公开(公告)号：US10061198B2

公开(公告)日：2018-08-28

申请号：US14907399

申请日：2014-07-25

Applicant: ACQUANDAS GMBH

Inventor： Rodrigo Lima De Miranda

IPC: A61B17/32 ,  G03F7/40 ,  G03F7/00 ,  G03F7/20 ,  A61L31/02 ,  A61L31/08 ,  H01L21/00 ,  A61F2/82 ,  A61B17/00

CPC classification number: G03F7/40 ,  A61B17/32 ,  A61B2017/00526 ,  A61F2/82 ,  A61L31/022 ,  A61L31/088 ,  A61L2400/16 ,  A61L2420/02 ,  G03F7/00 ,  G03F7/0035 ,  G03F7/0037 ,  G03F7/201 ,  H01L21/00

Abstract: A medical device with structure elements is made by providing a substrate; optionally depositing a layer of a sacrificial material on the substrate; and applying of a photoresist layer to the substrate. The layer of sacrificial material and structuring of the photoresist layer according to the shape of the structure elements are produced such that first free spaces are formed which are open on the side facing away from the substrate and are delimited by side faces of the photoresist layer. An angle is set between the side faces and the substrate. Sacrificial material is deposited in the first free spaces so first mask elements from sacrificial material are adapted to the inner contour of the first free spaces. The photoresist layer is removed so that second free spaces are formed between the first mask elements.

公开(公告)号：US09933710B2

公开(公告)日：2018-04-03

申请号：US15470007

申请日：2017-03-27

Applicant: Carl Zeiss SMT GmbH

Inventor： Stephan Andre ,  Daniel Golde ,  Toralf Gruner ,  Johannes Ruoff

IPC: G03B27/32 ,  G03B27/68 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G02B13/08 ,  G03F7/2004 ,  G03F7/201 ,  G03F7/70233 ,  G03F7/70366 ,  G03F7/70525 ,  G03F7/70725 ,  G03F9/70

Abstract: A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask in a projection exposure apparatus includes using an anamorphic projection lens

公开(公告)号：US09910195B2

公开(公告)日：2018-03-06

申请号：US14668968

申请日：2015-03-25

Applicant: Photon Chip, Inc.

Inventor： Cheng-Hao Ko

IPC: G03F7/20 ,  G02B5/18 ,  G02B6/138 ,  G02B6/12 ,  G02B6/293 ,  G02B27/09 ,  G03F7/00 ,  B32B37/24 ,  B32B38/00 ,  G03F7/16

CPC classification number: G02B5/1857 ,  B32B37/24 ,  B32B38/0008 ,  B32B38/0036 ,  B32B2037/243 ,  B32B2307/416 ,  B32B2310/0831 ,  B32B2310/085 ,  B32B2311/04 ,  B32B2311/18 ,  B32B2551/00 ,  G02B5/1861 ,  G02B6/12007 ,  G02B6/138 ,  G02B6/29307 ,  G02B6/29308 ,  G02B27/0944 ,  G03F7/0005 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/201 ,  G03F7/2022 ,  G03F7/2037

Abstract: An optical wavelength dispersion device includes a first substrate, an input unit formed on the first substrate having a slit for receiving an optical signal, a grating formed on the first substrate for producing a diffracted light beams from the optical signal, a first optical reflector formed on the first substrate for reflecting the diffracted light beams from the grating for outputting, and a second substrate covered on the top of the input unit and the grating, wherein the input unit, the grating and the first optical reflector are formed from a photo-resist layer by high energy light source exposure.

公开(公告)号：US20180017877A1

公开(公告)日：2018-01-18

申请号：US15650339

申请日：2017-07-14

Applicant: SUSS MicroTec Lithography GmbH

Inventor： Paul Kaiser

IPC: G03F7/20 ,  G02B26/08 ,  H01L21/027

CPC classification number: G03F7/70191 ,  G02B26/08 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2008 ,  G03F7/201 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70391 ,  G03F7/70575 ,  H01L21/027

Abstract: A light source arrangement for a photolithography exposure system comprises at least three light sources with different wavelengths, and a beam splitting unit comprising at least three inputs, one output, and at least two reflecting faces. An input is assigned to each light source and each reflecting face. The reflecting face reflects light that is emitted from the light source assigned to a corresponding input thereof into the output. The three light sources are arranged on three different sides around the beam splitting unit.

