公开(公告)号：US07460644B2

公开(公告)日：2008-12-02

申请号：US11657557

申请日：2007-01-25

Applicant: Noriyoshi Sakabe

Inventor： Noriyoshi Sakabe

IPC: G21G4/00

CPC classification number: G21K1/06 ,  A61B6/4028 ,  A61B6/4092 ,  A61B6/4488 ,  A61B6/482 ,  A61B6/504 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/067 ,  H01J2235/00

Abstract: An energy beam is irradiated onto a target from an energy beam source, thereby generating an X-ray with an irradiating area to be irradiated onto an object. Then, the X-ray is introduced into a spectrometer, thereby generating an X-ray with parallelism through the selection of wavelength and wavelength range.

Abstract translation: 能量束从能量束源照射到靶上，从而产生具有要照射到物体上的照射区域的X射线。 然后，将X射线引入光谱仪中，由此通过波长和波长范围的选择产生具有平行度的X射线。

公开(公告)号：US20070121785A1

公开(公告)日：2007-05-31

申请号：US11491462

申请日：2006-07-21

Applicant: Reiner Dietsch ,  Thomas Holz

Inventor： Reiner Dietsch ,  Thomas Holz

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064

Abstract: An X-ray optical element for and influencing of X-ray beam characteristics in two dimensions includes two reflective, curved elements arranged side-by-side to receive X-ray radiation from an X-ray beam source so that the radiation is directed onto both reflective elements and then reflected from one element onto the other element, wherein the two reflective elements are curved at different angles and have different focal lengths.

公开(公告)号：US20070120072A1

公开(公告)日：2007-05-31

申请号：US11649199

申请日：2007-01-03

Applicant: Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

Inventor： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

IPC: G21G5/00 ,  G02B23/00 ,  G02B17/00 ,  G02B21/00 ,  G02B23/24

CPC classification number: B82Y10/00 ,  G02B13/143 ,  G02B17/0657 ,  G02B17/0663 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04 ,  G21K2201/061

Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

Abstract translation: 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。

公开(公告)号：US07200203B2

公开(公告)日：2007-04-03

申请号：US10818593

申请日：2004-04-06

Applicant: Franklin H. Cocks ,  Walter Neal Simmons ,  Paul A. Klenk

Inventor： Franklin H. Cocks ,  Walter Neal Simmons ,  Paul A. Klenk

IPC: H01J35/32 ,  G21K5/04 ,  A61N5/10

CPC classification number: B82Y10/00 ,  A61B2090/101 ,  A61N5/1001 ,  G21K2201/061 ,  H01J35/32

Abstract: Devices and related methods are provided for irradiating a portion of a body. A device according to one embodiment can include a radiation needle, a fluorescent target, and an x-ray transmitting window. The radiation needle can include a radiation conduit having a first and second end for passing primary x-rays. An x-ray generator can generate the primary x-rays and pass the primary x-rays from the first end to second end. The fluorescent target can connect to the second end for absorbing the primary x-rays and produce by fluorescence secondary x-rays for irradiating a predetermined portion of the body. The fluorescent target having a surface for absorbing the primary x-rays to fluoresce and emit said secondary x-rays. The x-ray transmitting window can be positioned adjacent to the fluorescent target such that the secondary x-rays exit through the x-ray transmitting window. The secondary x-rays can irradiate target tissue within the body.

