公开(公告)号：US20030043456A1

公开(公告)日：2003-03-06

申请号：US10205206

申请日：2002-07-26

Applicant: ASM LITHOGRAPHY B.V.

Inventor： Mandeep Singh

IPC: G02B001/00 ,  G02B005/08 ,  G02B005/20 ,  F21V009/04 ,  F21V009/06 ,  G02B007/182

CPC classification number: B82Y10/00 ,  G02B5/0891 ,  G03F1/24 ,  G03F7/70058 ,  G03F7/70233 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/06 ,  G21K1/062 ,  G21K2201/061 ,  Y10S359/90 ,  Y10T428/24355

Abstract: The reflectivity of multilayered EUV mirrors tuned for 11-16 nm, for which the two-component Mo/Be and Mo/Si multilayered systems are commonly used, is enhanced by incorporating additional elements and their compounds mainly from period 5 of the periodic table. In addition, the reflectivity performance of the multilayer stacks is further enhanced by a numerical global optimization procedure by which the layer thicknesses are varied for optimum performance in, contradistinction to the constant layer thicknessnulli.e. constant partition rationullmultilayer stacks commonly designed and, fabricated hitherto. By incorporating additional materials with differing complex refractive indices in various regions of the stack, or by wholly replacing one of the components (typically Mo), we have observed peak reflectivity enhancements of up to 5% for a single reflector compared to a standard unoptimized stack. The additional materials used are: Rb, RbCl, Sr, Y, Zr, Ru, Rh, Tc, Pd, Nb and Be. Protective capping layers of B, Ru, Rh, C, Si3N4, SiC, in addition to protecting the mirrors from environmental attack, may serve to improve the reflectivity characteristics.

Abstract translation: 通常使用双组分Mo / Be和Mo / Si多层体系的11-16nm的多层EUV反射镜的反射率通过主要从周期表的第5周引入附加元素及其化合物来增强。 此外，通过数值全局优化程序进一步增强了多层堆叠的反射性能，通过该数值全局优化程序，层厚度随着恒定层厚度的变化而达到最佳性能。 常规分配比 - 通常设计和制造的多层堆叠。 通过在堆叠的各个区域中引入具有不同复合折射率的附加材料，或通过完全替代其中一个部件（通常为Mo）），与标准非优化堆叠相比，我们观察到单个反射器的峰值反射率增强高达5％ 。 使用的附加材料有：Rb，RbCl，Sr，Y，Zr，Ru，Rh，Tc，Pd，Nb和Be。 B，Ru，Rh，C，Si3N4，SiC的保护性覆盖层除了保护镜子免受环境攻击之外，还可用于提高反射率特性。

公开(公告)号：US06521101B1

公开(公告)日：2003-02-18

申请号：US08762572

申请日：1996-12-09

Applicant: Kenneth M. Skulina ,  Richard M. Bionta ,  Daniel M. Makowiecki ,  Craig S. Alford

Inventor： Kenneth M. Skulina ,  Richard M. Bionta ,  Daniel M. Makowiecki ,  Craig S. Alford

IPC: C23C1434

CPC classification number: B82Y10/00 ,  C23C14/14 ,  C23C14/564 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

Abstract: Beryllium-based multilayer structures and a process for fabricating beryllium-based multilayer mirrors, useful in the wavelength region greater than the beryllium K-edge (111 Å or 11.1 nm). The process includes alternating sputter deposition of beryllium and a metal, typically from the fifth row of the periodic table, such as niobium (Nb), molybdenum (Mo), ruthenium (Ru), and rhodium (Rh). The process includes not only the method of sputtering the materials, but the industrial hygiene controls for safe handling of beryllium. The mirrors made in accordance with the process may be utilized in soft x-ray and extreme-ultraviolet projection lithography, which requires mirrors of high reflectivity (>60%) for x-rays in the range of 60-140 Å (60-14.0 nm).

Abstract translation: 铍基多层结构和制造铍基多层反射镜的方法，可用于大于铍K边缘（111或11.1nm）的波长区域。 该方法包括交替溅射沉积铍和通常从元素周期表第五行的金属，例如铌（Nb），钼（Mo），钌（Ru）和铑（Rh）。 该方法不仅包括溅射材料的方法，还包括用于安全处理铍的工业卫生控制。 根据该方法制造的反射镜可用于软X射线和极紫外投影光刻，其需要60-140埃（60-14.0）范围内的X射线具有高反射率（> 60％）的反射镜 nm）。

公开(公告)号：US6014423A

公开(公告)日：2000-01-11

申请号：US26391

申请日：1998-02-19

Applicant: George Gutman ,  Licai Jiang ,  Boris Verman

Inventor： George Gutman ,  Licai Jiang ,  Boris Verman

IPC: G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/06 ,  G21K2201/061

Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.

