Surface plasmon resonance spectrometer with an actuator driven angle scanning mechanism
    151.
    发明授权
    Surface plasmon resonance spectrometer with an actuator driven angle scanning mechanism 有权
    表面等离子体共振光谱仪具有致动器驱动的角度扫描机构

    公开(公告)号:US07889347B2

    公开(公告)日:2011-02-15

    申请号:US11562197

    申请日:2006-11-21

    CPC classification number: G01N21/553

    Abstract: Instruments and methods relating to surface plasmon imaging are described. An instrument comprises a semi-circular rail and a driving mechanism. The driving mechanism is attached to a light source mount and a detector mount, and both the light source mount and the detector mount are attached to the semi-circular rail with connectors. Each connector allows the light source mount and detector mount to slide along the rail. The synchronous movement of the light source mount and the detector mount changes the angle of incidence of a light beam from the light source with respect to the plane of the sample surface on the sample stage.

    Abstract translation: 描述了与表面等离子体激元成像有关的仪器和方法。 仪器包括半圆形轨道和驱动机构。 驱动机构附接到光源安装座和检测器座,并且光源安装座和检测器座均连接到具有连接器的半圆形轨道上。 每个连接器允许光源安装和检测器安装座沿着导轨滑动。 光源安装座和检测器座的同步运动改变来自光源的光束相对于样品台上样品表面的平面的入射角。

    Method and system for optical detection of nano-objects in a light refracting medium
    152.
    发明授权
    Method and system for optical detection of nano-objects in a light refracting medium 有权
    光折射介质中纳米物体的光学检测方法和系统

    公开(公告)号:US07889343B2

    公开(公告)日:2011-02-15

    申请号:US11631621

    申请日:2005-07-01

    Abstract: Method and system for optical detection of nano-objects in a refracting medium. A nano-object (n_oi) and the refractive medium are illuminated (A) with a periodically amplitude modulated coherent electromagnetic heating wave (HB(Ω)), to generate a specified temperature and refractive index profile in the vicinity of the nano-object, and with a coherent electromagnetic probe wave (PB) to generate an emerging probe wave (EPB(Ω)) having at least one intensity component amplitude modulated by a beat at the modulation frequency of the coherent heating wave. The intensity component amplitude modulated by a beat is detected (C) in the emerging wave (EPB(Ω)), to distinguish and represent this nano-object in the refractive medium. The invention is useful in the detection of nano-objects in an industrial, physiological or intracellular medium.

    Abstract translation: 折射介质中纳米物体的光学检测方法和系统。 纳米物体(n_oi)和折射介质用周期性调幅相干电磁加热波(HB(&OHgr))照射(A),以在纳米物体附近产生规定的温度和折射率分布 并且具有相干的电磁探测波(PB)以产生具有在相干加热波的调制频率处由节拍调制的至少一个强度分量振幅的新兴探测波(EPB(&OHgr)))。 在出现的波(EPB(&OHgr))中检测到由拍子调制的强度分量幅度(C),以在折射介质中区分并表示该纳米物体。 本发明可用于检测工业,生理或细胞内介质中的纳米物体。

    Normal incidence ellipsometer with complementary waveplate rotating compensators
    153.
    发明授权
    Normal incidence ellipsometer with complementary waveplate rotating compensators 有权
    具有互补波片旋转补偿器的正常入射椭偏仪

    公开(公告)号:US07889340B1

    公开(公告)日:2011-02-15

    申请号:US12170371

    申请日:2008-07-09

    CPC classification number: G01N21/211 G01J4/00 G01N2021/213

    Abstract: In embodiments of the present invention a second, different waveplate is introduced into a single rotating compensator normal incidence ellipsometer. The second waveplate provides a quarter wavelength retardation that is different from and complementary to that of the first waveplate in order to increase the spectral range for which useful retardation is available, especially towards the deep UV spectrum. The sensitivity for the system may also be increased in the conventional spectral range, since each of the two waveplates may be optimized for its own, somewhat more narrow spectral range of operation. With the proper choice of two waveplates of different retardation, the useful spectral range may be extended from typically 190-820 nm to 150-1000 nm, and beyond if necessary, while increasing the sensitivity within the conventional wavelength range at the same time.

