公开(公告)号：US08126117B2

公开(公告)日：2012-02-28

申请号：US12699493

申请日：2010-02-03

Applicant: Boris Verman ,  Michael Young ,  Licai Jiang

Inventor： Boris Verman ,  Michael Young ,  Licai Jiang

IPC: H01J35/04 ,  H01J35/30 ,  G21K1/00 ,  G21K1/02

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A multi-beam x-ray system includes an x-ray source which emits x-rays and a housing with a first part and a second part. The second part is moveable relative to the first part and includes a plurality of optics of different performance characteristics. Each optic, through the movement of the second part relative to the first part, is positioned to a working position so that the optic receives the x-rays from the x-ray source and directs the x-rays with the desired performance attributes to a desired location.

Abstract translation: 多光束X射线系统包括发射x射线的X射线源和具有第一部分和第二部分的壳体。 第二部分可相对于第一部分移动，并且包括具有不同性能特征的多个光学元件。 每个光学元件通过第二部分相对于第一部分的移动被定位到工作位置，使得光学器件接收来自x射线源的x射线，并将具有所需性能属性的x射线引导到 理想位置。

公开(公告)号：US08050382B2

公开(公告)日：2011-11-01

申请号：US12391677

申请日：2009-02-24

Applicant: Zewu Chen ,  Rory Delaney ,  Kai Xin

Inventor： Zewu Chen ,  Rory Delaney ,  Kai Xin

IPC: G01N23/223

CPC classification number: G01N23/223 ,  G01N2223/076 ,  G21K2201/064

Abstract: An x-ray analysis system with an x-ray source for producing an x-ray excitation beam directed toward an x-ray analysis focal area; and a sample chamber for presenting a fluid sample to the x-ray analysis focal area. The x-ray excitation beam is generated by an x-ray engine and passes through an x-ray transparent barrier on a wall of the chamber, to define an analysis focal area within space defined by the chamber. The fluid sample is presented as a stream suspended in the space and streaming through the focal area, using a laminar air flow and/or pressure to define the stream. The chamber's barrier is therefore separated from both the focal area and the sample, resulting in lower corruption of the barrier.

Abstract translation: 一种具有用于产生朝向x射线分析焦点区域的x射线激发光束的x射线源的x射线分析系统; 以及用于将流体样品呈现到X射线分析焦点区域的样品室。 x射线激发光束由x射线引擎产生，并通过腔室壁上的x射线透明屏障，以在腔体限定的空间内限定分析焦点区域。 流体样品以悬浮在该空间中的流呈现，并通过层流气流和/或压力流过聚焦区域以限定流。 因此，室的屏障与焦点区域和样品分离，导致屏障的腐蚀减少。

公开(公告)号：US20110226745A1

公开(公告)日：2011-09-22

申请号：US13048454

申请日：2011-03-15

Applicant: Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC: B23K26/04

CPC classification number: G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外线发生系统可以包括：室 入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个 光学元件 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US20110206187A1

公开(公告)日：2011-08-25

申请号：US12710064

申请日：2010-02-22

Applicant: Susanne Madeline Lee ,  Peter Michael Edic ,  Vanita Mani ,  Forrest Frank Hopkins ,  Eberhard Neuser

Inventor： Susanne Madeline Lee ,  Peter Michael Edic ,  Vanita Mani ,  Forrest Frank Hopkins ,  Eberhard Neuser

IPC: H01J35/06 ,  G21K5/04 ,  H01J35/14

CPC classification number: G21K1/067 ,  A61N5/1084 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A system for producing at least one high flux photon beam is provided. The system includes two or more photon sources configured to produce photon beams, and at least one first stage optic device coupled to at least one of the photon sources and providing at least one focused photon beam through total internal reflection, wherein at least one of the photon beams and the focused photon beams are combined at a virtual focal spot.