公开(公告)号：US20170365684A1

公开(公告)日：2017-12-21

申请号：US15519324

申请日：2016-09-01

Applicant: BOE Technology Group Co., Ltd.

Inventor： Bin Zhang ,  Tingting Zhou ,  Zhen Liu ,  Zhanfeng Cao ,  Shi Shu ,  Qi Yao ,  Feng Guan

IPC: H01L29/66 ,  H01L27/12 ,  H01L21/027 ,  G03F7/40 ,  G03F7/20 ,  H01L29/786 ,  G03F7/16

CPC classification number: H01L29/6675 ,  G03F7/094 ,  G03F7/16 ,  G03F7/20 ,  G03F7/201 ,  G03F7/2022 ,  G03F7/2026 ,  G03F7/203 ,  G03F7/40 ,  H01L21/027 ,  H01L21/0274 ,  H01L27/12 ,  H01L29/78621 ,  H01L29/7869

Abstract: A method for forming a mask pattern is provided, comprising forming a negative photoresist on a substrate; in an environment without oxygen, to performing a first exposure on the negative photoresist by use of a first ordinary mask plate, so that a fully-cured portion of the negative photoresist is exposed to light and a semi-cured portion and a removed portion of the negative photoresist are not exposed to light; in an environment with oxygen, performing a second exposure on the negative photoresist by use of a second ordinary mask plate, so that the semi-cured portion of the negative photoresist is exposed to light and the removed portion of the negative photoresist not exposed to light; removing the uncured negative photoresist and forming the mask pattern.

公开(公告)号：US09835951B2

公开(公告)日：2017-12-05

申请号：US14933896

申请日：2015-11-05

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jae Hyuk Chang ,  Sang Hyun Yun ,  Ki Beom Lee ,  Hi Kuk Lee

IPC: G03B27/58 ,  G03F7/20 ,  G03F7/22

CPC classification number: G03F7/70141 ,  G03F7/201 ,  G03F7/213 ,  G03F7/22 ,  G03F7/70791 ,  G03F9/00 ,  G03F9/7088

Abstract: Embodiments of the present invention provide a roll-to-roll exposure system having a reference mark array and alignment scope units for precisely measuring the position and orientation of an object on a flexible multilayered circuit film. A roll-to-roll exposure system according to an exemplary embodiment of the present invention includes: a plurality of rolls configured to move a flexible multilayered circuit film having an object positioned thereon; alignment scope units positioned so as to be spaced apart from each other and proximate to the rolls; and at least one exposure unit positioned so as to be spaced proximate to the rolls and spaced apart from sides of the alignment scope units, in which one of the rolls has a reference mark array on its surface.

公开(公告)号：US20170269480A1

公开(公告)日：2017-09-21

申请号：US15532081

申请日：2015-11-26

Applicant: ASML Netherlands B.V.

Inventor： Jozef Maria FINDERS

IPC: G03F7/20 ,  G02B17/06 ,  G03F1/72

CPC classification number: G03F7/201 ,  G02B17/0652 ,  G02B17/0657 ,  G03F1/72 ,  G03F7/70125 ,  G03F7/70275 ,  G03F7/705

Abstract: A method includes measuring properties of a three-dimensional topography of a lithographic patterning device, the patterning device including a pattern and being constructed and arranged to produce a pattern in a cross section of a projection beam of radiation in a lithographic projection system, calculating wavefront phase effects resulting from the measured properties, incorporating the calculated wavefront phase effects into a lithographic model of the lithographic projection system, and determining, based on the lithographic model incorporating the calculated wavefront phase effects, parameters for use in an imaging operation using the lithographic projection system.

