公开(公告)号：US20180007771A1

公开(公告)日：2018-01-04

申请号：US15697915

申请日：2017-09-07

Applicant: Gigaphoton Inc.

Inventor： Kouichi SATOU ,  Takayuki YABU ,  Yoshifumi UENO ,  Hirokazu HOSODA

IPC: H05G2/00 ,  H01S3/10

CPC classification number: H05G2/008 ,  G21K2201/06 ,  H01S3/10 ,  H05G2/005 ,  H05G2/006

Abstract: The stability of operations of an EUV light generating apparatus is improved. A droplet detector may include: a light source unit configured to emit illuminating light onto a droplet, which is output into a chamber and generate extreme ultraviolet light when irradiated with a laser beam; a light receiving unit configured to receive the illuminating light and to detect changes in light intensities; and a timing determining circuit configured to output a droplet detection signal that indicates that the droplet has been detected at a predetermined position within the chamber, based on a first timing at which the light intensity of the illuminating light decreases due to the droplet being irradiated therewith and a second timing at which the light intensity of the illuminating light increases.

公开(公告)号：US09348067B2

公开(公告)日：2016-05-24

申请号：US13319196

申请日：2010-06-09

Applicant: Gereon Vogtmeier ,  Klaus Juergen Engel ,  Thomas Koehler ,  Ewald Roessl

Inventor： Gereon Vogtmeier ,  Klaus Juergen Engel ,  Thomas Koehler ,  Ewald Roessl

IPC: G21K1/00 ,  G02B5/18 ,  A61B6/00

CPC classification number: G02B5/1857 ,  A61B6/484 ,  G21K2201/06 ,  G21K2207/005

Abstract: The present invention relates to phase-contrast imaging which visualizes the phase information of coherent radiation passing a scanned object. Focused gratings are used which reduce the creation of trapezoid profile in a projection with a particular angle to the optical axis. A laser supported method is used in combination with a dedicating etching process for creating such focused grating structures.

Abstract translation: 本发明涉及相位成像，其可视化通过扫描对象的相干辐射的相位信息。 使用聚焦光栅，其减小了与光轴具有特定角度的投影中的梯形轮廓的产生。 激光支持的方法与用于产生这种聚焦光栅结构的专用蚀刻工艺组合使用。

公开(公告)号：US20130070893A1

公开(公告)日：2013-03-21

申请号：US13682445

申请日：2012-11-20

Applicant: CANON KABUSHIKI KAISHA

Inventor： Chidane Ouchi ,  Kentaro Nagai ,  Toru Den ,  Hidenosuke Itoh

IPC: G01J9/02

CPC classification number: G06T7/0002 ,  A61B6/4291 ,  A61B6/484 ,  G01J9/02 ,  G01N23/04 ,  G01N23/20075 ,  G01N2223/401 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

Abstract translation: X射线成像装置包括相位光栅，吸收光栅，检测器和运算单元。 算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。 此外，运算单元执行相位检索步骤，从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱，对分离的频谱进行傅里叶逆变换，获取差分相位图像。

公开(公告)号：US20130009076A1

公开(公告)日：2013-01-10

申请号：US13636086

申请日：2011-03-02

Applicant: Daiki Yamatani

Inventor： Daiki Yamatani

IPC: G21K5/00

CPC classification number: H01L21/0274 ,  G03F7/2004 ,  G03F7/70033 ,  G03F7/70133 ,  G03F7/70141 ,  G03F7/70166 ,  G03F7/7085 ,  G21K1/067 ,  G21K2201/06 ,  H05G2/00 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: In an extreme ultraviolet (“EUV”) light source apparatus, uneven angle distribution images of EUV light are detected prior to an adjustment function by a detector, and angle distribution image data is recorded. Movement data corresponding to the recorded angle distribution image data is also recorded. The movement data corresponds to a movement amount and direction that the optical focusing means is moved from a position in which the angle distribution is even to the position in which the corresponding uneven angle distribution image is obtained. For the adjustment, a current angle distribution property image is detected by the detector and is compared with the uneven angle distribution property image data stored, and image data which is most closely matched with the current angle distribution property is selected. The movement data that corresponds to the selected image data is read out, and the light focusing optical means is moved based thereon.