    Abstract translation: 在本发明的实施例中,将第二不同的波片引入到单个旋转补偿器法向入射椭偏仪中。 第二波片提供与第一波片的波长相差和互补的四分之一波长延迟,以便增加有用的延迟可用的光谱范围,特别是对于深紫外光谱。 在常规光谱范围内,系统的灵敏度也可能增加,因为两个波片中的每一个可以针对其本身的稍微更窄的光谱操作范围进行优化。 通过适当选择不同延迟的两个波片,有用的光谱范围可以从典型的190-820nm扩展到150-1000nm,并且如果需要可以延长,同时在常规波长范围内同时增加灵敏度。

    Coordinate measuring machine and method for structured illumination of substrates
    154.
    发明授权
    Coordinate measuring machine and method for structured illumination of substrates 有权
    坐标测量机和基板结构照明方法

    公开(公告)号:US07889338B2

    公开(公告)日:2011-02-15

    申请号:US12154826

    申请日:2008-05-27

    Applicant: Michael Heiden

    Inventor: Michael Heiden

    CPC classification number: G01B11/2513

    Abstract: A coordinate measuring machine for the structured illumination of substrates is disclosed. The incident light illumination means and/or the transmitted light illumination means have a pupil access via which at least one optical element is positionable in the optical illumination path. The size and/or type and/or the polarization of the pupil illumination may be manipulated such that the structured illumination of the substrate in the coordinate measuring machine corresponds to the structured illumination of this substrate in the exposure process with a stepper.

    Abstract translation: 公开了一种用于基板结构照明的坐标测量机。 入射光照明装置和/或透射光照明装置具有光瞳通路,至少一个光学元件可通过该光瞳访问在光学照明路径中。 可以操纵瞳孔照明的尺寸和/或类型和/或偏振,使得坐标测量机中的基底的结构照明对应于具有步进器的曝光过程中该基底的结构照明。

    Glass container wall thickness measurement using fluorescence
    155.
    发明授权
    Glass container wall thickness measurement using fluorescence 有权
    玻璃容器壁厚测量使用荧光

    公开(公告)号:US07876437B1

    公开(公告)日:2011-01-25

    申请号:US12535828

    申请日:2009-08-05

    CPC classification number: G01B11/06 G01L1/2206 G01L1/241 G01N21/90

    Abstract: An apparatus and method for measurement of the stress in and thickness of the walls of glass containers is disclosed that uses fluorescence to quickly and accurately ascertain both the thickness of the stress layers and the wall thickness in addition to the stress curve in glass containers. The apparatus and method may be used to quickly and accurately measure both the stress in and the thickness of the side walls of glass containers throughout the circumference of the glass containers. The apparatus and method are adapted for large scale glass container manufacturing, and are capable of high speed measurement of the stress in and the thickness of the side walls of glass containers.

    Abstract translation: 公开了用于测量玻璃容器的壁的应力和厚度的装置和方法,除了玻璃容器中的应力曲线之外,还使用荧光来快速准确地确定应力层的厚度和壁厚。 该装置和方法可用于快速且准确地测量玻璃容器在玻璃容器的整个圆周上的侧壁的应力和厚度。 该装置和方法适用于大规模玻璃容器制造,并且能够高速测量玻璃容器的侧壁的应力和厚度。

    Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
    156.
    发明申请
    Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 审中-公开
    检验方法和装置,平版印刷设备,平版印刷加工单元和器件制造方法

    公开(公告)号:US20110007316A1

    公开(公告)日:2011-01-13

    申请号:US12777486

    申请日:2010-05-11

    Abstract: An inspection apparatus configured to measure a property of a substrate includes an illumination source, a beam splitter, a first polarizer positioned between the illumination source and the beam splitter, an objective lens and an optical device that alters a polarization state of radiation traveling through it positioned between the beam splitter and the substrate and a second polarizer positioned between the beam splitter and a detector. An axis of the second polarizer is rotated with respect to an axis of the first polarizer. Radiation polarized by the first polarizer that reflects off any optical elements between the beam splitter and the optical device is prevented from entering the detector by the second polarizer. Only radiation that passes twice through the optical device has its polarization direction rotated so that it passes through the second polarizer and enters the detector.

