Optical device for analyzing a specimen by the scattering of an X-ray beam and associated collimation device and collimator
    153.
    发明授权
    Optical device for analyzing a specimen by the scattering of an X-ray beam and associated collimation device and collimator 有权
    用于通过X射线束和相关联的准直装置和准直器的散射来分析样本的光学装置

    公开(公告)号:US09153351B2

    公开(公告)日:2015-10-06

    申请号:US13643407

    申请日:2011-04-26

    Abstract: A collimation device for an X-ray beam, an optical device for analyzing a specimen by the scattering of an X-ray beam, and a collimator for an X-ray beam. The collimation device includes an enclosure configured to be under a vacuum or a controlled atmosphere, the enclosure including an inlet and an outlet for the X-ray beam and at least one plate made of a material having a diffracting periodic structure, the plate including two main faces and at least one flared aperture between the faces.

    Abstract translation: 用于X射线束的准直装置,用于通过X射线束的散射来分析样本的光学装置和用于X射线束的准直器。 准直装置包括被配置为处于真空或受控气氛的外壳,外壳包括用于X射线束的入口和出口以及由具有衍射周期性结构的材料制成的至少一个板,该板包括两个 主面和至少一个面之间的喇叭孔。

    X-RAY DIFFRACTION IMAGING SYSTEM WITH INTEGRATED SUPERMIRROR
    154.
    发明申请
    X-RAY DIFFRACTION IMAGING SYSTEM WITH INTEGRATED SUPERMIRROR 有权
    具有集成超级雷达的X射线衍射成像系统

    公开(公告)号:US20150276628A1

    公开(公告)日:2015-10-01

    申请号:US14228948

    申请日:2014-03-28

    Inventor: Geoffrey Harding

    CPC classification number: G01N23/20008 G21K1/02 G21K1/062 G21K2201/067

    Abstract: An x-ray diffraction imaging (XDI) system includes a plurality of x-ray sources configured to generate x-rays directed toward an object. The XDI system also includes a primary collimator positioned a distance from the plurality of x-ray sources. A plurality of nodes are defined within the primary collimator at a plurality of node distances from the plurality of x-ray sources. Each node of the plurality of nodes defines an x-ray intersection region. The XDI system further includes a supermirror assembly including a plurality of mounting rails positioned adjacent the plurality of nodes.

    Abstract translation: X射线衍射成像(XDI)系统包括被配置为产生朝向物体的X射线的多个x射线源。 XDI系统还包括与多个x射线源定位一定距离的主准直器。 在多个x射线源的多个节点距离处,在主准直器内定义多个节点。 多个节点中的每个节点定义x射线交叉区域。 XDI系统还包括超镜组件,其包括邻近多个节点定位的多个安装轨道。

    METHOD FOR REPAIRING OPTICAL ELEMENTS, AND OPTICAL ELEMENT
    156.
    发明申请
    METHOD FOR REPAIRING OPTICAL ELEMENTS, AND OPTICAL ELEMENT 审中-公开
    修复光学元件和光学元件的方法

    公开(公告)号:US20150092170A1

    公开(公告)日:2015-04-02

    申请号:US14519449

    申请日:2014-10-21

    Abstract: A method for repairing a collector for an EUV projection exposure apparatus having a first coating and a second coating, wherein the first coating is arranged between the second coating and a surface of the collector. The method includes completely or partly removing the first coating by treatment with a first chemical solution, and applying a new first coating.

    Abstract translation: 一种用于修复具有第一涂层和第二涂层的EUV投影曝光装置的收集器的方法,其中所述第一涂层布置在所述第二涂层和所述收集器的表面之间。 该方法包括通过用第一化学溶液处理完全或部分去除第一涂层,并施加新的第一涂层。

    Projection objective and method for its manufacture
    157.
    发明授权
    Projection objective and method for its manufacture 有权
    投影目的及其制造方法

    公开(公告)号:US08944615B2

    公开(公告)日:2015-02-03

    申请号:US12710487

    申请日:2010-02-23

    Abstract: A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.