Abstract translation: 在极紫外（EUV）光源装置中，通过检测器在调节功能之前检测到EUV光的不均匀角分布图像，并记录角度分布图像数据。 还记录与记录角度分布图像数据对应的运动数据。 运动数据对应于光学聚焦装置从角度分布均匀的位置移动到获得相应的不均匀角度分布图像的位置的移动量和方向。 对于调整，由检测器检测当前的角度分布特性图像，并将其与存储的不均匀角度分布特性图像数据进行比较，并且选择与当前角度分布特性最紧密匹配的图像数据。 读取对应于所选择的图像数据的移动数据，并且基于此移动聚焦光学装置。

公开(公告)号：US08263950B2

公开(公告)日：2012-09-11

申请号：US12788903

申请日：2010-05-27

Applicant: Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Kurt Gielissen ,  Martin Jacobus Johan Jak

Inventor： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Kurt Gielissen ,  Martin Jacobus Johan Jak

IPC: G03B27/54 ,  G21K5/00

CPC classification number: H05G2/001 ,  G03F7/70033 ,  G03F7/70858 ,  G21K2201/06

Abstract: A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.

Abstract translation: 辐射源可以包括用于发射辐射的辐射发射器，用于收集由辐射发射器发射的辐射的收集器以及在使用中被配置成将冷却的气体引入到辐射源中的出口。

公开(公告)号：US07864415B2

公开(公告)日：2011-01-04

申请号：US11856403

申请日：2007-09-17

Applicant: Ian McNulty

Inventor： Ian McNulty

IPC: G02B21/00

CPC classification number: G21K1/06 ,  G02B5/189 ,  G02B21/14 ,  G21K2201/06 ,  G21K2201/067 ,  G21K2207/005

Abstract: A method and objective apparatus are provided for implementing an enhanced phase contrast microscope. A focusing vortex lens, defined by a diffractive spiral zone plate (SZP) lens, is used for the objective for the phase contrast microscope. The SZP lens focuses and imparts a helical phase to incident illumination to image the specimen with spiral phase contrast. The spiral phase contrast microscope is sensitive to phase gradients in all sample axes. Replacing the objective of a microscope with the diffractive SZP lens of the invention immediately provides existing instruments with spiral phase contrast capability.

Abstract translation: 提供了一种实现增强型相差显微镜的方法和目标装置。 用于相差显微镜的目标使用由衍射螺旋区域（SZP）透镜限定的聚焦涡透镜。 SZP透镜聚焦并向入射照明施加螺旋相以对具有螺旋相位对比度的样品进行成像。 螺旋相差显微镜对所有样品轴的相位梯度敏感。 用本发明的衍射SZP透镜替代显微镜的目的立即提供现有的具有螺旋相位对比能力的仪器。

公开(公告)号：US07474729B2

公开(公告)日：2009-01-06

申请号：US11510615

申请日：2006-08-28

Applicant: Kwon-ha Yoon ,  Kyong-woo Kim

Inventor： Kwon-ha Yoon ,  Kyong-woo Kim

IPC: G21K7/00

CPC classification number: G21K7/00 ,  G21K2201/06 ,  H05G2/008

Abstract: A soft X-ray microscope includes a table (10); a housing (20) installed to the upper side of the table (10) and having a partition (22); a light source chamber (30) installed lower than the partition (22) of the housing (20) to project a light to liquid jetted under a high pressure to generate plasma; a mirror chamber (40), installed above the partition (22) of the housing (20), in which first and second mirror (410 and 430) are respectively installed to upper and lower sides of a holder (420) for storing a living sample, the soft X-ray generated by the plasma generated in the light source chamber (30) illuminates the living sample, and the soft X-ray penetrated the living sample is amplified to obtain an image in an image capturing chamber; and an image capturing chamber (50) installed to the upper side of the housing (20) to amplify a light image signal amplified through the mirror chamber (40) and to capture the light image on an external screen to allow distinguishing the light image from exterior.