    Abstract translation: 被配置为测量基板的特性的检查装置包括照明源,分束器,位于照明源和分束器之间的第一偏振器,物镜和光学装置,其改变穿过其的辐射的偏振状态 位于分束器和基板之间,第二偏振器位于分束器和检测器之间。 第二偏振器的轴线相对于第一偏振器的轴线旋转。 通过第二偏振器防止由分光器和光学装置之间的任何光学元件反射的第一偏振器偏振的辐射进入检测器。 只有通过光学装置两次的辐射,其偏振方向旋转,使得其通过第二偏振器并进入检测器。

    Apparatus for supporting substrate, apparatus for measuring surface potential, apparatus for measuring film thickness, and apparatus for inspecting substrate
    157.
    发明授权
    Apparatus for supporting substrate, apparatus for measuring surface potential, apparatus for measuring film thickness, and apparatus for inspecting substrate 有权
    用于支撑基板的装置,用于测量表面电位的装置,用于测量膜厚度的装置以及用于检查基板的装置

    公开(公告)号:US07869062B2

    公开(公告)日:2011-01-11

    申请号:US12007299

    申请日:2008-01-09

    CPC classification number: H01L21/6838 B41J3/4071

    Abstract: In a substrate supporting apparatus of a surface potential measuring apparatus, a first fluid is ejected around a target region on an upper surface of a substrate from a circular-shaped first porous member of a first fluid ejection part and a second fluid is ejected onto a lower surface of the substrate from a circular-shaped second porous member of a second fluid ejection part which is opposite to the first fluid ejection part. The substrate can be supported and flattened between the first fluid ejection part and the second fluid ejection part. Also, it is possible to keep the distance between the substrate and the first porous member, with a simple construction. As a result, a probe can be positioned above a flatted target region with leaving a predetermined spacing, to perform measurement of a surface potential of the target region on the substrate with high accuracy.

    Abstract translation: 在表面电位测量装置的衬底支撑装置中,第一流体从第一流体喷射部件的圆形第一多孔构件在基板的上表面上的目标区域周围喷射,并且将第二流体喷射到 从与第一流体喷射部分相对的第二流体喷射部分的圆形第二多孔部件的下表面。 基板可以在第一流体喷射部分和第二流体喷射部分之间被支撑和平坦化。 此外,可以以简单的结构保持基板和第一多孔构件之间的距离。 结果,探针可以放置在平坦的目标区域之上,留下预定的间隔,以高精度地测量衬底上目标区域的表面电位。

    Monitoring devices and processes based on transformation, destruction and conversion of nanostructures
    158.
    发明申请
    Monitoring devices and processes based on transformation, destruction and conversion of nanostructures 审中-公开
    基于纳米结构转化,破坏和转化的监测装置和工艺

    公开(公告)号:US20110003279A1

    公开(公告)日:2011-01-06

    申请号:US12879688

    申请日:2010-09-10

    CPC classification number: G01D7/00 B82Y15/00 B82Y30/00 G01D3/10 G01D7/005

    Abstract: A large number of properties of nanostructures depend on their size, shape and many other parameters. As the size of a nanostructure decreases, there is a rapid change in many properties. When the nanostructure is completely destroyed, those properties essentially disappear. Systems based on changes in properties of nanostructures due to the destruction of nanostructures are proposed. The systems can be used for monitoring the total exposure to organic, inorganic, organometallic and biological compounds and agents using analytical methods.

