公开(公告)号：US20150183205A1

公开(公告)日：2015-07-02

申请号：US14142883

申请日：2013-12-29

Applicant: Paul Mayo Holt

Inventor： Paul Mayo Holt

IPC: B41C3/00

CPC classification number: G03F7/201 ,  G03F7/2002

Abstract: The invention provides an improved method of imaging analogue flexographic liquid and sheet printing plates. Specifically it involves adding colour or greyscale to some of the clear parts of negatives used to make flexographic plates. This colour moderates the light allowed through the clear areas, keeping reverses open to the maximum depth possible, preventing the widening or overexposure of relief and reverse whilst allowing the maximum amount of light through the small clear areas making the fine relief. It does this by calculating the correct amount of light for each part of the negative according to the predicted amount of light that will be transmitted through it, adjusting the intensity of colour accordingly. It provides a technical advantage of using a negative over the digital process, widening the amount of information available to create the printing plate from just black and white. It enables the plate maker to achieve an optimal printing plate independent of design. The incorporation of a half tone screen over the selective colour enhances total ink delivered. The screen can also level out intensity irregularities in intensities in the exposure units.

Abstract translation: 本发明提供了一种成像模拟柔版印刷液体和片状印刷版的改进方法。 具体来说，它涉及到用于制作柔版印版的底片的一些清晰部分添加颜色或灰度。 这种颜色调节了通过透明区域允许的光线，保持反向打开到最大深度，防止放宽和过度曝光和反转，同时允许最大量的光通过小的透明区域，使细微的浮雕。 这是通过根据预测的通过其传输的光量来计算负的每个部分的正确光量，相应地调整颜色的强度。 它提供了在数字处理中使用负面的技术优势，从仅仅黑白加宽了可用于创建印版的信息量。 它使印版机能够实现独立于设计的最佳印版。 半色调屏幕结合选择性颜色增强了总输墨量。 屏幕还可以平衡曝光单元强度的强度不均匀性。

公开(公告)号：US20150177568A1

公开(公告)日：2015-06-25

申请号：US14412917

申请日：2013-03-29

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Koichi Kajiyama ,  Kazushige Hashimoto ,  Toshinari Arai

IPC: G02F1/1337 ,  G02F1/13

CPC classification number: G02F1/133788 ,  G02F1/1303 ,  G02F1/133753 ,  G02F2001/133757 ,  G03F7/201 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70308 ,  G03F7/70325 ,  G03F7/70358

Abstract: A photo-alignment exposure device that includes a first mask and a first exposure device that independently proximity-exposes a first divided area, a second mask and a second exposure device that independently proximity-exposes a second divided area adjacent to the first divided area, and a third mask and a third exposure device that exposes an area on a side of the first divided area near a boundary between the first divided area and the second divided area. The third exposure device is provided with a photo-irradiation angle same as that of the first exposure device or the second exposure device with respect to an exposed surface. A condensing element that condenses the mask transmitted light on the area on a side of the first divided area near the boundary is provided between the mask opening of the third mask and the exposed surface.

Abstract translation: 一种光取向曝光装置，其包括独立地接近曝光第一分割区域的第一掩模和第一曝光装置，独立地接近曝光与第一划分区域相邻的第二划分区域的第二曝光装置， 以及第三掩模和第三曝光装置，其在第一分割区域和第二分割区域之间的边界附近露出在第一分割区域的一侧上的区域。 第三曝光装置具有与第一曝光装置或第二曝光装置相对于曝光表面相同的光照射角度。 在第三掩模的掩模开口和暴露的表面之间设置有将掩模透射光聚集在边界附近的第一分割区域的一侧的区域上的聚光元件。

公开(公告)号：US20150168825A1

公开(公告)日：2015-06-18

申请号：US14571385

申请日：2014-12-16

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Naomi Shida ,  Kenji Todori ,  Shigehiko Mori ,  Reiko Yoshimura ,  Hiroyuki Kashiwagi ,  Ikuo Yoneda ,  Tsukasa Tada

IPC: G03F1/76 ,  G03F1/80

CPC classification number: G03F1/76 ,  G03F1/38 ,  G03F1/80 ,  G03F7/16 ,  G03F7/20 ,  G03F7/201 ,  G03F7/40 ,  G03F7/7035 ,  H01L21/3065 ,  H01L21/3086

Abstract: A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one surface of the substrate; a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials; and a resin filled in each of the concavities.