Abstract translation: 软X射线显微镜包括台（10）; 安装在所述工作台（10）的上侧并具有隔板（22）的壳体（20）; 光源室（30），其安装在所述壳体（20）的隔板（22）的下方，以将在高压下喷射的液体投射到液体中以产生等离子体; 安装在所述壳体（20）的隔板（22）上方的反射镜室（40），其中第一和第二反射镜（410和430）分别安装在用于储存活体的保持器（420）的上侧和下侧 样品中，由光源室（30）中产生的等离子体产生的软X射线照射活体样品，并且穿透活体样品的软X射线被放大，以在摄像室中获得图像; 以及安装到所述壳体（20）的上侧的图像捕获室（50），以放大通过所述镜室（40）放大的光图像信号，并将所述光图像捕获到外部屏幕上以允许将所述光图像与 外观。

公开(公告)号：US20070292680A1

公开(公告)日：2007-12-20

申请号：US11808703

申请日：2007-06-12

Applicant: Hajime Nakayama ,  Susumu Sugiyama

Inventor： Hajime Nakayama ,  Susumu Sugiyama

IPC: G11B11/105

CPC classification number: G02B5/3091 ,  G02F1/1335 ,  G02F2201/50 ,  G21K2201/06 ,  Y10T428/26

Abstract: An optical film having a value of 1.6 or more, wherein the value is obtained by dividing a larger value by a smaller value of the maximum X-ray diffraction intensity within a range 2θ=10 to 40° in a longitudinal direction of the film and the maximum X-ray diffraction intensity within a range 2θ=10 to 40° in a direction approximately vertical to the longitudinal direction of the film, and an optical film having a value of 1.3 or more, wherein the value is obtained by dividing a larger value by a smaller value of a tensile elastic modulus in a longitudinal direction of the film and a tensile elastic modulus in a direction approximately vertical to the longitudinal direction of the film.

Abstract translation: 一种值为1.6以上的光学膜，其特征在于，通过在膜的长度方向上将最大X射线衍射强度的较大值除以2θ= 10〜40°的范围内的较大值来获得， 在与膜长度方向大致垂直的方向上的2θ= 10〜40°的范围内的最大X射线衍射强度和1.3以上的光学膜，其中，通过将较大的 通过在膜的纵向方向上的拉伸弹性模量值较小的值和在与膜的纵向方向大致垂直的方向上的拉伸弹性模量的值。

公开(公告)号：US20070183581A1

公开(公告)日：2007-08-09

申请号：US11700152

申请日：2007-01-31

Applicant: Bjorn Heismann ,  Eckhard Hempel ,  Stefan Popescu

Inventor： Bjorn Heismann ,  Eckhard Hempel ,  Stefan Popescu

IPC: G03F1/00 ,  G21K1/00

CPC classification number: A61B6/06 ,  A61B6/00 ,  A61B6/032 ,  A61B6/4014 ,  A61B6/4092 ,  A61B6/4233 ,  A61B6/4266 ,  A61B6/4291 ,  A61B6/4441 ,  A61B6/484 ,  G03B42/02 ,  G21K2201/06 ,  G21K2207/005

Abstract: A focus/detector system of an X-ray apparatus is disclosed for generating projective or tomographic phase contrast recordings. In at least one embodiment, the system includes a beam source, including a focus and a focus-side source grating, arranged in the beam path to generate a field of ray-wise coherent X-rays; and a grating/detector arrangement having a phase grating with grating lines arranged parallel to the source grating for generating an interference pattern and a detector having a multiplicity of detector elements arranged flat for measuring the radiation intensity behind the phase grating. Further, the detector elements are formed by a multiplicity of elongate detection strips, which are aligned parallel to the grating lines of the phase grating. Furthermore, at least one embodiment also relates to the use of this focus/detector system in an X-ray system for generating projective recordings or in C-arc equipment or a CT system, and/or to a method for generating projective and tomographic X-ray recordings of a subject.

Abstract translation: 公开了用于产生投影或层析相位对比记录的X射线装置的焦点/检测器系统。 在至少一个实施例中，系统包括布置在光束路径中以产生射线相干X射线场的束源，包括焦点和焦点侧源光栅; 以及具有相位光栅的光栅/检测器装置，其具有平行于源光栅布置的光栅线，用于产生干涉图案;以及检测器，具有平坦布置的多个检测器元件，用于测量相位光栅后面的辐射强度。 此外，检测器元件由多个细长的检测条形成，其平行于相位光栅的光栅线排列。 此外，至少一个实施例还涉及在X射线系统中用于产生投影记录或在C弧设备或CT系统中使用该焦点/检测器系统和/或用于产生投影和断层X的方法 录音的主题。

公开(公告)号：US07109503B1

公开(公告)日：2006-09-19

申请号：US11067099

申请日：2005-02-25

Applicant: Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Alexander I. Ershov ,  William N. Partlo

Inventor： Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Alexander I. Ershov ,  William N. Partlo

IPC: G01J1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract translation: 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。