公开(公告)号：US20240035881A1

公开(公告)日：2024-02-01

申请号：US18258652

申请日：2021-12-21

Applicant: Sencrop

Inventor： Bruno Boissenin ,  Jérémy Masson ,  Steven Debeire

IPC: G01J1/02 ,  G01J1/16 ,  G01J1/04

CPC classification number: G01J1/0295 ,  G01J1/16 ,  G01J1/0418 ,  G01J2001/4266

Abstract: A device, in particular, a pyranometer, for measuring solar irradiance, comprises a light detection means and a temperature measurement means, and for which the temperature measurement means is configured to measure the temperature of the light detection means, and a data processing means configured to determine the irradiance by taking into account, in situ, the temperature of the light detection means. An irradiance measurement system and an irradiance measurement method are also disclosed.

公开(公告)号：US20180081278A1

公开(公告)日：2018-03-22

申请号：US15789702

申请日：2017-10-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Olav Waldemar Vladimir FRIJNS ,  Gosse Charles DE VRIES ,  Erik Roelof LOOPSTRA ,  Vadim Yevgenyevich BANINE ,  Pieter Willem Herman DE JAGER ,  Rilpho Ludovicus DONKER ,  Han-Kwang NIENHUYS ,  Borgert KRUIZINGA ,  Wouter Joep ENGELEN ,  Otger Jan LUITEN ,  Johannes Antonius Gerardus AKKERMANS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Vladimir LITVINENKO

IPC: G03F7/20 ,  G01J1/04

CPC classification number: G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

公开(公告)号：US20180080815A1

公开(公告)日：2018-03-22

申请号：US15384102

申请日：2016-12-19

Applicant: Apple Inc.

Inventor： Aditya B. Nayak

IPC: G01J1/04 ,  G09G5/00 ,  G01J1/42 ,  G02B5/22 ,  G02B5/20 ,  G02B5/02

CPC classification number: G01J1/0474 ,  G01J1/0418 ,  G01J1/0488 ,  G01J1/4204 ,  G02B5/0242 ,  G02B5/208 ,  G02B5/223 ,  G09G5/02 ,  G09G5/10 ,  G09G2360/144

Abstract: An ambient light sensor system ma be mounted in alignment with a window in a display cover layer associated with a display in an electronic device. The ambient light sensor system may have a light diffuser layer and an infrared-light-blocking filter. The light diffuser layer may have a polymer layer with embedded light-scattering desiccant particles. An ambient light sensor in the ambient light sensor system may receive ambient light through the light diffuser layer and the infrared-light-blocking filter. The infrared-light-blocking filter may have a polymer substrate and a thin-film interference filter formed from a stack of inorganic thin-film layers on the polymer substrate. Light-scattering desiccant particles may be incorporated into the polymer substrate of the infrared-light-blocking filter. Desiccant may also be incorporated into ambient light sensor support structures.

公开(公告)号：US09897481B2

公开(公告)日：2018-02-20

申请号：US15343802

申请日：2016-11-04

Applicant: FANUC CORPORATION

Inventor： Michinori Maeda

IPC: G01J5/02 ,  G01J1/42 ,  G01J1/02 ,  G01J1/04

CPC classification number: G01J1/4257 ,  G01J1/0252 ,  G01J1/0418 ,  G01J1/0437

Abstract: A low-cost laser power sensor having sufficient measurement accuracy with respect to received light intensity of the power sensor. The power sensor has a sensor substrate which receives monitor light, and a filter which attenuates the intensity of the laser beam before being received by the sensor substrate. The filter is constituted from a material having a laser transmissivity equal to zero, and has a plurality of openings within an irradiation range where the monitor light is irradiated. A summation of opening areas of the openings is equal to or more than 50% of the irradiation range. A part of the laser beam, which is irradiated to the filter and passes through the openings, is directly received by the sensor substrate.

公开(公告)号：US09874482B2

公开(公告)日：2018-01-23

申请号：US15113839

申请日：2014-01-24

Applicant: TUBITAK (TURKIYE BILIMSEL VE TEKNOLOJIK ARASTIRMA KURUMU)

Inventor： Oguz Celikel ,  Ferhat Sametoglu

IPC: G01K17/00 ,  G01J1/42 ,  G01J1/04

CPC classification number: G01K17/003 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/0425 ,  G01J1/0448 ,  G01J1/1626 ,  G01J1/22 ,  G01J1/4257 ,  G01J2001/0481 ,  G01J2001/4238 ,  G01J2001/444

Abstract: FCIS based-LEMCS designed in this invention accomplishes both of the above proficiencies of measuring the averaged pulse energy of the Pulsed Type Laser Source and calibrating the Commercial Laser Energy Meters, which are traceably to primary level standards, FCIS based-LEMCS contains an integrating sphere having a novel port and an interior design and a series of mechanical choppers having separate Duty Cycles, each of which is rotated by an electrical motor in FCIS based-LEMCS, used for generating a chopped type laser, called as Chopped Type Laser Source, in order to provide the reference and averaged pulse energy for traceable calibration of Commercial Laser Energy Meters.

