公开(公告)号：US20180298501A1

公开(公告)日：2018-10-18

申请号：US15769217

申请日：2016-08-22

Applicant: ADEKA CORPORATION

Inventor： Yuji MASAMOTO ,  Yoshihide SAIO ,  Tamami AOKI

IPC: C23F1/18 ,  H01L21/308

CPC classification number: C23F1/18 ,  H01L21/306 ,  H01L21/308 ,  H05K3/06

Abstract: The present invention provides an etching liquid composition consisting of an aqueous solution that contains (A) 0.1 to 30 mass % of at least one type of oxidizing agent selected from among ferric ions and cupric ions; (B) 0.1 to 20 mass % of hydrogen chloride, and an etching method using it.