Method and apparatus for optical beam alignment detection and control
    91.
    发明授权
    Method and apparatus for optical beam alignment detection and control 有权
    光束对准​​检测和控制的方法和装置

    公开(公告)号:US06556285B1

    公开(公告)日:2003-04-29

    申请号:US09935467

    申请日:2001-08-20

    Abstract: Methods and apparatus are provided for detection and control of multiple-axis active alignment for a free-space-coupled single-mode fiber-optic transmission system that automatically optimizes the coupling through the system. In a specific embodiment, a measurement of coupled power is made and error signals are used to control actuation via four axes of beam steering elements to null four generally orthogonal alignment errors (combinations of two lateral errors and two angular errors) of the beam between the input and output fibers. The four alignment errors are detected using a synchronous-detection approach. A feedback control system nulls the four errors.

    Abstract translation: 提供了用于检测和控制用于自由空间耦合的单模光纤传输系统的多轴有源对准的方法和装置,其自动优化通过系统的耦合。 在具体实施例中,进行耦合功率的测量,并且使用误差信号来控制通过波束操纵元件的四个轴的致动,从而将波束的四个大致正交对准误差(两个横向误差和两个角度误差的组合) 输入和输出光纤。 使用同步检测方法检测四个对准误差。 反馈控制系统将四个错误置零。

    Optical exposure device in particular a UV table lamp for hardening light-hardening gel in the course of fingernail treatment
    92.
    发明授权
    Optical exposure device in particular a UV table lamp for hardening light-hardening gel in the course of fingernail treatment 失效
    光学曝光装置,特别是用于在指甲处理过程中硬化光硬化凝胶的UV台灯

    公开(公告)号:US06518583B1

    公开(公告)日:2003-02-11

    申请号:US09461864

    申请日:1999-12-15

    Applicant: Manfred Hennig

    Inventor: Manfred Hennig

    CPC classification number: A45D29/18 A45D29/00 A45D31/00

    Abstract: The invention relates to an optical exposure device in particular an UV table lamp, for hardening light-hardening gel in the course of finger nail treatment. In its basic design, this optical exposure device has at least one UV light source (1) and a light source housing (2). There are provided in this case two or more UV light sources (1) which are arranged in a V-shaped fashion and are arranged above a bearing surface (AF), of essentially convex curvature, for a hand with finger nails to be treated. The overall result is to achieve a configuration which is cost effective and of simple design.

    Abstract translation: 本发明涉及一种特别是UV台灯的光学曝光装置,用于在指甲治疗过程中硬化光硬化凝胶。 在其基本设计中,该光学曝光装置具有至少一个UV光源(1)和光源外壳(2)。 在这种情况下,提供两个或多个UV光源(1),其以V形的方式布置并且布置在具有基本上凸曲率的支承表面(AF)的上方,用于具有待处理的指甲的手。 总体结果是实现具有成本效益和简单设计的配置。

    Mechanical gauges for quality assurance of laser peening
    93.
    发明授权
    Mechanical gauges for quality assurance of laser peening 失效
    用于激光喷丸质量保证的机械量规

    公开(公告)号:US06483578B1

    公开(公告)日:2002-11-19

    申请号:US09592534

    申请日:2000-06-12

    CPC classification number: C21D10/005 G01J1/4257

    Abstract: A method and apparatus for measuring the quality of a laser peening process, which includes a test element, a mount for the test element, wherein the test element is mounted at a preselected point in the anticipated path of a laser pulse, the laser pulse irradiates the test element, the deflection of the test element is measured in the direction substantially perpendicular and away from the impacted surface of the test element, and the deflection measurement is compared to a previously generated chart showing the relationship between characteristics of test elements and desired material properties.

    Abstract translation: 一种用于测量激光喷丸处理质量的方法和装置,其包括测试元件,用于测试元件的安装座,其中测试元件安装在激光脉冲的预期路径中的预选点处,激光脉冲照射 测试元件,测试元件的偏转在基本垂直和远离测试元件的冲击表面的方向上测量,并且将偏转测量与先前生成的图表进行比较,其中显示了测试元件和所需材料的特性之间的关系 属性。

    Optical autofocus for use with microtiter plates
    94.
    发明授权
    Optical autofocus for use with microtiter plates 有权
    用于微量滴定板的光学自动对焦

    公开(公告)号:US06441894B1

    公开(公告)日:2002-08-27

    申请号:US09430418

    申请日:1999-10-29

    CPC classification number: G02B21/34 G01N21/6452 G02B21/241

    Abstract: A method and apparatus for autofocus on a target layer contained within a microplate well is provided. The instrument is capable of optically sensing a reference point on the underside of a microplate. This reference point is then used to focus light onto a target layer within the microplate well, the target layer having a location that is in defined relation to the reference point. The reference point is either a surface of the bottom of the microplate well or is an optically detectable mark on the underside of the microplate. In an alternate embodiment, a light position sensitive detector is used to enable deterministic autofocus for a plurality of wells on a microplate.