公开(公告)号：US09829376B2

公开(公告)日：2017-11-28

申请号：US14831859

申请日：2015-08-20

Applicant: National Taiwan University of Science and Technology

Inventor： Yun-Shang Chiou

IPC: H04N7/00 ,  G01J1/42 ,  G01J1/02 ,  G01J1/04

CPC classification number: G01J1/4214 ,  G01J1/0242 ,  G01J1/0418 ,  G01J1/0437 ,  G01J2001/4266

Abstract: A sky luminance mapping system includes a camera unit, two pyranometer units and a processing unit. Camera unit includes a fisheye lens to shoot image of sky dome and is equipped with light-shading devices which block the sun from the camera unit corresponding to instant location of the sun at instant time. First pyranometer unit measures daylight illuminance from the sky dome and outputs first intensity signal while the light-shading device is applied to block the sun. Second pyranometer unit measures daylight illuminance from the sky dome and outputs second intensity signal without blocking the sun. A reference intensity value is obtained by subtracting a value of the first intensity signal from a value of the second intensity signal. According to the value of the first intensity signal and the reference intensity value, a total luminance of and the luminance distribution in the image of the sky dome are corrected.

公开(公告)号：US09823572B2

公开(公告)日：2017-11-21

申请号：US14900110

申请日：2014-06-17

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich Nikipelov ,  Olav Waldemar Vladimir Frijns ,  Gosse Charles De Vries ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Pieter Willem Herman De Jager ,  Rilpho Ludovicus Donker ,  Han-Kwang Nienhuys ,  Borgert Kruizinga ,  Wouter Joep Engelen ,  Otger Jan Luiten ,  Johannes Antonius Gerardus Akkermans ,  Leonardus Adrianus Gerardus Grimminck ,  Vladimir Litvinenko

IPC: G03B27/42 ,  G03B27/58 ,  G03F7/20 ,  H01S3/09 ,  G01J1/04 ,  G02B1/06 ,  G02B5/20 ,  G21K1/10 ,  G02B26/02 ,  G01J1/26 ,  G01J1/42 ,  H05H7/04 ,  H01S3/00

CPC classification number: G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

公开(公告)号：US09823119B2

公开(公告)日：2017-11-21

申请号：US15347348

申请日：2016-11-09

Applicant: Carl Zeiss SMT GmbH

Inventor： Matthias Manger ,  Florian Baumer

IPC: G01J5/02 ,  G01J1/42 ,  G01J1/04 ,  G02B5/20 ,  H05G2/00

CPC classification number: G01J1/4257 ,  B23K26/705 ,  G01J1/0418 ,  G02B5/205 ,  H05G2/005 ,  H05G2/008

Abstract: A system and a method for analyzing a light beam guided by a beam guiding optical unit. The system has a graduated neutral density filter arrangement (120, 520), which is arranged in a far field plane of the beam guiding optical unit and has at least one graduated neutral density filter (121, 521, 522, 523) having a spatially varying transmission, and a light intensity sensor arrangement having at least one light intensity sensor (140, 540), which is arranged in a near field plane of the beam guiding optical unit and is configured to measure (141, 541, 542, 543), for each graduated neutral density filter (121, 521, 522, 523) of the graduated neutral density filter arrangement (120, 520), a light intensity transmitted by each graduated neutral density filter.

公开(公告)号：US09823115B2

公开(公告)日：2017-11-21

申请号：US15047104

申请日：2016-02-18

Applicant: PIXART IMAGING INC.

Inventor： Chi-chih Shen ,  Hui-Hsuan Chen ,  Yen-Min Chang

IPC: G02B27/00 ,  G01J1/02 ,  G01J1/04 ,  G01V8/10 ,  G01S7/491 ,  G01S17/02 ,  G01S7/481

CPC classification number: G01J1/0204 ,  G01J1/0271 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/0448 ,  G01S7/4813 ,  G01S7/4816 ,  G01S7/4918 ,  G01S17/026 ,  G01V8/10

Abstract: A packaged optical device includes a light source device emitting light to an object surface, a sensor chip receiving reflective light reflected from the object surface, and a non-lens transparency layer located in front of the sensor chip. The light and the reflective light have a first main optic axis and a second main optic axis, respectively, and the first main optic axis and the second main optic axis are configured to form the specular reflection configuration, thereby enhancing images received by the sensor chip. The non-lens transparency layer has a zone passed through by the second main optic axis, and transmittance of the zone is lower than that of other zones of the non-lens transparency layer, thereby preventing the sensor chip from being saturated.

公开(公告)号：US20170138787A1

公开(公告)日：2017-05-18

申请号：US15343802

申请日：2016-11-04

Applicant: FANUC CORPORATION

Inventor： Michinori Maeda

IPC: G01J1/42 ,  G01J1/02 ,  G01J1/04

CPC classification number: G01J1/4257 ,  G01J1/0252 ,  G01J1/0418 ,  G01J1/0437

Abstract: A low-cost laser power sensor having sufficient measurement accuracy with respect to received light intensity of the power sensor. The power sensor has a sensor substrate which receives monitor light, and a filter which attenuates the intensity of the laser beam before being received by the sensor substrate. The filter is constituted from a material having a laser transmissivity equal to zero, and has a plurality of openings within an irradiation range where the monitor light is irradiated. A summation of opening areas of the openings is equal to or more than 50% of the irradiation range. A part of the laser beam, which is irradiated to the filter and passes through the openings, is directly received by the sensor substrate.