公开(公告)号：US10323166B2

公开(公告)日：2019-06-18

申请号：US15563289

申请日：2016-03-08

Applicant: ADEKA CORPORATION

Inventor： Chun Cui ,  Tatsuhito Nakamura ,  Kazukiyo Nomura

IPC: C09K3/16 ,  C08K5/521 ,  C08L23/00 ,  C08L67/02 ,  C07F5/06 ,  C08K5/527 ,  C08K5/56 ,  C08L23/02 ,  C08K5/098 ,  C08K5/00

Abstract: Provided are: a resin additive composition capable of imparting excellent antistatic effect in a small amount, and an antistatic thermoplastic resin composition. The resin additive composition contains two or more selected from aromatic metal phosphates (H) represented by the following Formula (3) or (4) in an amount of 0.001 to 50 parts by mass with respect to 100 parts by mass of a polymer compound (E). The polymer compound (E) has a structure in which a diol, an aliphatic dicarboxylic acid, an aromatic dicarboxylic acid, a compound (B) which contains at least one group represented by the following Formula (1) and has hydroxyl groups at both ends, and an epoxy compound (D) having two or more epoxy groups are bound via ester bonds:

公开(公告)号：US10301519B2

公开(公告)日：2019-05-28

申请号：US15505429

申请日：2015-08-05

Applicant: ADEKA CORPORATION

Inventor： Tatsuhito Nakamura ,  Kazukiyo Nomura

IPC: C09K3/16 ,  C08G63/668 ,  C08L67/00 ,  C08G63/199 ,  C08G63/672 ,  C08L55/02

Abstract: Provided are: an antistatic agent and an antistatic agent composition which are capable of providing excellent antistatic effect in a small amount and have sufficient persistence and wiping resistance; and an antistatic resin composition and a molded article using the same.The antistatic agent includes a polymer compound (E) having a structure in which a diol, a dicarboxylic acid, a compound (B) which comprises at least one group represented by the following Formula (1) and has hydroxyl groups at both ends, and a polycarboxylic acid compound (D) are bound via ester bonds: —CH2—CH2—O—  (1).

公开(公告)号：US20190144671A1

公开(公告)日：2019-05-16

申请号：US16304454

申请日：2017-04-27

Applicant: ADEKA CORPORATION

Inventor： Hiroki AKATSU ,  Takashi AYABE

IPC: C08L81/02 ,  C08L67/04 ,  C08L77/00 ,  C08K5/3492 ,  C08K5/3475 ,  B29C45/00 ,  B29C48/00

Abstract: A resin composition including: (A) 100 parts by mass of a resin selected from the group consisting of polyamide, polylactic acid, and polyphenylene sulfide each having a melting point of 170° C. to 370° C.; (B) 0.05 to 5.0 parts by mass of a triazine compound represented by general formula (1); (C) 0 to 3.0 parts by mass of a specific oxidizing agent; and (D) 0 to 1.0 part by mass of a specific light stabilizer.

公开(公告)号：US10253408B2

公开(公告)日：2019-04-09

申请号：US15559127

申请日：2016-05-17

Applicant: ADEKA CORPORATION

Inventor： Tomoharu Yoshino ,  Masaki Enzu ,  Akihiro Nishida ,  Nana Sugiura

IPC: C07F13/00 ,  C07F15/04 ,  C07F15/06 ,  C23C16/18 ,  H01L21/285

Abstract: A novel compound represented by the general formula (I) or (II) below: [in the formula, each of R1 and R2 independently represent a C1˜12 hydrocarbon group, and Si(R3)3 is optionally substituted for a hydrogen atom in the hydrocarbon group; however, R1 and R2 are different groups; R3 represents a methyl or ethyl group; M represents a metal atom or silicon atom; and n is an integer from 1 to 4].

公开(公告)号：US10189847B2

公开(公告)日：2019-01-29

申请号：US15129630

申请日：2015-03-30

Applicant: ADEKA CORPORATION

Inventor： Yoko Komiyama ,  Takeo Oishi ,  Tomoyuki Ariyoshi ,  Tomoya Tamachi ,  Takayuki Ikaga ,  Naomi Sato

IPC: C07D243/36 ,  G03F7/004 ,  C07D487/06 ,  C07D209/14 ,  C08F2/50 ,  G03F7/027 ,  G03F7/031 ,  C07D401/04 ,  C07D405/04 ,  C07D409/04 ,  C07D209/56 ,  C07D209/60 ,  C07D409/10 ,  C07D471/04

Abstract: An oxime ester compound represented by general formula (I), wherein R1to R8 are as defined in the description, and n is 0 or 1; a photopolymerization initiator containing the compound; a photosensitive composition, alkali-developable photosensitive resin composition, and colored alkali-developable photosensitive resin composition containing the photopolymerization initiator; and a cured product of these compositions are provided. The compound is useful as a high-sensitivity photopolymerization initiator that has good stability and low sublimability and that efficiently absorbs, and is activated by, near-ultraviolet light, e.g., at 365 nm.

公开(公告)号：US10150789B2

公开(公告)日：2018-12-11

申请号：US15598450

申请日：2017-05-18

Applicant: ADEKA CORPORATION

Inventor： Hiroki Sato ,  Junji Ueyama

IPC: C07F17/00 ,  C23C16/18 ,  C23C16/40 ,  C07F11/00 ,  C23C16/44 ,  C23C16/455

Abstract: In the method of the present invention for producing a thin film, including introducing, onto a substrate, a vapor that has been obtained by vaporizing a thin-film-forming material including a molybdenum imide compound represented by the following formula (I) and that includes the molybdenum imide compound; and then forming a thin film including molybdenum on the substrate by decomposing and/or chemically reacting the molybdenum imide compound. (In the formula, R1 though R10 each represent a hydrogen atom or a linear or branched alkyl group having 1 to 5 carbon atoms, and R11 represents a linear or branched alkyl group having 1 to 8 carbon atoms).