Abstract translation: 包括多个x射线反射器的x射线反射系统，其中所述x射线反射器耦合在一起以形成多角的Kirkpatrick-Baez并排系统，并且可以包括多层或多层 层布拉格X射线反射面。

公开(公告)号：US5757882A

公开(公告)日：1998-05-26

申请号：US574249

申请日：1995-12-18

Applicant: George Gutman

Inventor： George Gutman

IPC: G21K1/00 ,  G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/068

Abstract: An optical system for providing a steerable monochromatized source of x-ray or neutron radiation. The system incorporates a radiation source and a Bragg structure reflective optical element. A stage causes the optical element to move relative to the radiation source. Such movement is coordinated with lateral d-layer grading such that Bragg's law of reflection is satisfied for radiation of a given wavelength bandwidth to be reflected at various instances and departure angles.

Abstract translation: 一种用于提供x射线或中子辐射的可导向单色化源的光学系统。 该系统包含辐射源和布拉格结构反射光学元件。 阶段使光学元件相对于辐射源移动。 这种运动与横向d层分级协调，使得对于给定波长带宽的辐射满足反射的布拉格定律以在各种情况和出发角度被反射。

公开(公告)号：US5433988A

公开(公告)日：1995-07-18

申请号：US323592

申请日：1994-10-17

Applicant: Yasuaki Fukuda ,  Yutaka Watanabe ,  Shigetaro Ogura ,  Takashi Iizuka

Inventor： Yasuaki Fukuda ,  Yutaka Watanabe ,  Shigetaro Ogura ,  Takashi Iizuka

IPC: B32B15/08 ,  G02B1/10 ,  G21K1/06 ,  G02B5/28

CPC classification number: B32B15/08 ,  B82Y10/00 ,  G02B5/0833 ,  G02B5/0891 ,  G02B5/26 ,  G21K1/062 ,  G21K2201/061 ,  Y10S428/913 ,  Y10T428/24355 ,  Y10T428/30

Abstract: A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layers primarily consists of at least one of single elements, such as ruthenium, or of a boride carbide, silicate, nitride oxide of a transition metal. The second layers primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).

Abstract translation: 用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。 第一层主要由单一元素中的至少一种组成，例如钌，或硼化物碳化物，硅酸盐，过渡金属的氮氧化物。 第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和 铝（例如碳化物，氮化物和铝的氧化物）。

公开(公告)号：US5265143A

公开(公告)日：1993-11-23

申请号：US857

申请日：1993-01-05

Applicant: Kathleen R. Early ,  Richard E. Howard ,  Donald M. Tennant ,  Warren K. Waskiewicz ,  David L. Windt

Inventor： Kathleen R. Early ,  Richard E. Howard ,  Donald M. Tennant ,  Warren K. Waskiewicz ,  David L. Windt

IPC: G01J1/04 ,  G02B5/08 ,  G21K1/06 ,  H01L21/308 ,  H01L21/312

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

Abstract: In one aspect, the invention involves an optical element in an x-ray imaging system. The element comprises a substrate overlain by a multilayer coating. The multilayer coating comprises plural first and at least second material layers in alternation. This coating is soluble in at least one etchant solution at an etching temperature less than 100.degree. C. The optical element further comprises a barrier layer intermediate the substrate and the multilayer coating. The barrier layer is relatively insoluble in the etchant solution at the etching temperature. In a second aspect of the invention, the optical element comprises a substrate and a multilayer coating as described above, and further comprises a release layer that underlies the multilayer coating. The release layer comprises a material that is relatively soluble in at least one etchant solution at an etching temperature less than 100.degree. C. In contrast to release layers of the prior art, the inventive release layer comprises germanium.

Abstract translation: 在一个方面，本发明涉及x射线成像系统中的光学元件。 元件包括由多层涂层覆盖的基底。 多层涂层交替地包括多个第一和至少第二材料层。 该涂层在小于100℃的蚀刻温度下可溶于至少一种蚀刻剂溶液。光学元件还包括位于基底和多层涂层之间的阻挡层。 在蚀刻温度下，阻挡层相对不溶于蚀刻剂溶液。 在本发明的第二方面，光学元件包括如上所述的基底和多层涂层，并且还包括在多层涂层下面的剥离层。 剥离层包括在低于100℃的蚀刻温度下相对可溶于至少一种蚀刻剂溶液的材料。与现有技术的剥离层相反，本发明的剥离层包括锗。

公开(公告)号：US5182763A

公开(公告)日：1993-01-26

申请号：US888275

申请日：1992-05-26

Applicant: Takashi Iizuka ,  Yutaka Watanabe ,  Yasuaki Fukuda

Inventor： Takashi Iizuka ,  Yutaka Watanabe ,  Yasuaki Fukuda

IPC: G02B5/08 ,  G02B26/10 ,  G03F7/20 ,  G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G02B26/10 ,  G02B5/0891 ,  G03F7/70058 ,  G03F7/70958 ,  G21K2201/061 ,  G21K2201/064

Abstract: Disclosed are a reflection mirror for reflecting a received radiation beam to produce a reflection beam, a reflection device with such a mirror, a scanning system with such a mirror and an exposure apparatus with such a mirror. A radiation beam is inputted to the reflection mirror with an angle of incidence which changes with position on the reflection mirror, wherein the reflection mirror has a multilayered film effective to provide an increased relative reflectivity with respect to a predetermined wavelength of the reflection beam, and wherein a layer of the multilayered film has a thickness which changes with position so as to substantially avoid a shift of the wavelength of the reflection beam dependent upon the angle of incidence.

