公开(公告)号：US20080291421A1

公开(公告)日：2008-11-27

申请号：US12120747

申请日：2008-05-15

Applicant: Takafumi Miyaharu

Inventor： Takafumi Miyaharu

IPC: G03F7/20 ,  G01J1/00 ,  G01J1/42

CPC classification number: G03F7/7085 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70508 ,  G03F7/70666

Abstract: The present invention provides an exposure apparatus which exposes a substrate via a liquid, comprising a measurement substrate includes a transmission part configured to transmit a light beam having passed through a projection optical system, a light-receiving unit including a light-receiving surface configured to receive the light beam transmitted through the liquid and the transmission part, and a calculator configured to arithmetically convert a light intensity distribution, on the light-receiving surface, of the light beam received by the light-receiving surface into a light intensity distribution on a pupil plane of the projection optical system, based on information indicating a correlation between a position coordinate on the light-receiving surface and a position coordinate on the pupil of the projection optical system.

Abstract translation: 本发明提供了一种通过液体曝光基板的曝光装置，包括测量基板，包括被配置为透射通过投影光学系统的光束的透射部分，包括受光面的光接收单元，所述光接收单元被配置为 接收通过液体和透射部分透射的光束，以及计算器，被配置为将由光接收表面接收的光束的受光面上的光强度分布计算成光强度分布 基于指示受光面的位置坐标与投影光学系统的光瞳上的位置坐标之间的相关性的信息，投影光学系统的光瞳面。

公开(公告)号：US07433030B2

公开(公告)日：2008-10-07

申请号：US11443599

申请日：2006-05-31

Applicant: Jeffrey M. Waldo ,  Walter Page Hatch ,  George D. Cimino ,  Peter Stark

Inventor： Jeffrey M. Waldo ,  Walter Page Hatch ,  George D. Cimino ,  Peter Stark

IPC: G01J1/00

CPC classification number: A61L2/0011 ,  A61L2/07 ,  A61L2/081 ,  A61L2/087 ,  A61L2/10 ,  A61L2/24 ,  A61L2/28 ,  A61L2202/122 ,  A61L2202/14 ,  A61M1/0209 ,  A61M1/0277 ,  A61M1/3681 ,  A61M1/3683 ,  A61M1/3686 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/326 ,  G01J1/32 ,  G01J1/4228 ,  G01J1/429 ,  G01J1/44

Abstract: Apparatus (10), systems and methods are disclosed for treating a biological fluid with light. A container (206) of biological fluid is introduced into a fluid treatment chamber (40) where it is contacted with light provided by one or more light sources (60, 70) in proximity to the fluid treatment chamber (40). A light sensing system (650) senses the intensity of illumination of the light. A radiometer (460) may be inserted into fluid treatment chamber (40) to calibrate the light sensing system (650). An electronic control system (600) utilizes an interface circuit board (606) to interface a computer circuit board (602) to a display panel (37), a user interface panel (39, 39a), a relay circuit board (640), light sensors 404 and various other sensors (649). A detector (385) senses agitating movement of a tray (90) that contains biological fluids. Methods include calibrating (781-785), sensing (770-773) and correcting (774-775) light intensity measurements, and determining the length of treatment (776) to reach a desired illumination dose. A radiometer (460) is equipped with a plurality of light sensors (469) disposed on both sides to measure light intensity in chamber (40) and to provide a reference for calibrating light sensing system (650).