公开(公告)号：US20180327584A1

公开(公告)日：2018-11-15

申请号：US16044011

申请日：2018-07-24

Applicant: ADEKA CORPORATION

Inventor： Naoto UEDA ,  Kazukiyo NOMURA

IPC: C08L33/12 ,  C08J5/00 ,  B32B27/18 ,  B32B27/30 ,  B32B27/36 ,  C08J5/18 ,  C08K5/3492 ,  B29D99/00

CPC classification number: C08L33/12 ,  B29D99/0057 ,  B29D99/006 ,  B32B27/18 ,  B32B27/30 ,  B32B27/308 ,  B32B27/36 ,  B32B2250/00 ,  B32B2250/02 ,  B32B2250/24 ,  B32B2250/246 ,  B32B2270/00 ,  B32B2307/40 ,  B32B2307/71 ,  B32B2307/712 ,  B32B2451/00 ,  B32B2471/00 ,  B32B2607/00 ,  C08J5/00 ,  C08J5/18 ,  C08K5/3492

Abstract: Disclosed is an acrylic resin composition that has excellent weather resistance and can be stably produced at high temperatures. Specifically, disclosed is an acrylic resin composition including, with respect to 100 parts by mass of an acrylic resin, from 0.1 to 8 parts by mass of a triazine-based UV absorber including 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-5-[2-(2-ethylhexanoyloxy)ethoxy]phenol, wherein the acrylic resin used is an acrylic resin including at least 80 wt % of methyl methacrylate as a monomer component, and having a glass transition temperature of at least 80° C.

公开(公告)号：US20180298501A1

公开(公告)日：2018-10-18

申请号：US15769217

申请日：2016-08-22

Applicant: ADEKA CORPORATION

Inventor： Yuji MASAMOTO ,  Yoshihide SAIO ,  Tamami AOKI

IPC: C23F1/18 ,  H01L21/308

CPC classification number: C23F1/18 ,  H01L21/306 ,  H01L21/308 ,  H05K3/06

Abstract: The present invention provides an etching liquid composition consisting of an aqueous solution that contains (A) 0.1 to 30 mass % of at least one type of oxidizing agent selected from among ferric ions and cupric ions; (B) 0.1 to 20 mass % of hydrogen chloride, and an etching method using it.

公开(公告)号：US10053536B2

公开(公告)日：2018-08-21

申请号：US15540072

申请日：2015-12-08

Applicant: ADEKA CORPORATION

Inventor： Tatsuhito Nakamura ,  Kazukiyo Nomura

IPC: C08K3/16 ,  C08G63/672 ,  C08K5/098 ,  C08K5/42 ,  C08L101/00 ,  C08L23/00 ,  C08L25/00 ,  C08L67/02 ,  C09K3/16

CPC classification number: C08G63/672 ,  C08K3/16 ,  C08K5/098 ,  C08K5/42 ,  C08L23/00 ,  C08L25/00 ,  C08L67/02 ,  C08L101/00 ,  C09K3/16

Abstract: Provided are: an antistatic resin composition which not only has long-lasting and sufficient antistaticity and shows hardly any ion elution when made into a molded article but also is suitable for containers and packaging materials for storage and transport of electrical/electronic components; and a container and a packaging material which comprise the same. The antistatic resin composition includes, with respect to 100 parts by mass of a synthetic resin, 3 to 20 parts by mass of at least one polymer compound (E) and 0.1 to 5 parts by mass of at least one alkali metal salt (F). The polymer compound (E) has a structure in which a diol, an aliphatic dicarboxylic acid, an aromatic dicarboxylic acid, a compound (B) which comprises at least one group represented by the following Formula (1) and has hydroxyl groups at both ends, and a compound (D) having a reactive functional group are bound via ester bonds, or ester bonds and amide bonds: —CH2—CH2—O—  (1).

公开(公告)号：US20180230293A1

公开(公告)日：2018-08-16

申请号：US15751026

申请日：2016-07-29

Applicant: ADEKA CORPORATION

Inventor： Mitsuru FUKUSHIMA ,  Naoko TANJI ,  Tomonori SHIMIZU

IPC: C08K5/527 ,  C08K5/098 ,  C08K5/00

CPC classification number: C08K5/527 ,  C08K5/00 ,  C08K5/098 ,  C08K5/13 ,  C08L23/10

Abstract: Provided are: a resin additive composition containing a specific metal phosphate, which composition has excellent dispersibility in a resin even when made into a pellet form and exhibits a desired physical property improving effect when incorporated into a resin; and a synthetic resin composition using the same. The resin additive composition contains, with respect to 100 parts by mass of (A) sodium-2,2′-methylene-bis(4,6-di-tert-butylphenyl)phosphate: 25 to 400 parts by mass of (B) a lithium phosphate compound represented by the following Formula (1); and 10 to 300 parts by mass of (C) a fatty acid metal salt represented by the following Formula (2). The component (C) is incorporated in an amount of 10 parts by mass to 50 parts by mass with respect to a total of 100 parts by mass of the components (A) and (B).