    Abstract translation: 提供了一种用于在微孔板中包含的靶层上的自动聚焦的方法和装置。 该仪器能够光学感测微孔板底面上的参考点。 然后将该参考点用于将光聚焦到微孔板内的目标层上,目标层具有与参考点限定的位置。 参考点是微孔板底部的表面,或者是微孔板下面的光学可检测标记。 在替代实施例中,使用光位置敏感检测器来使得微孔板上的多个孔的确定性自动聚焦。

    Illumination system having a plurality of movable sources
    95.
    发明授权
    Illumination system having a plurality of movable sources 有权
    具有多个可移动源的照明系统

    公开(公告)号:US06396068B1

    公开(公告)日:2002-05-28

    申请号:US09678419

    申请日:2000-10-02

    CPC classification number: G21K5/04

    Abstract: An illumination system includes several discharge sources that are multiplexed together to reduce the amount of debris generated. The system includes: (a) a first electromagnetic radiation source array that includes a plurality of first activatable radiation source elements that are positioned on a first movable carriage; (b) a second electromagnetic radiation source array that includes a plurality of second activatable radiation source elements that are positioned on a second movable carriage; (c) means for directing electromagnetic radiation from the first electromagnetic radiation source array and electromagnetic radiation from the second electromagnetic radiation source array toward a common optical path; (d) means for synchronizing (i) the movements of the first movable carriage and of the second movable carriage and (ii) the activation of the first electromagnetic radiation source array and of the second electromagnetic radiation source array to provide an essentially continuous illumination of electromagnetic radiation along the common optical path.

    Abstract translation: 照明系统包括多个放电源,其被多路复用在一起以减少产生的碎屑的量。 该系统包括:(a)第一电磁辐射源阵列,其包括定位在第一可移动滑架上的多个第一可激活的辐射源元件; (b)第二电磁辐射源阵列,其包括定位在第二可移动滑架上的多个第二可激活的辐射源元件; (c)用于将来自第一电磁辐射源阵列的电磁辐射和来自第二电磁辐射源阵列的电磁辐射引向公共光路的装置; (d)用于同步(i)第一可移动滑架和第二可移动滑架的运动的装置,以及(ii)第一电磁辐射源阵列和第二电磁辐射源阵列的激活,以提供基本上连续的照明 沿着公共光路的电磁辐射。

    Ultraviolet ray irradiation apparatus
    96.
    发明授权
    Ultraviolet ray irradiation apparatus 失效
    紫外线照射装置

    公开(公告)号:US06342702B1

    公开(公告)日:2002-01-29

    申请号:US09447262

    申请日:1999-11-23

    CPC classification number: H01L21/67115 H05B3/0047

    Abstract: An ultraviolet ray irradiation apparatus has a turntable which mounts a substance to be processed, a driving source which rotates and drives the turntable, a filter which adjusts light quantity of an ultraviolet light beam that reaches a surface to be processed of a substance W to be processed in accordance with shapes of an ultraviolet beam passing region. In the filter, the shape of the ultraviolet light beam passing region is symmetrical for a center line for a length direction of the irradiating range of the ultraviolet light beam. At least a portion near a center of the irradiating range of the ultraviolet light beam of each line segment that forms a boundary of the ultraviolet light beam passing region in a width direction of the ultraviolet light beam passing region is substantially expressed by a quadratic curve that a distance r in the length direction of the irradiating range of the ultraviolet light beam on the basis of the center line is variable.

    Abstract translation: 紫外线照射装置具有安装待处理物质的转台,旋转并驱动转盘的驱动源,调节到达物质W的待处理表面的紫外光束的光量的过滤器 根据紫外线通过区域的形状进行处理。 在过滤器中,紫外光束通过区域的形状对于紫外光束的照射范围的长度方向的中心线是对称的。 形成紫外光束通过区域的宽度方向的紫外光通过区域的边界的各线段的紫外光束的照射范围的中心附近的至少一部分基本上由二次曲线表示, 基于中心线的紫外光束的照射范围的长度方向上的距离r是可变的。

    Method and apparatus for detecting positions of light emitting elements
    97.
    发明授权
    Method and apparatus for detecting positions of light emitting elements 失效
    用于检测发光元件位置的方法和装置

    公开(公告)号:US06337738B1

    公开(公告)日:2002-01-08

    申请号:US09332936

    申请日:1999-06-15

    Inventor: Kazuyoshi Kishi

    CPC classification number: B41J2/45 G06K15/1247

    Abstract: A method and apparatus for detecting positions which can accurately detect the position of light emitting elements and improves the ease in operation are disclosed. Light emitting elements of a PLZT shutter array that are arranged in one dimension are lighted. A light receiving element transfer system makes a light receiving element or receiver scan along an imaging face of the PLZT shutter array by sampling analog data which has been taken in by the light receiving element 22 so that a data series can be obtained. A minimal value of the data series is determined to be a threshold. Then by comparing the threshold and the data series sequentially from the beginning, the first place where the threshold is exceeded is detected. A maximum value within a searching range of one cycle from this first place is detected. The position of the maximum value is considered to be a beginning or first light emitting element position among the lighted light emitting elements. Subsequently each light emitting element is detected by detecting a maximum value within one cycle of searching range after a half cycle following the preceding light emitting element. Each detected maximum value position is considered to be a light emitting element position.