Abstract translation: 公开了用于用光处理生物流体的装置（10），系统和方法。 将生物流体的容器（206）引入到流体处理室（40）中，在该处理室（40）中，其与靠近流体处理室（40）的一个或多个光源（60,70）提供的光接触。 光感测系统（650）感测光的照明强度。 可以将辐射计（460）插入到流体处理室（40）中以校准光感测系统（650）。 电子控制系统（600）利用接口电路板（606）将计算机电路板（602）与显示面板（37），用户界面面板（39,39a），中继电路板（640） ，光传感器404和各种其它传感器（649）。 检测器（385）感测包含生物流体的托盘（90）的搅动运动。 方法包括校准（781 - 785），感测（770 - 773）和校正（774 - 775）光强度测量，并确定治疗长度（776）以达到所需的照射剂量。 辐射计（460）配备有设置在两侧的多个光传感器（469），以测量室（40）中的光强度并提供用于校准光感测系统（650）的参考。

公开(公告)号：US20080237500A1

公开(公告)日：2008-10-02

申请号：US11694347

申请日：2007-03-30

Applicant: SERGIY ZALYUBOVSKIY ,  WILLIAM PAUL MINNEAR ,  VIKAS MIDHA

Inventor： SERGIY ZALYUBOVSKIY ,  WILLIAM PAUL MINNEAR ,  VIKAS MIDHA

IPC: G01J1/00 ,  C09K11/08

CPC classification number: G01J5/522

Abstract: A thermo-optically functional composition is disclosed. The composition includes components A, B, C, and D, and has a thermal emission or reflection spectrum that is altered with respect to a thermal emission or reflection spectrum of a composition ABn and a thermal emission or reflection spectrum of a composition CDp, where at least A is different from C or B is different from D.

Abstract translation: 公开了一种热光学功能组合物。 该组合物包含组分A，B，C和D，并且具有相对于组合物AB的热发射或反射光谱而改变的热发射或反射光谱，以及热发射或反射光谱 组合物CD的反射光谱，其中至少A不同于C或B不同于D.

公开(公告)号：US20080237499A1

公开(公告)日：2008-10-02

申请号：US10599251

申请日：2005-03-23

Applicant: Richard Auchterlonie

Inventor： Richard Auchterlonie

IPC: G01J1/00

CPC classification number: H05H1/46 ,  H02J4/00 ,  H02J17/00 ,  H05H2001/4682

Abstract: A pulsed power system has an inductive energy storage circuit (42) including a current source (43) and a plasma opening switch (44). The plasma opening switch has a transmission line (51, 52) coupling the current source to a load (41). The plasma opening switch changes from a closed state to an open state when a plasma discharge (45) in the plasma opening switch is driven by magnetic force from a first region along the transmission line to a second region towards the load. Electrical conductors (47, 48) are arranged for providing a stabilizing magnetic field configuration in the first region to magnetically latch the plasma discharge in the first region during charging of the inductive energy storage circuit, and current flowing along the transmission line from the current source to the load tends to disrupt the stabilizing magnetic field configuration and unlatch the plasma discharge from the first region and drive the plasma discharge toward the second region.

Abstract translation: 脉冲电源系统具有包括电流源（43）和等离子体开启开关（44）的感应能量存储电路（42）。 等离子体打开开关具有将电流源耦合到负载（41）的传输线（51,52）。 当等离子体开启开关中的等离子体放电（45）由沿着传输线的第一区域的磁力驱动到朝向负载的第二区域时，等离子体打开开关从闭合状态变为打开状态。 布置电导体（47,48）以在第一区域中提供稳定磁场结构，以在感应能量存储电路充电期间磁性地锁住第一区域中的等离子体放电，以及沿着来自电流源的传输线流动的电流 负载倾向于破坏稳定磁场配置并且解除来自第一区域的等离子体放电并将等离子体放电驱动到第二区域。

公开(公告)号：US20080212025A1

公开(公告)日：2008-09-04

申请号：US12048788

申请日：2008-03-14

Applicant: Oliver Baumann ,  Jesus Miguel Cabeza Guillen ,  Michael Claus ,  Markus Haidl ,  Gerhard Kelch ,  Timo Kratzer ,  Herbert Krug ,  Peter Schnitzer ,  Hexin Wang

Inventor： Oliver Baumann ,  Jesus Miguel Cabeza Guillen ,  Michael Claus ,  Markus Haidl ,  Gerhard Kelch ,  Timo Kratzer ,  Herbert Krug ,  Peter Schnitzer ,  Hexin Wang