    Abstract translation: 纳米结构的大量性质取决于其尺寸,形状和许多其他参数。 随着纳米结构的尺寸减小,许多性质发生了快速变化。 当纳米结构完全破坏时,这些性质基本消失。 提出了基于纳米结构破坏导致纳米结构特性变化的系统。 该系统可用于使用分析方法监测有机,无机,有机金属和生物化合物和试剂的总暴露量。

    Spectroscopic ellipsometer and ellipsometry
    159.
    发明授权
    Spectroscopic ellipsometer and ellipsometry 有权
    光谱椭偏仪和椭偏仪

    公开(公告)号:US07864318B2

    公开(公告)日:2011-01-04

    申请号:US12236178

    申请日:2008-09-23

    Applicant: Kumiko Fukue

    Inventor: Kumiko Fukue

    CPC classification number: G01B11/0641

    Abstract: A spectroscopic ellipsometer has a polarized light generating part for generating elliptically polarized lights of a plurality of wavelengths included in a predetermined measurement wavelength band from white light and directing the elliptically polarized lights to a measurement surface of a substrate, a rotating analyzer where reflected light reflected on the measurement surface enters, and a spectrometer for acquiring spectral intensity of light from the rotating analyzer. A polarization state acquiring part in a control part acquires a polarization state at each wavelength in the measurement wavelength band of the reflected light. The optical characteristic calculation part obtains a film thickness on the measurement surface with high accuracy on the basis of differences between measurement values and theoretical values, the measurement values representing change of a complex amplitude ratio between a p-polarized component and an s-polarized component and a phase difference between a p-polarized component and an s-polarized component.

    Abstract translation: 分光椭偏仪具有偏振光产生部,用于从白光产生包含在预定测量波长带中的多个波长的椭圆偏振光,并将椭圆偏振光引导到基板的测量表面;反射光反射的旋转分析仪 在测量表面进入,以及用于从旋转分析仪获取光的光谱强度的光谱仪。 控制部中的偏振态获取部获取反射光的测定波长带的各波长的偏振状态。 光学特性计算部分基于测量值和理论值之间的差异,以高精度获得测量表面上的膜厚度,表示p极化分量和s偏振分量之间的复振幅比的变化的测量值 以及p偏振分量和s偏振分量之间的相位差。

    Polarimeter
    160.
    发明申请
    Polarimeter 有权
    偏光仪

    公开(公告)号:US20100315641A1

    公开(公告)日:2010-12-16

    申请号:US12813130

    申请日:2010-06-10

    Applicant: Ronan GARREC

    Inventor: Ronan GARREC

    Abstract: A kit having a supporting device for maintaining a transparent article having a longitudinal axis A, a proximal end and a distal end. The supporting device including a proximal holder including a port intended to receive the proximal end of the article, and a distal holder including a receiving part intended to receive the distal end of the article, the port and the receiving part being aligned on the same longitudinal axis B. The supporting device further having a compressor for putting the article under longitudinal compression directed towards a center of the article, when the article is mounted on the supporting device with its longitudinal axis A aligned on the longitudinal axis B, and a polarimeter. The invention also pertains to a method for measuring the stress inside an article made of transparent material.

    Abstract translation: 一种具有用于保持具有纵向轴线A,近端和远端的透明制品的支撑装置的套件。 所述支撑装置包括近端保持器,所述近端保持器包括用于容纳所述物品的近端的端口,以及远侧保持器,所述远端保持器包括用于容纳所述物品的远端的接收部分,所述端口和所述接收部件在相同的纵向 支撑装置还具有一个压缩机,用于将制品放置在朝向制品中心的纵向压缩下,当制品安装在支撑装置上时,其纵向轴线A在纵​​向轴线B上对准偏振计。 本发明还涉及一种用于测量由透明材料制成的制品内的应力的方法。

Patent Agency Ranking