    Abstract translation: 一种制造微光刻投影曝光装置(10)的投影物镜(22)的方法。 投影物镜(22)包括至少一个镜子(M1至M6),每个镜子具有镜支撑件(241至246)和反射涂层(26)。 测量预组装的投影物镜的第一成像像差。 在施加涂层(26)之前,反射镜支撑件(241至246)具有期望的表面变形(34)。 如果反射镜(M1至M6)对于没有涂层(26)的投影光不反射,则使用具有另一波长的测量光。 或者,可以提供两个相同的反射镜支撑件(246)。 具有反射涂层的一个支撑件是预组装的投影物镜的一部分,其测量成像像差。 另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

    Method of Producing a Fresnel Zone Plate for Applications in High Energy Radiation
    158.
    发明申请
    Method of Producing a Fresnel Zone Plate for Applications in High Energy Radiation 有权
    生产用于高能量辐射的菲涅耳区板的方法

    公开(公告)号:US20150022892A1

    公开(公告)日:2015-01-22

    申请号:US14383505

    申请日:2013-03-07

    Abstract: The invention concerns to a method of producing a Fresnel Zone Plate (1) for applications in high energy radiation including the following steps: supply of a substrate (2) transparent for high energy radiation, deposition of a layer (3) of a metal, a metal alloy or a metal compound on a planar surface (4) of the substrate (2), calculating a three dimensional geometrical profile (5) with a mathematical model, setting up a dosage profile (6) for an ion beam of the ion beam lithography inverse to the calculated three dimensional geometrical profile (5) and milling a three dimensional geometrical profile (5) with concentric zones into the layer (3) with ion beam lithography by means of focused ion beam.

    Abstract translation: 本发明涉及一种用于生产用于高能量辐射的菲涅耳区板(1)的方法,包括以下步骤:供给高能量辐射透明的基底(2),金属层(3)的沉积, 在基板(2)的平面(4)上的金属合金或金属化合物,用数学模型计算三维几何轮廓(5),建立用于离子的离子束的剂量分布(6) 光束光刻与计算的三维几何轮廓(5)相反,并且通过离子束光刻通过聚焦离子束将具有同心区域的三维几何轮廓(5)铣削到层(3)中。

    ULTRA-SMOOTH LAYER ULTRAVIOLET LITHOGRAPHY MIRRORS AND BLANKS, AND MANUFACTURING AND LITHOGRAPHY SYSTEMS THEREFOR
    159.
    发明申请
    ULTRA-SMOOTH LAYER ULTRAVIOLET LITHOGRAPHY MIRRORS AND BLANKS, AND MANUFACTURING AND LITHOGRAPHY SYSTEMS THEREFOR 有权
    超薄平板超薄膜平版镜和空白,以及其制造和成像系统

    公开(公告)号:US20140268083A1

    公开(公告)日:2014-09-18

    申请号:US14139507

    申请日:2013-12-23

    Abstract: An extreme ultraviolet mirror or blank production system includes: a first deposition system for depositing a planarization layer over a semiconductor substrate; a second deposition system for depositing an ultra-smooth layer over the planarization layer, the ultra-smooth layer having reorganized molecules; and a third deposition system for depositing a multi-layer stack over the ultra-smooth layer. The extreme ultraviolet blank includes: a substrate; a planarization layer over the substrate; an ultra-smooth layer over the planarization layer, the ultra-smooth layer having reorganized molecules; a multi-layer stack; and capping layers over the multi-layer stack. An extreme ultraviolet lithography system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for placing an extreme ultraviolet mask blank with a planarization layer and an ultra-smooth layer over the planarization layer; and a wafer stage for placing a wafer.

    Abstract translation: 一种极紫外镜或空白生产系统包括:用于在半导体衬底上沉积平坦化层的第一沉积系统; 用于在所述平坦化层上沉积超光滑层的第二沉积系统,所述超平滑层具有重组的分子; 以及用于在超平滑层上沉积多层堆叠的第三沉积系统。 极紫外线空白包括:基材; 衬底上的平坦化层; 在平坦化层上的超光滑层,超光滑层具有重组的分子; 多层堆叠 并在多层堆叠上覆盖层。 极紫外光刻系统包括:极紫外光源; 用于引导来自极紫外光源的光的反射镜; 用于在平坦化层上放置具有平坦化层和超平滑层的极紫外线掩模坯料的掩模版台; 以及用于放置晶片的晶片台。

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