IPC: A61B3/10 ,  G01J1/00

CPC classification number: G02C7/083 ,  G02C7/101

Abstract: An optical observation instrument, in particular a spectacle, a reading aid or a telescope, comprises an optical element, in particular a spectacle lens, adapted to be controllably adjustable in its refractive power, a sensor, and a control unit for adjusting the refractive power as a function of signals from the sensor. The sensor is a brightness sensor. In a method of controllably adjusting a refractive power of an optical element in an optical observation instrument an optical parameter is captured by means of a sensor and the refractive power is adjusted as a function of a signal from the sensor. By means of the sensor the brightness of the light impinging on the optical instrument is captured.

Abstract translation: 光学观察仪器，特别是眼镜，阅读辅助器具或望远镜，其特征在于，包括适于在屈光力中可控地调整的光学元件，特别是眼镜镜片，用于调节折射力的控制单元 作为来自传感器的信号的函数。 传感器是亮度传感器。 在可调节地调节光学观察仪器中的光学元件的屈光力的方法中，通过传感器捕获光学参数，并且根据来自传感器的信号调节折射光焦度。 通过传感器捕获入射到光学仪器上的光的亮度。

公开(公告)号：US07397546B2

公开(公告)日：2008-07-08

申请号：US11370605

申请日：2006-03-08

Applicant: Aaron Weber ,  David H. Tracy

Inventor： Aaron Weber ,  David H. Tracy

IPC: G01J1/00

CPC classification number: G01J1/4257 ,  G01J1/04 ,  G01J1/0407 ,  G01J1/0414 ,  G01J1/0437 ,  G01J2001/4261

Abstract: A method of increasing the spatial uniformity of the detected intensity of a beam of light from a laser in a system including the laser and a light detector. In one embodiment the method includes the steps of generating a beam of light with the laser; and moving the beam of light and the light detector relative to each other, such that the detector averages the spatial intensity of the beam of light over time. In another embodiment the invention relates to a system for increasing the detected spatial uniformity of the intensity of a beam of light. In one embodiment the system comprises a light detector; a laser source for generating the beam of light; and a means for moving the beam of light and the detector relative to one another such that the detector averages the intensity of the light beam over time.

Abstract translation: 一种增加在包括激光器和光检测器的系统中来自激光器的光束的检测强度的空间均匀性的方法。 在一个实施例中，该方法包括以下步骤：用激光产生光束; 并且相对于彼此移动光束和光检测器，使得检测器随时间平均光束的空间强度。 在另一个实施例中，本发明涉及一种用于增加检测到的光束的强度的空间均匀性的系统。 在一个实施例中，系统包括光检测器; 用于产生光束的激光源; 以及用于相对于彼此移动光束和检测器的装置，使得检测器随着时间平均光束的强度。

公开(公告)号：US20080144021A1

公开(公告)日：2008-06-19

申请号：US11641930

申请日：2006-12-18

Applicant: Bradley M. Haskett

Inventor： Bradley M. Haskett

IPC: G01J1/00

CPC classification number: G01J1/02 ,  G01J1/0252 ,  G01J1/42 ,  G01J2001/4247

Abstract: A system for testing a lighting diode includes one or more nozzles, a probe, and a detector, where the lighting diode is operable to emit light in response to a current. The one or more nozzles direct a cooling fluid towards the lighting diode. The probe applies a current to the lighting diode. The detector detects the light emitted by the lighting diode in response to the current.