Abstract translation: 根据实施例的近场曝光掩模包括：基板; 具有凹凸的凹凸结构，形成在基板的一个面上; 至少布置在每个凸起的尖端部分上的近场光产生膜，所述近场光产生膜是包含选自Au，Al，Ag，Cu，Cr中的至少一种元素的层 ，Sb，W，Ni，In，Ge，Sn，Pb，Zn，Pd和C，或由这些材料中的一些形成的层形成的膜堆叠; 和填充在每个凹部中的树脂。

公开(公告)号：US20150098071A1

公开(公告)日：2015-04-09

申请号：US14526839

申请日：2014-10-29

Applicant: Carl Zeiss SMT GmbH

Inventor： Heiko Feldmann

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G02B5/0236 ,  G02B5/0284 ,  G02B5/32 ,  G03F7/0037 ,  G03F7/201 ,  G03F7/70341 ,  G03F7/70416

Abstract: The disclosure relates to an optical arrangement for three-dimensionally patterning a radiation-sensitive material layer, such as a projection exposure apparatus for microlithography. The optical arrangement includes a mask for forming a three-dimensional radiation pattern, a substrate with the radiation-sensitive material layer, and a projection optical unit for imaging the three-dimensional radiation pattern from the mask into the radiation-sensitive material layer. The optical arrangement is designed to compensate for spherical aberrations along the thickness direction of the radiation-sensitive material layer in order to generate a stigmatic image of the three-dimensional radiation pattern.

Abstract translation: 本公开涉及用于三维图案化辐射敏感材料层的光学装置，例如用于微光刻的投影曝光装置。 光学装置包括用于形成三维辐射图案的掩模，具有辐射敏感材料层的基板和用于将三维辐射图案从掩模成像到辐射敏感材料层中的投影光学单元。 光学布置被设计为补偿沿着辐射敏感材料层的厚度方向的球面像差，以便产生三维辐射图案的连续图像。

公开(公告)号：US08845163B2

公开(公告)日：2014-09-30

申请号：US13588750

申请日：2012-08-17

Applicant: David G. Stites ,  Andrew M. Hawryluk

Inventor： David G. Stites ,  Andrew M. Hawryluk

IPC: F21V5/04

CPC classification number: G03F7/201 ,  G03F7/70391 ,  H01L25/0753 ,  H01L33/642 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An LED-based photolithographic illuminator with high collection efficiency is disclosed. The illuminator utilizes an array of LEDs, wherein each LED has an LED die and a heat sink. The LED dies are imaged onto the input end of a homogenizer rod to substantially cover the input end without inclusion of the non-light-emitting heat sink sections of the LED. A microlens array is used to image the LED dies. The collection efficiency of the illuminator is better than 50% and the illumination uniformity at the output end of the light homogenizer is within +/−2%.

Abstract translation: 公开了一种具有高收集效率的基于LED的光刻照明器。 照明器利用一系列LED，其中每个LED具有LED管芯和散热器。 将LED管芯成像到均质棒的输入端上，以基本上覆盖输入端，而不包括LED的非发光散热片部分。 使用微透镜阵列对LED管芯进行成像。 照明器的收集效率优于50％，光均质器输出端的照明均匀度在+/- 2％以内。

公开(公告)号：US20140234780A1

公开(公告)日：2014-08-21

申请号：US14261345

申请日：2014-04-24

Applicant: Rolith, Inc.

Inventor： Boris Kobrin ,  Mark Brongersma ,  Edward Barnard

IPC: G03F7/40 ,  G03F7/22

CPC classification number: G03F7/40 ,  G03F7/201 ,  G03F7/2014 ,  G03F7/2035 ,  G03F7/22 ,  G03F7/703 ,  G03F7/70325

Abstract: Embodiments of the present invention are directed to techniques for obtaining patterns of features. One set of techniques uses multiple-pass rolling mask lithography to obtain the desired feature pattern. Another technique uses a combination of rolling mask lithography and a self-aligned plasmonic mask lithography to obtain a desired feature pitch.

Abstract translation: 本发明的实施例涉及用于获得特征图案的技术。 一组技术使用多遍轧制掩模光刻来获得所需的特征图案。 另一种技术使用滚动掩模光刻和自对准等离子体掩模光刻的组合来获得期望的特征间距。

公开(公告)号：US08609301B2

公开(公告)日：2013-12-17

申请号：US12399483

申请日：2009-03-06

Applicant: Yuichi Shibazaki

Inventor： Yuichi Shibazaki

IPC: G03F1/00 ,  G03F9/00 ,  G03B27/46 ,  H01L21/00

CPC classification number: G03F1/38 ,  G03F7/201 ,  G03F7/2035 ,  G03F7/703 ,  G03F7/70358 ,  G03F9/00 ,  G03F9/70 ,  G03F9/7023

Abstract: A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as β, and circumference ratio is taken as π, then the conditions for D≧(β×L)/π are satisfied.

