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公开(公告)号：US20180351320A1
公开(公告)日：2018-12-06
申请号：US16058180
申请日：2018-08-08
Applicant: GIGAPHOTON INC.
Inventor： Tatsuya YANAGIDA , Osamu WAKABAYASHI
CPC classification number: H01S3/10061 , H01S3/08054 , H01S3/08059 , H01S3/2308 , H01S3/2383 , H01S2301/20 , H05G2/003 , H05G2/008
Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.
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公开(公告)号：US20180351318A1
公开(公告)日：2018-12-06
申请号：US16101061
申请日：2018-08-10
Applicant: Gigaphoton Inc.
Inventor： Tooru ABE
Abstract: A laser device may include a light source configured to emit a laser beam in burst operation, an optical sensor configured to acquire a cross sectional image of the laser beam during a certain period for every certain cycle, an image processor configured to receive an input of an image signal of the cross sectional image outputted from the optical sensor and output beam relating information about the laser beam, a beam traveling direction adjuster configured to adjust a traveling direction of the laser beam, and a controller configured to control the beam traveling direction adjuster based on the beam relating information when at least a part of a period in which the optical sensor acquires the cross sectional image is overlapped with a period in which the light source emits a laser beam.
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公开(公告)号：US10111312B2
公开(公告)日：2018-10-23
申请号：US15807067
申请日：2017-11-08
Applicant: Gigaphoton Inc.
Inventor： Toru Suzuki , Kotaro Miyashita , Yoshifumi Ueno , Takuya Ishii
IPC: H05G2/00
Abstract: Output timing of laser light is controlled with high accuracy. An extreme ultraviolet light generation device may include a chamber in which plasma is generated to generate extreme ultraviolet light, a window provided in the chamber, an optical path pipe connected to the chamber, a light source disposed in the optical path pipe and configured to output light into the chamber via the window, a gas supply unit configured to supply gas into the optical path pipe, and an exhaust port configured to discharge the gas in the optical path pipe to an outside of the optical path pipe.
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公开(公告)号：US10074956B2
公开(公告)日：2018-09-11
申请号：US15352543
申请日：2016-11-15
Applicant: GIGAPHOTON INC.
Inventor： Tatsuya Yanagida , Osamu Wakabayashi
CPC classification number: H01S3/10061 , H01S3/08054 , H01S3/08059 , H01S3/2308 , H01S3/2383 , H01S2301/20 , H05G2/003 , H05G2/008
Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.
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公开(公告)号：US20180242441A1
公开(公告)日：2018-08-23
申请号：US15956983
申请日：2018-04-19
Applicant: Gigaphoton Inc.
Inventor： Tatsuya YANAGIDA , Osamu WAKABAYASHI
IPC: H05G2/00 , H01S3/223 , H01S3/23 , H01S3/107 , H01S3/06 , H01S3/08 , H01S3/11 , H01S3/16 , H01S3/00
Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.
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Patent Agency Ranking
公开(公告)号：US10028366B2
公开(公告)日：2018-07-17
申请号：US15645295
申请日：2017-07-10
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Fumio Iwamoto , Kazukiyo Kamikanna
Abstract: An EUV light generation device generates EUV light stably. The EUV light generation device may include a chamber in which extreme ultraviolet light is generated when a target is irradiated with laser light in a predetermined region inside the chamber, a target supply device configured to output the target to the predetermined region in the chamber to thereby supply the target to the predetermined region, and a target recovery apparatus configured to recover the target output from the target supply device and not irradiated with the laser light. The target recovery apparatus may include a receiver disposed to be inclined with respect to a trajectory of the target output from the target supply device, the receiver being configured to receive the target by allowing the target not irradiated with the laser light to collide with the receiver, and an excitation device configured to vibrate the receiver.
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公开(公告)号：US20180199422A1
公开(公告)日：2018-07-12
申请号：US15912628
申请日：2018-03-06
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU
CPC classification number: H05G2/008 , G03F7/70033 , H05G2/00 , H05G2/006
Abstract: An extreme ultraviolet light generating system repetitively outputs extreme ultraviolet light emitted by a target that turns into plasma by being irradiated with a pulsed laser beam. The extreme ultraviolet light generating system may include: a target supply unit that sequentially supplies the target to a plasma generating region set within a chamber, an actuator connected to a laser beam focusing system that focuses the pulsed laser beam output from a laser apparatus that adjusts the focusing position of the pulsed laser beam, an extreme ultraviolet light generation controller that controls the extreme ultraviolet light generating system to output extreme ultraviolet light based on a burst pattern, and an actuator controller that controls the actuator to compensate for shifts of the focusing position of the pulsed laser beam during a burst operation by feedforward control.
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公开(公告)号：US20180173102A1
公开(公告)日：2018-06-21
申请号：US15888109
申请日：2018-02-05
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU
Abstract: An extreme ultraviolet light generation device may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target with laser light output by a laser device, in a generation region therein; a target supply unit configured to output the target as a droplet toward the generation region; a droplet detector configured to detect the droplet in a detection region; and a controller. The droplet detector may transmit, to the controller, a pass timing signal indicating a timing when the droplet passes through the detection region. The controller may include a noise compensation unit configured to compensate for noise of the pass timing signal caused by an electromagnetic wave from the plasma, and transmit a trigger signal that gives a trigger to output the laser light to the laser device based on the pass timing signal in which the noise is compensated for.
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公开(公告)号：US20180160518A1
公开(公告)日：2018-06-07
申请号：US15888111
申请日：2018-02-05
Applicant: Gigaphoton Inc.
Inventor： Yutaka SHIRAISHI , Toshihiro NISHISAKA , Toshiyuki HIRASHITA , Takuya ISHII
IPC: H05G2/00
Abstract: A target storage device may include a tank configured to store a target that generates extreme ultraviolet light when being irradiated with laser light, a heater connected with the tank and configured to heat the tank, and a radiation member disposed to cover at least a part of the tank connected with the heater and configured to reflect heat radiation from the tank and the heater toward the tank.
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公开(公告)号：US20180146536A1
公开(公告)日：2018-05-24
申请号：US15860137
申请日：2018-01-02
Applicant: Gigaphoton Inc.
Inventor： Toru SUZUKI , Tamotsu ABE , Osamu WAKABAYASHI , Tatsuya YANAGIDA
CPC classification number: H05G2/008 , G03F7/70033 , H05G2/003 , H05G2/005
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.
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