使装置的结构简单。 此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。

公开(公告)号：US06245299B1

公开(公告)日：2001-06-12

申请号：US09319958

申请日：1999-06-14

Applicant: Joseph Shiloh ,  Avner Rosenberg ,  Elhanan Wurzberg

Inventor： Joseph Shiloh ,  Avner Rosenberg ,  Elhanan Wurzberg

IPC: A62B708

CPC classification number: B01J3/006 ,  B01D53/326 ,  B01J19/088 ,  B01J2219/0809 ,  B01J2219/0828 ,  B01J2219/083 ,  B01J2219/0835 ,  B01J2219/0841 ,  B01J2219/0894

Abstract: A device (10) for purifying a gas stream (30) made up of a plurality of DBD cells (12a, 12b, 12c) in series and, for each of the DBD cells (12a, 12b, 12c), a power supply (24a, 24b, 24e) for providing alternating current to each DBD cell (12a, 12b, 12e).

Abstract translation: 一种用于净化由串联的多个DBD单元（12a，12b，12c）和每个DBD单元（12a，12b，12c）组成的气流（30）的设备（10），电源 24a，24b，24e），用于向每个DBD单元（12a，12b，12e）提供交流电流。

公开(公告)号：US06206658B1

公开(公告)日：2001-03-27

申请号：US09460721

申请日：1999-12-14

Applicant: Akira Nishioka ,  Hiroshi Kusumoto ,  Keiji Sasao ,  Hiroshige Kikuchi ,  Takao Sato ,  Ryuichi Kaji ,  Shinji Aso ,  Hitoshi Kawajiri ,  Satoshi Miyabayashi

Inventor： Akira Nishioka ,  Hiroshi Kusumoto ,  Keiji Sasao ,  Hiroshige Kikuchi ,  Takao Sato ,  Ryuichi Kaji ,  Shinji Aso ,  Hitoshi Kawajiri ,  Satoshi Miyabayashi

IPC: F04B1700

CPC classification number: B01J3/008 ,  B01J3/006 ,  B01J2219/00006 ,  B01J2219/00247 ,  B09C1/06 ,  B09C1/08 ,  C02F11/18 ,  F04B9/02 ,  F04B9/1172 ,  F04B9/1176

Abstract: Fluid containing organic substances, which has not processed yet, is fed to a plurality of cylinders, using a slurry pump. A free piston is included in each cylinder, the fluid which has not yet been processed is introduced into one of two chambers in the cylinder partitioned by the piston, and processed high-pressure fluid which has been processed is introduced into the other one of the two chamber in the cylinder. The piston pressurizes the fluid with which the cylinder has been filled up. A pressure holding valve is provided in a processed high-pressure fluid system to pressurize an organic substance processing system, and this pressure holding valve suppresses changes in the pressure in the processed high-pressure fluid system. By changing the timing of feeding the fluid before processing into each cylinder, it becomes possible to unbrokenly perform the filling-up of each cylinder with the fluid to be processed, the pressurizing of the fluid to be processed in each cylinder, and the feeding of the pressurized fluid to a reactor. Thus, stable continuous processing of the fluid to be processed can be realized.

Abstract translation: 含有尚未加工的有机物质的流体使用浆料泵进料到多个圆筒。 每个气缸中都包括一个自由活塞，未被处理的流体被引入到由活塞分隔的气缸中的两个腔室中的一个中，并且已处理过的高压流体被引入另一个 两个缸在缸内。 活塞对已充满气缸的流体进行加压。 在处理过的高压流体系统中设置有压力保持阀，以对有机物质处理系统加压，该压力保持阀抑制处理过的高压流体系统的压力变化。 通过改变在加工前的流体进料到每个气缸中的时间，可以用待处理的流体，每个气缸中的待处理流体的加压以及每个气缸的进料加压来不间断地执行每个气缸的填充 加压流体进入反应器。 因此，可以实现待处理流体的稳定连续处理。

公开(公告)号：US20010000048A1

公开(公告)日：2001-03-22

申请号：US09725257

申请日：2000-11-29

Inventor： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC: F26B013/30

CPC classification number: H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

公开(公告)号：US6143136A

公开(公告)日：2000-11-07

申请号：US884590

申请日：1997-06-27

Applicant: Randy Aulbaugh ,  Gregory G. Hawk

Inventor： Randy Aulbaugh ,  Gregory G. Hawk

IPC: G21F9/28 ,  B01D3/08 ,  B01D3/10 ,  B01D5/00 ,  B01J3/00 ,  B01J3/03 ,  B01J19/20 ,  B01J19/28 ,  B09B3/00 ,  B09C1/06 ,  C10B1/10 ,  F26B11/02 ,  F26B11/04 ,  F26B25/00 ,  G21F9/14 ,  G21F9/32 ,  C10B51/00 ,  A62D3/00 ,  B01D3/34

CPC classification number: B01J19/20 ,  B01D3/085 ,  B01D3/10 ,  B01D5/0084 ,  B01J19/28 ,  B01J3/006 ,  B01J3/03 ,  B09B3/00 ,  B09B3/0083 ,  B09C1/06 ,  C10B1/10 ,  F26B11/024 ,  F26B11/049 ,  F26B25/005 ,  F26B25/006 ,  G21F9/14 ,  G21F9/32 ,  B01J2219/00074

Abstract: A method and apparatus for separating volatile from nonvolatile substances, separation of volatile substances, one from the other, and for performing various chemical reactions. In particular, an apparatus which performs these functions utilizing a combination of above ambient temperatures and above one inch of mercury vacuum within a rotating vessel. The apparatus uses a conventional rotary vacuum seal. The apparatus, however, operates well above the maximum operating temperature of the conventional rotary vacuum seal by isolating and cooling the conventional rotary vacuum seal.

Abstract translation: 用于从挥发性物质中分离挥发性物质，分离挥发性物质的方法和装置，以及进行各种化学反应。 特别地，一种利用上述环境温度和高于一英寸水银真空的组合在旋转容器内执行这些功能的装置。 该装置使用传统的旋转真空密封。 然而，该装置通过隔离和冷却传统的旋转真空密封件而在常规旋转真空密封件的最大工作温度以上工作。

公开(公告)号：US6112431A

公开(公告)日：2000-09-05

申请号：US389461

申请日：1999-09-03

Applicant: Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

Inventor： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC: B01J3/00 ,  B41J2/36 ,  B41J2/365 ,  C23C14/56 ,  H01L21/00 ,  H01L21/677 ,  F26B5/04

CPC classification number: H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

Abstract translation: 本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。 当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中， 通过产生等离子体对真空处理室进行干洗。 在完成干洗之后，虚拟衬底返回到虚设衬底存储装置。 因此，仅用于清洁目的的特定机构是不必要的，并且可以使装置的结构简单。 此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。