Abstract translation: 使用圆筒状的荫罩通过投影光学系统在基板上形成图案的图像。 掩模具有图案形成表面，其上形成图案并且围绕预定轴线放置，并且掩模能够以预定轴线为旋转轴线旋转，与基板的移动同步 至少预定的一维方向。 当图案形成表面上的掩模的直径取为D时，将一维方向上的基板的最大长度设为L，投影光学系统的投影比为β，圆周 比例为pi，则满足D> =（β×L）/ pi的条件。

公开(公告)号：US20130095416A1

公开(公告)日：2013-04-18

申请号：US13691142

申请日：2012-11-30

Applicant: PANASONIC CORPORATION

Inventor： Yuji Nonami ,  Akio Misaka

IPC: G03F1/00 ,  G03F7/20

CPC classification number: G03F1/00 ,  G03F1/50 ,  G03F1/54 ,  G03F7/2002 ,  G03F7/201 ,  H01L21/0274

Abstract: A photomask includes: a transparent substrate; and first and second mask patterns located on the transparent substrate and at least partially facing each other with a space sandwiched therebetween. The first mask pattern includes a semi-light-shielding part which transmits part of light therethrough and a light-shielding part. In the first mask pattern, the semi-light-shielding part at least partially faces the space with the light-shielding part sandwiched therebetween. In a direction along which the first mask pattern and the second mask pattern face each other, the first mask pattern has a size greater than (0.7×λ/NA)×M, and the space has a size less than or equal to (0.5×λ/NA)×M where λ is a wavelength of exposure light, NA is a numerical aperture of a reduced projection optical system of an exposure device, and M is a magnification of the reduced projection optical system.

Abstract translation: 光掩模包括：透明基板; 以及第一和第二掩模图案，其位于透明基板上并且至少部分地彼此相对并且夹在其间的空间。 第一掩模图案包括透射部分光的半遮光部和遮光部。 在第一掩模图案中，半遮光部至少部分地面对其间夹着遮光部的空间。 在第一掩模图案和第二掩模图案彼此面对的方向上，第一掩模图案具有大于（0.7×λ/ NA）×M的尺寸，并且该空间具有小于或等于（0.5 ×λ/ NA）×M其中λ是曝光光的波长，NA是曝光装置的缩小投影光学系统的数值孔径，M是缩小投影光学系统的放大率。

公开(公告)号：US20130033689A1

公开(公告)日：2013-02-07

申请号：US13645638

申请日：2012-10-05

Applicant: GM GLOBAL TECHNOLOGY OPERATIONS, INC.

Inventor： Yeh-Hung Lai ,  Gerald W. Fly ,  Jeffrey A. Rock

IPC: G03B27/42

CPC classification number: G03F7/2014 ,  G03F7/201 ,  G03F7/203 ,  G03F7/70291 ,  H01M8/0221 ,  H01M8/0239 ,  H01M8/0284 ,  H01M8/0286

Abstract: A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate with exposure to radiation. At least one radiation source is configured to project a radiation beam toward the radiation-sensitive material. A smart glass device is disposed between the radiation-sensitive material and the at least one radiation source. The smart glass device includes at least one switchable layer selectively operable from an active state to an inactive state. The smart glass device is configured to expose the radiation-sensitive material to a desired exposure pattern when in one of the active state and the inactive state. A method for fabricating the radiation-cured structure is also provided.

Abstract translation: 提供了一种用于制造辐射固化结构的系统。 该系统包括被配置成在暴露于辐射时引发，聚合，交联和离解中的至少一种的辐射敏感材料。 至少一个辐射源被配置成将辐射束投射到辐射敏感材料。 智能玻璃装置设置在辐射敏感材料和至少一个辐射源之间。 智能玻璃装置包括从活动状态到非活动状态选择性地操作的至少一个可切换层。 智能玻璃装置被配置为当处于活动状态和非活动状态之一时将辐射敏感材料暴露于期望的曝光图案。 还提供了一种制造辐射固化结构的方法。

公开(公告)号：US08367307B2

公开(公告)日：2013-02-05

申请号：US12700800

申请日：2010-02-05

Applicant: Jeffrey A. Rock

Inventor： Jeffrey A. Rock

IPC: G03F7/20

CPC classification number: G03F1/50 ,  G02B2006/1219 ,  G03F7/201 ,  G03F7/2041

Abstract: A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material having a first refractive index; a mask formed from a mask material having a second refractive index; and a radiation source. The mask is disposed between the radiation source and the radiation-sensitive material, and has a plurality of substantially radiation transparent apertures. The radiation source is configured to generate radiation beams for at least one of initiating, polymerizing, and crosslinking the radiation-sensitive material. The system includes at least one of a) an at least one normalizing surface disposed between the radiation source and the mask, b) a refractive fluid having a third refractive index disposed between the radiation source and the mask, and c) the refractive fluid having the third refractive index disposed between the mask and the radiation-sensitive material. A method for fabricating the radiation-cured structure is also provided.