Abstract translation: 提供了一种用于产生至少一个高通量光子束的系统。 该系统包括被配置为产生光子束的两个或更多个光子源，以及耦合到至少一个光子源的至少一个第一级光学器件，并且通过全内反射提供至少一个聚焦光子束，其中至少一个 光子束和聚焦光子束在虚拟焦斑处组合。

公开(公告)号：US20110170666A1

公开(公告)日：2011-07-14

申请号：US12920641

申请日：2009-03-03

Applicant: Zewu Chen ,  David M. Gibson ,  Walter M. Gibson ,  Adam Bailey ,  R. Scott Semken ,  Kai Xin ,  John H. Burdett

Inventor： Zewu Chen ,  David M. Gibson ,  Walter M. Gibson ,  Adam Bailey ,  R. Scott Semken ,  Kai Xin ,  John H. Burdett

IPC: G21K1/06 ,  G01T1/36

CPC classification number: G21K1/06 ,  G01N23/20008 ,  G01N23/223 ,  G01N2223/076 ,  G01N2223/1003 ,  G01N2223/315 ,  G01N2223/423 ,  G21K2201/062 ,  G21K2201/064 ,  H05G1/04

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced having a characteristic first energy, and bremsstrahlung energy; a first x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam; and a second x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam to a second energy. The first x-ray optic may monochromate characteristic energy from the source spot, and the second x-ray optic may monochromate bremsstrahlung energy from the source spot. The x-ray optics may be curved diffracting optics, for receiving the diverging x-ray beam from the x-ray tube and focusing the beam at the sample spot. Detection is also provided to detect and measure various toxins in, e.g., manufactured products including toys and electronics.

Abstract translation: 一种用X射线束照射样品斑点的X射线分析装置。 提供具有源极点的X射线管，从该源点产生具有特征的第一能量和bre致辐射能量的发散X射线束; 第一x射线光学器件接收发散的X射线束并将光束引向样品斑点，同时对光束进行单色; 并且第二x射线光学器件接收发散的X射线束并将光束引向样品斑点，同时将光束单色化为第二能量。 第一个X射线光学元件可以对来自源光斑的特征能量进行单色化，第二个X射线光学元件可以从源光点单色bre致辐射能量。 x射线光学元件可以是弯曲的衍射光学器件，用于从X射线管接收发散的X射线束并将光束聚焦在样品点处。 还提供检测以检测和测量例如包括玩具和电子产品在内的制造产品中的各种毒素。

公开(公告)号：US20110135059A1

公开(公告)日：2011-06-09

申请号：US12926607

申请日：2010-11-30

Applicant: Christoph Ollinger

Inventor： Christoph Ollinger

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/064

Abstract: An X-ray optical configuration (1), comprising a position for an X-ray source (2), a position for a sample (3), a first focusing element (4) for directing X-ray radiation from the position of the X-ray source (2) via an intermediate focus (5) onto the position of the sample (3), and an X-ray detector (6) that can be moved on a circular arc (7) of radius R around the position of the sample (3), is characterized in that the configuration also comprises a second focusing element (8) for directing part of the X-ray radiation emanating from the intermediate focus (5) onto the position of the sample (3), and an aperture system (9) for selecting between illumination of the position of the sample (3) exclusively and directly from the intermediate focus (5) (=first optical path (10′)), or exclusively via the second focusing element (8) (=second optical path (10″)). The configuration facilitates changing between reflection geometry and transmission geometry, in particular, wherein modification and adjustment devices are minimized or unnecessary.

Abstract translation: 一种X射线光学配置（1），包括用于X射线源（2）的位置，用于样本的位置（3），用于从X射线源的位置引导X射线辐射的第一聚焦元件（4） X射线源（2）经由中间焦点（5）到样品（3）的位置，以及X射线检测器（6），其可以在半径为R的圆弧（7）周围位置 样品（3）的特征在于，该构造还包括用于将从中间焦点（5）发出的X射线辐射的一部分引导到样品（3）的位置的第二聚焦元件（8），以及 一个光圈系统（9），用于选择专用于和直接来自中间聚焦（5）（=第一光路（10'））的样品（3）的位置的照明，或仅通过第二聚焦元件（8） （=第二光路（10“））。 该配置便于在反射几何形状和透射几何之间进行改变，特别地，其中修改和调节装置被最小化或不必要。