Abstract translation: 提供了用于照射身体的一部分的装置和相关方法。 根据一个实施例的装置可以包括辐射针，荧光目标和X射线透射窗。 辐射针可以包括具有用于通过初级X射线的第一和第二端的辐射导管。 X射线发生器可以产生主X射线并将主X射线从第一端传递到第二端。 荧光目标可以连接到第二端以吸收初级x射线，并通过荧光次级X射线产生用于照射身体的预定部分。 荧光目标具有用于吸收主要X射线以发出并发射所述次级X射线的表面。 x射线透射窗口可以定位成与荧光目标相邻，使得次级x射线通过x射线透射窗口离开。 二次X射线可以照射身体内的靶组织。

公开(公告)号：US20070065732A1

公开(公告)日：2007-03-22

申请号：US11446765

申请日：2006-06-05

Applicant: Donggun Lee ,  Chanuk Jeon ,  Seongwoon Choi ,  Byunggook Kim

Inventor： Donggun Lee ,  Chanuk Jeon ,  Seongwoon Choi ,  Byunggook Kim

IPC: G03F1/00 ,  G03C5/00 ,  G21K5/00

CPC classification number: G03F1/50 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/60 ,  G21K1/062 ,  G21K2201/061

Abstract: An approach to correcting non-uniformity of critical dimension (CD) in a semiconductor wafer includes measuring 0th-order light transmitted through or reflected from a photomask in a plurality of regions of the photomask. The photomask is altered to equalize the 0th-order light from the photomask such that the wafer CD is uniform. The photomask can be altered such as by forming a phase grating on the back side of the photomask or by introducing shadowing elements into the photomask to alter the transmittance of the photomask.

Abstract translation: 校正半导体晶片中的关键尺寸（CD）的不均匀性的方法包括测量在光掩模的多个区域中透过光掩模或从光掩模反射的第0级光。 改变光掩模以使来自光掩模的第0 - 次光均衡，使得晶片CD是均匀的。 可以改变光掩模，例如通过在光掩模的背面上形成相位光栅，或者通过将遮蔽元件引入光掩模来改变光掩模的透射率。

公开(公告)号：US07113567B2

公开(公告)日：2006-09-26

申请号：US10196805

申请日：2002-07-17

Applicant: Carsten Michaelsen ,  Rüdiger Bormann ,  Jörg Wiesmann

Inventor： Carsten Michaelsen ,  Rüdiger Bormann ,  Jörg Wiesmann

IPC: G21K1/06 ,  G01N23/223 ,  G01T1/36

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

Abstract: In an apparatus and a method for the analysis of atomic or molecular elements contained in a sample by wavelength dispersive X-ray spectrometry, wherein primary x ray or electron radiation is directed onto the sample whereby fluorescence radiation is emitted from the sample, the fluorescence radiation is directed onto a mirror or focussing device consisting of a multi-layer structure including pairs of layers of which one layer of a pair comprises carbon or scandium and the other comprises a metal oxide or a metal nitride and the fluorescence radiation is reflected from the mirror or focussing device onto an analysis detector for the analysis of the atomic or molecular elements contained in the sample.

Abstract translation: 在通过波长色散X射线光谱法分析样品中原子或分子元素的装置和方法中，其中初级x射线或电子辐射被引导到样品上，从而从样品发射荧光辐射，荧光辐射 被引导到由多层结构构成的反射镜或聚焦装置，该多层结构包括一对层，其中一层包括碳或钪，另一层包含金属氧化物或金属氮化物，并且荧光辐射从反射镜反射 或聚焦装置到分析检测器上，以分析样品中包含的原子或分子元素。

公开(公告)号：US07076026B2

公开(公告)日：2006-07-11

申请号：US10866057

申请日：2004-06-10

Applicant: Boris Verman ,  Jimpei Harada

Inventor： Boris Verman ,  Jimpei Harada

IPC: G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.