公开(公告)号：US09738013B1

公开(公告)日：2017-08-22

申请号：US14462521

申请日：2014-08-18

Applicant: HRL LABORATORIES, LLC

Inventor： Sophia S. Yang ,  Alan J. Jacobsen ,  Zak C. Eckel ,  Jacob M. Hundley ,  William Carter

IPC: B32B7/02 ,  B32B3/00 ,  B32B3/26 ,  B29C35/08 ,  B32B3/12 ,  G03F7/20 ,  G03F7/26

CPC classification number: B29C35/0805 ,  B29C35/0894 ,  B29C2035/0827 ,  B29C2035/0838 ,  B32B3/12 ,  G03F7/0037 ,  G03F7/20 ,  G03F7/201 ,  G03F7/2012 ,  G03F7/26

Abstract: A multi-chemistry structure includes: a plurality of interconnected polymer struts arranged in a lattice; a first layer of the lattice including a first array of first unit cells; a second layer of the lattice including a second array of second unit cells; at least one region of the lattice being formed of a first polymer; and at least one region of the lattice being formed of a second polymer different from the first polymer.

公开(公告)号：US09563116B2

公开(公告)日：2017-02-07

申请号：US13967688

申请日：2013-08-15

Applicant: NIKON CORPORATION

Inventor： Yuichi Shibazaki

IPC: G03F9/00 ,  G03F1/38 ,  G03F7/20

CPC classification number: G03F1/38 ,  G03F7/201 ,  G03F7/2035 ,  G03F7/703 ,  G03F7/70358 ,  G03F9/00 ,  G03F9/70 ,  G03F9/7023

Abstract: A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β, and circumference ratio is taken as π, then the conditions for D≧(β×L)/π are satisfied.

Abstract translation: 使用圆筒状的荫罩通过投影光学系统在基板上形成图案的图像。 掩模具有图案形成表面，其上形成图案并且围绕预定轴线放置，并且掩模能够以预定轴线为旋转轴线旋转，与基板的移动同步 至少预定的一维方向。 当将图案形成表面上的掩模的直径设为D，将一维方向上的基板的最大长度设为L，投影光学系统的投影比为β时，圆周 比例为π，则满足D≥（β×L）/π的条件。

公开(公告)号：US20160363869A1

公开(公告)日：2016-12-15

申请号：US15115076

申请日：2014-10-16

Applicant: PRISMLAB CHINA LTD.

Inventor： Feng Hou

IPC: G03F7/20

CPC classification number: G03F7/702 ,  B29C64/129 ,  B29C64/20 ,  B33Y30/00 ,  G03F7/0037 ,  G03F7/201 ,  G03F7/70416

Abstract: An image exposure system of a 3D printing device having a spatial light modulator, a light source, a projection lens, a micro-displacement driving mechanism and a controller. The spatial light modulator is provided with a plurality of micromirrors for adjusting the reflective direction of light illuminating the micromirrors according to a control signal; the light source generates a light beam illuminating the spatial light modulator; the projection lens is aligned with a first direction of the spatial light modulator so that a micro light spot array formed through the micromirror by the light source projected onto the surface of a light-sensitive material, the micro-displacement driving mechanism is connected with the spatial light modulator, and can drive the spatial light modulator to move in third and fourth directions that are perpendicular to each other, in order to finely adjust the position on the surface of the light-sensitive material onto which the micro light spot array is projected.

Abstract translation: 具有空间光调制器，光源，投影透镜，微位移驱动机构和控制器的3D打印装置的图像曝光系统。 空间光调制器设置有多个微镜，用于根据控制信号调节照射微镜的光的反射方向; 光源产生照射空间光调制器的光束; 投影透镜与空间光调制器的第一方向对齐，使得通过光源通过微镜形成的微光点阵列投射到感光材料的表面上，微位移驱动机构与 空间光调制器，并且可以驱动空间光调制器在彼此垂直的第三和第四方向上移动，以便微调微光点阵列投射到的感光材料的表面上的位置 。