公开(公告)号：US20110128513A1

公开(公告)日：2011-06-02

申请号：US12592736

申请日：2009-12-02

Applicant: Marco Pedrali ,  Ricardo Ghislanzoni

Inventor： Marco Pedrali ,  Ricardo Ghislanzoni

IPC: G03B27/52 ,  F28D15/00 ,  F28F9/02 ,  B21D53/02

CPC classification number: G21K1/06 ,  C25D1/02 ,  C25D1/22 ,  C25D5/02 ,  C25D5/14 ,  G02B7/1815 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70175 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  Y10T29/4935

Abstract: A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines (30) arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface.Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

Abstract translation: 公开了一种用于具有至少一个具有后表面（22）的外壳（20）的极紫外（EUV）掠入射收集器（GIC）反射镜组件（240）的冷却系统（10）。 冷却系统具有多个间隔开的圆形配置的冷却管线（30），它们布置在垂直于壳体中心轴线（AC）并且与背面表面热交换并且在其周围流动的平行平面（PL）中。 输入和输出二次冷却流体歧管（44,46）分别流体地连接到多个冷却管线，以将冷却流体从输入的二次冷却流体歧管流到输出冷却次要流体歧管两个半圆的路径，以进行每个冷却 线。 分离冷却液输入和输出位置可减少热梯度，从而导致壳体局部表面变形，从而导致聚焦性能降低。

公开(公告)号：US07841212B2

公开(公告)日：2010-11-30

申请号：US11799936

申请日：2007-05-02

Applicant: Hexin Wang ,  Kurt Becker ,  Lutz Autschbach

Inventor： Hexin Wang ,  Kurt Becker ,  Lutz Autschbach

IPC: C03B23/00 ,  C03B23/025 ,  G01N23/20

CPC classification number: C03B23/0252 ,  C03B23/203 ,  C03B23/22 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  Y10S359/90

Abstract: A method for producing a shaped body (10) made of glass or glass ceramics comprises the steps of: (a) placing at least two glass blanks (12a, 12b) side by side on a shaped surface (14) of a temperature-resistant sagging mold (13); (b) sagging the glass blanks (12a, 12b) onto the shaped surface (14) by heating the sagging mold (13) and the glass blanks (12a, 12b); (c) attaching the sagged glass blanks (10a, 10b) to each other in order to form the shaped body (10); and (d) lifting the shaped body (10) from the sagging mold (13). A shaped body (10) comprises at least two glass blanks (10a, 10b) attached side by side and formed by sagging.

Abstract translation: 一种由玻璃或玻璃陶瓷制成的成形体（10）的制造方法，包括以下步骤：（a）将至少两块玻璃坯料（12a，12b）并排设置在耐温的成形表面（14）上 下垂模具（13）; （b）通过加热下垂模具（13）和玻璃坯料（12a，12b）将玻璃坯料（12a，12b）下垂到成形表面（14）上; （c）将下垂的玻璃坯料（10a，10b）彼此连接以形成成形体（10）; 和（d）将成形体（10）从下垂模具（13）提起。 成形体（10）包括至少两个玻璃坯料（10a，10b）并排并且通过下垂形成。

公开(公告)号：US20100231882A1

公开(公告)日：2010-09-16

申请号：US12726081

申请日：2010-03-17

Applicant: Udo Dinger ,  Christopher Weth

Inventor： Udo Dinger ,  Christopher Weth

IPC: G03B27/54 ,  G02B5/10 ,  G02B5/09 ,  G02B7/185

CPC classification number: G03F7/70175 ,  G02B5/0891 ,  G02B5/09 ,  G03F7/70083 ,  G03F7/70116 ,  G03F7/702 ,  G21K2201/064