Abstract translation: 本发明提供一种具有Kirkpatrick-Baez衍射光学元件的X射线束调节系统，其包括两个光学元件，其中一个光学元件是晶体。 这些元件并排配置。 水晶可以是一个完美的水晶。 一个或两个衍射元件可以是镶嵌晶体。 一个元件可以是多层光学元件。 例如，多层光学器件可以是具有梯度d间距的椭圆镜或抛物面镜。 分级d间距可以是横向分级或深度分级，或两者。

公开(公告)号：US20050270647A1

公开(公告)日：2005-12-08

申请号：US11021974

申请日：2004-12-23

Applicant: Francois Polack ,  Mourad Idir ,  Erick Jourdain ,  Audrey Liard-Cloup

Inventor： Francois Polack ,  Mourad Idir ,  Erick Jourdain ,  Audrey Liard-Cloup

IPC: G01J3/18 ,  G02B5/08 ,  G02B5/18 ,  G21K1/06

CPC classification number: G02B5/1838 ,  B82Y10/00 ,  G01J3/18 ,  G21K2201/061

Abstract: The invention concerns a two-dimensional diffraction gratting for the dispersion of polychromatic or quasi-monochromatic luminous flux including a substrate (2) having a surface (3), a first (5) and a second (6) stacks of thin biperiodic layers of period d in the thickness direction, including at least ten periods, each period d being formed of layers of at least two different materials (7, 8), said stacks (5, 6) forming contiguous lines (11) of width p/2, parallel to one another, and repeated periodically along a direction parallel to the surface of the substrate (2) with a period p, the second stack (6) being alternate with the first stack (5) and offset in width by d/2, so that the stacks (5 and 6) form a thick gratting (9) carried by the substrate (2). According to the invention, said thick grafting (9) consists of the doubly periodical repetition of a same unit cell, topped with a thin surface gratting (10) having an amplitude at the most equal to d/2.

Abstract translation: 本发明涉及用于分散多色或准单色光束的二维衍射，包括具有表面（3），第一（5）和第二（6）的薄的双周期层的叠层的衬底（2） 包括至少十个周期的周期d，每个周期d由至少两个不同材料（7,8）的层形成，所述堆叠（5,6）形成宽度为p / 2的连续线（11） 并且以周期p沿平行于衬底（2）的表面的方向周期性重复，第二堆叠（6）与第一堆叠（5）交替并且以宽度偏移d / 2 ，使得堆叠（5和6）形成由衬底（2）承载的厚层（9）。 根据本发明，所述厚接枝（9）由相同单元电池的双重周期性重复组成，顶部具有最大等于d / 2的振幅的薄表面曲折（10）。

公开(公告)号：US20050002090A1

公开(公告)日：2005-01-06

申请号：US10876898

申请日：2004-06-25

Applicant: Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

Inventor： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

IPC: G03F7/20 ,  G02B17/00

CPC classification number: B82Y10/00 ,  G03B27/54 ,  G03F7/70083 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G21K2201/061

Abstract: There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.

Abstract translation: 提供照明系统。 照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。 光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。 第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。

公开(公告)号：US06650728B2

公开(公告)日：2003-11-18

申请号：US10196806

申请日：2002-07-17

Applicant: Carsten Michaelsen ,  Rudiger Bormann ,  Jörg Wiesmann

Inventor： Carsten Michaelsen ,  Rudiger Bormann ,  Jörg Wiesmann

IPC: G01N23223

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

Abstract: In an apparatus and a method for the analysis of atomic or molecular elements contained in a sample by wavelength dispersive X-ray spectrometry, wherein primary x ray or electron radiation is directed onto the sample whereby fluorescence radiation is emitted from the sample, the fluorescence radiation is directed onto a mirror or focussing device consisting of a multi-layer structure including pairs of layers of which one layer of a pair consists of lanthanum and the other consists of carbon and the fluorescence radiation is reflected from the mirror or focussing device onto an analysis detector for the analysis of the atomic or molecular elements contained in the sample.

Abstract translation: 在通过波长色散X射线光谱法分析样品中原子或分子元素的装置和方法中，其中初级x射线或电子辐射被引导到样品上，从而从样品发射荧光辐射，荧光辐射 被引导到由多层结构组成的反射镜或聚焦装置，该多层结构包括一对层，其中一层由镧构成，另一层由碳组成，另一层由碳组成，并且荧光辐射从反射镜或聚焦装置反射到分析 用于分析样品中包含的原子或分子元素的检测器。