    Abstract translation: 公开了一种用于检测能够精确地检测发光元件的位置并提高操作容易性的位置的方法和装置。 排列在一个维度上的PLZT快门阵列的发光元件被点亮。 光接收元件传送系统通过对由光接收元件22吸收的模拟数据进行采样,使得沿着PLZT快门阵列的成像面的光接收元件或接收器扫描,从而可以获得数据序列。 将数据序列的最小值确定为阈值。 然后,通过从开始顺序比较阈值和数据序列,检测超过阈值的第一位置。 检测到从该第一个位置开始的一个周期的搜索范围内的最大值。 最大值的位置被认为是点亮的发光元件中的开始或第一发光元件位置。 随后,通过在前一个发光元件之后的半个周期之后的一个搜索范围的一个周期内检测最大值来检测每个发光元件。 每个检测到的最大值位置被认为是发光元件位置。

    Constant power snapshot microemitter array with integral digital interface, isolated substrate current return, and linearized signal response
    98.
    发明授权
    Constant power snapshot microemitter array with integral digital interface, isolated substrate current return, and linearized signal response 有权
    具有集成数字接口的恒功率快照微阵列阵列,隔离衬底电流返回和线性化信号响应

    公开(公告)号:US06316777B1

    公开(公告)日:2001-11-13

    申请号:US09285509

    申请日:1999-04-02

    CPC classification number: H01L27/16 H04N5/33 H04N5/3651

    Abstract: A dual sample-and-hold architecture in each unit cell of a read-in-integrated-circuit (RIIC) provides maximum frame rate without frame overlap. Analog pixel signals are updated sequentially in one sample-and-hold capacitor, while an emitter element displays a pixel of a display frame in response to a stored analog signal voltage on an isolated second sample-and-hold capacitor. After all unit cells are updated, the signals on the two capacitors are combined, updating all emitter elements for the next frame. A voltage mode amplifier as an emitter driver provides a more nearly linear dependence of infrared power output on signal voltage than do previous transconductance amplifiers. A digital to analog converter (DAC) on the RIIC substrate results in a simplified interface to the RIIC and in an increased immunity to noise. A constant current source in the unit cell provides constant power dissipation and temperature, independent from variations in emitter element current, improving stability and scene dependent crosstalk. Emitter element current returns to an external ground plane through semiconductor substrate contacts for all unit cells. This configuration eliminates metal interconnects, which produce scene-dependent voltage drops in the return circuit, adversely affecting linearity and crosstalk.

    Abstract translation: 在集成电路(RIIC)的每个单元中的双采样保持架构提供了最大的帧速率,而没有帧重叠。 模拟像素信号在一个采样和保持电容器中顺序更新,而发射极元件响应于隔离的第二采样保持电容器上存储的模拟信号电压而显示显示帧的像素。 在更新了所有单元电池之后,两个电容器上的信号被组合,更新下一帧的所有发射极元件。 作为发射极驱动器的电压模式放大器比以前的跨导放大器提供了更接近于线性的信号电压对信号电压的依赖性。 RIIC衬底上的数模转换器(DAC)可实现对RIIC的简化接口,并增加对噪声的抗扰度。 单元电池中的恒流源提供恒定的功耗和温度,独立于发射极元件电流的变化,提高稳定性和场景相关串扰。 发射极元件电流通过半导体衬底触点返回到外部接地层,用于所有单元电池。 该配置消除了在返回电路中产生场景相关电压降的金属互连,不利地影响线性度和串扰。

    Photometering apparatus for a camera
    100.
    发明授权
    Photometering apparatus for a camera 失效
    照相机测光装置

    公开(公告)号:US06222622B1

    公开(公告)日:2001-04-24

    申请号:US09200875

    申请日:1998-11-27

    CPC classification number: G03B7/09979

    Abstract: A photometering apparatus for a camera including a photometering sensor which receives object light transmitted through a focusing plate and measures the brightness of an object; and a focusing plate holding device which detachably holds the focusing plate includes: a discrimination device which discriminates the type of focusing plate held by the focusing plate holding device, and a controller which selects a photometering algorithm and/or a parameter corresponding to the discriminated focusing plate from a plurality of photometering algorithms and parameters.

    Abstract translation: 一种用于照相机的测光装置,包括:测光传感器,其接收通过聚焦板透射的物体光并测量物体的亮度; 并且可拆卸地保持聚焦板的聚焦板保持装置包括:鉴别装置,其识别由聚焦板保持装置保持的聚焦板的类型;以及控制器,其选择测光算法和/或与所识别的聚焦相对应的参数 板从许多测光算法和参数。

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