Abstract: A bundle-guiding optical collector collects an emission of a radiation source and forms a radiation bundle from the collected emission. A reflective surface of the collector is the first bundle-forming surface downstream of the radiation source. The reflective surface is formed such that it converts the radiation source into a family of images in a downstream plane. The family of images includes a plurality of radiation source images which are offset to each other in two dimensions (x, y) in a direction perpendicular to the beam direction of the transformed radiation bundle and are arranged relative to each other in a non-rotationally symmetric manner relative to the beam direction of the transformed radiation bundle. The transformed radiation bundle in the downstream plane has a non-rotationally symmetric bundle edge contour relative to the beam direction of the transformed radiation bundle. The result is a collector in which the radiation bundle shape generated by the collector. In other words, the illumination distribution generated by the collector in a defined manner in the plane downstream of the collector has a shape which is freely selectable to the greatest possible extent.

Abstract translation: 束引导光学收集器收集辐射源的发射并从收集的发射形成辐射束。 收集器的反射表面是辐射源下游的第一束形成表面。 反射表面形成为使得其在下游平面中将辐射源转换成一系列图像。 图像系列包括在垂直于变换辐射束的光束方向的方向上以二维（x，y）彼此偏移的多个辐射源图像，并且以非旋转方式相对于彼此布置 相对于变换辐射束的束方向的对称方式。 下游平面中的变换的辐射束相对于变换的辐射束的光束方向具有非旋转对称的束边缘轮廓。 其结果是由收集器产生的辐射束形状的收集器。 换句话说，集电体在集电体下游的平面中以规定的方式产生的照明分布具有可以最大可能地自由选择的形状。

公开(公告)号：US20100226477A1

公开(公告)日：2010-09-09

申请号：US12280136

申请日：2007-02-08

Applicant: Hiromoto Nakazawa ,  Hideki Yoshikawa ,  Aurel-Mihai Vlaicu ,  Kenichi Obori ,  Shintaro Komatani ,  Sumito Ohzawa

Inventor： Hiromoto Nakazawa ,  Hideki Yoshikawa ,  Aurel-Mihai Vlaicu ,  Kenichi Obori ,  Shintaro Komatani ,  Sumito Ohzawa

IPC: G21K5/00 ,  G21K1/02

CPC classification number: G21K1/06 ,  G21K2201/064

Abstract: An X-ray convergence element and an X-ray irradiation device including the X-ray convergence element are provided. The X-ray convergence element can extend a working distance from an exit-side opening end thereof to a specimen, and can perform analysis of the specimen with rough surface, a fluorescent X-ray analysis, and a X-ray diffraction analysis, regardless of a size of the specimen. An X-ray blocking member 23 is provided with three supporting members 233 for supporting the X-ray blocking member 23, which extend from an annular member 232 having approximately the same diameter as a diameter of an entrance-side opening end (outer diameter of a capillary 20) toward the center of the X-ray blocking member 23 to fix the annular member 232 to the capillary 20. The annular member 232, the supporting members 233, and the X-ray blocking member 23 are integrally formed of a metal that shields X-rays, such as tantalum, tungsten, or molybdenum. A dimension of the X-ray blocking member 23 in the axial direction (thickness) is set to be sufficient for blocking X-rays.

Abstract translation: 提供了包括X射线会聚元件的X射线会聚元件和X射线照射装置。 X射线会聚元件可以将其出口侧开口端的工作距离延伸到试样，并且可以进行具有粗糙表面，荧光X射线分析和X射线衍射分析的样品的分析 的样本大小。 X射线阻挡构件23设置有用于支撑X射线阻挡构件23的三个支撑构件233，其从具有与入口侧开口端的直径大致相同直径的环形构件232延伸（外径 毛细管20）朝向X射线阻挡构件23的中心，以将环形构件232固定到毛细管20.环形构件232，支撑构件233和X射线阻挡构件23由金属 屏蔽X射线，如钽，钨或钼。 X射线阻挡构件23的轴向（厚度）的尺寸被设定为足以阻挡X射线。