Abstract translation: 用于测试照明二极管的系统包括一个或多个喷嘴，探针和检测器，其中照明二极管可操作以响应于电流发光。 一个或多个喷嘴将冷却流体引向照明二极管。 探头将电流施加到照明二极管。 检测器响应于电流检测发光二极管发出的光。

公开(公告)号：US07379153B2

公开(公告)日：2008-05-27

申请号：US10356727

申请日：2003-02-03

Applicant: Johannes Gerardus Gijsbertsen ,  Pieter Willem Horman De Jager ,  Michiel David Nijkerk

Inventor： Johannes Gerardus Gijsbertsen ,  Pieter Willem Horman De Jager ,  Michiel David Nijkerk

IPC: G03B27/00 ,  G01J1/00

CPC classification number: G03F9/7053

Abstract: A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and beam of radiation, and is an off-axis alignment sensor.

Abstract translation: 光刻投影装置包括一个对准传感器，该对准传感器具有一个电子束源，该电子束源被构造和布置成提供一个电子束，用于冲击基板上的一个对准标记;以及一个后向散射电子检测器，被构造和布置成检测从该对准反向散射的电子 标记。 对准传感器与投影系统和辐射束无关，是离轴对准传感器。

公开(公告)号：US07378669B2

公开(公告)日：2008-05-27

申请号：US10902259

申请日：2004-07-30

Applicant: Martinus Cornelis Maria Verhagen

Inventor： Martinus Cornelis Maria Verhagen

IPC: G01J1/00 ,  G02B5/00

CPC classification number: G03F7/70808 ,  G03F7/70883 ,  G03F7/70933 ,  G03F7/70975

Abstract: A lithographic projection apparatus includes a beam path for a beam of radiation, a projection system, a support structure for supporting a patterning device and a substrate holder for holding a substrate. The beam path includes a radiation system for providing the beam of radiation, and the projection system projects the beam of radiation patterned by the patterning device onto a target portion on the substrate. At least one chamber that includes at least part of the beam path. A purge gas supply subsystem is coupled to the chamber for supplying a flow of purge gas to the chamber, and a control unit is arranged to switch the purge gas supply subsystem between at least two different modes of operation. The control unit controls the purge gas supply subsystem to supply mutually different respective non-zero flow rates of the purge gas to the chamber in the different modes of operation.

Abstract translation: 光刻投影装置包括用于辐射束的光束路径，投影系统，用于支撑图案形成装置的支撑结构和用于保持基板的基板保持器。 光束路径包括用于提供辐射束的辐射系统，并且投影系统将由图案形成装置图案化的辐射束投射到基板上的目标部分上。 至少一个腔室，其包括至少一部分光束路径。 净化气体供应子系统耦合到室，用于向室提供净化气体流，并且控制单元布置成在至少两种不同操作模式之间切换净化气体供应子系统。 控制单元控制净化气体供应子系统，以在不同的操作模式中将净化气体相应的非零流率提供给室。

公开(公告)号：US20080100829A1

公开(公告)日：2008-05-01

申请号：US11689416

申请日：2007-03-21

Applicant: Mathew David Watson

Inventor： Mathew David Watson

IPC: G01J1/00

CPC classification number: G01B11/0608

Abstract: A surface height and focus sensing system is provided. In one embodiment, an illumination focus sensor is used in combination with a collimation adjustment element which drives the system such that an illumination focus height matches the workpiece surface height, which produces a null output from the illumination focus sensor. Under the null condition, the amount of collimation adjustment is directly related to the workpiece surface height, and the resulting height determination is relatively insensitive to the workpiece surface optical properties. In one embodiment, the amount of collimation adjustment is determined according to the control signal for the collimation adjustment element. In another embodiment, a collimation adjustment sensor is utilized to measure the amount of collimation adjustment.

Abstract translation: 提供了表面高度和焦点感测系统。 在一个实施例中，照明聚焦传感器与准直调整元件组合使用，该准直调节元件驱动系统，使得照明焦点高度与工件表面高度相匹配，从而产生来自照明聚焦传感器的零输出。 在零点条件下，准直调整量与工件表面高度直接相关，所得到的高度确定对工件表面的光学性能相对不敏感。 在一个实施例中，根据准直调节元件的控制信号确定准直调整量。 在另一个实施例中，使用准直调节传感器来测量准直调整量。