Abstract translation: 公开了一种用于反射接收的辐射束以产生反射光束的反射镜，具有这种反射镜的反射装置，具有这种反射镜的扫描系统和具有这种反射镜的曝光装置。 辐射束以反射镜上的位置随着入射角被输入到反射镜，其中反射镜具有有效地相对于反射光束的预定波长提供增加的相对反射率的多层膜，以及 其中所述多层膜的层具有随位置而变化的厚度，以便基本上避免所述反射光束的波长相对于所述入射角的偏移。

公开(公告)号：US5167912A

公开(公告)日：1992-12-01

申请号：US790727

申请日：1991-11-08

Applicant: James L. Wood

Inventor： James L. Wood

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/068

Abstract: An improved neutron reflecting supermirror structure comprising a plurality of stacked sets of bilayers of neutron reflecting materials. The improved neutron reflecting supermirror structure is adapted to provide extremely good performance at high incidence angles, i.e. up to four time the critical angle of standard neutron mirror structures. The reflection of neutrons striking the supermirror structure at a high critical angle provides enhanced neutron throughput, and hence more efficient and economical use of neutron sources.

Abstract translation: 一种改进的中子反射超镜结构，包括多个堆叠的中子反射材料双层组。 改进的中子反射超镜结构适于在高入射角提供非常好的性能，即高达标准中子镜结构的临界角的四倍。 以高临界角撞击超镜结构的中子的反射提供了增强的中子吞吐量，从而更有效和更经济地使用中子源。

公开(公告)号：US5042059A

公开(公告)日：1991-08-20

申请号：US316055

申请日：1989-02-27

Applicant: Kazuhiro Watanabe ,  Mutsuaki Murakami ,  Susumu Yoshimura

Inventor： Kazuhiro Watanabe ,  Mutsuaki Murakami ,  Susumu Yoshimura

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2201/068

Abstract: Optical elements for radiation comprising a graphite film obtained from a film of a polymer such as polyphenylene oxadiazole, polybenzothiazole, polybenzobisthiazole, polybenzooxazole, polybenzobisoxazole, polypyromellitimide, polyphenylene isophthalamide, polyphenylene benzoimidazole, polyphenylene benzobisimidazole, polythiazole or poly-p-phenylene-vinylene. The graphite film is obtained by pyrolysis of the polymer film at 2800.degree. C. or higher at a pressure of not lower than 4 kg/cm.sup.2 in vacuum or in an inert gas. Alternatively, the element may be made of a graphite film obtained from the polymers mentioned above and intercalated with a metal halide. The intercalated films are readily bonded by pressing in the form of a thick sheet or block. Still alternatively, the graphite films and the intercalated films may be superposed alternately and bonded by pressing, or the intercalated films may be sandwiched between the graphite films and bonded together to form a thick sheet or block. The optical element has application as a lens, monochromater, filter or analyzer for radiations.

公开(公告)号：US4870648A

公开(公告)日：1989-09-26

申请号：US82468

申请日：1987-08-07

Applicant: Natale M. Ceglio ,  Daniel S. Stearns ,  Andrew M. Hawryluk ,  Troy W. Barbee, Jr.

Inventor： Natale M. Ceglio ,  Daniel S. Stearns ,  Andrew M. Hawryluk ,  Troy W. Barbee, Jr.

IPC: G21K1/06 ,  H01S4/00 ,  H01S5/028

CPC classification number: B82Y10/00 ,  G21K1/062 ,  H01S4/00 ,  H01S5/028 ,  G21K2201/061 ,  G21K2201/067

Abstract: An x-ray beamsplitter which splits an x-ray beam into two coherent parts by reflecting and transmitting some fraction of an incident beam has applications for x-ray interferometry, x-ray holography, x-ray beam manipulation, and x-ray laser cavity output couplers. The beamsplitter is formed of a wavelength selective multilayer thin film supported by a very thin x-ray transparent membrane. The beamsplitter resonantly transmits and reflects x-rays through thin film interference effects. A thin film is formed of 5-50 pairs of alternate Mo/Si layers with a period of 20-250 A. The support membrane is 10-200 nm of silicon nitride or boron nitride. The multilayer/support membrane structure is formed across a window in a substrate by first forming the structure on a solid substrate and then forming a window in the substrate to leave a free-standing structure over the window.

Abstract translation: 通过反射和透射入射光束的一部分将X射线束分成两个相干部分的x射线分束器具有x射线干涉测量，x射线全息术，x射线束操纵和x射线激光器的应用 腔输出耦合器。 分束器由非常薄的x射线透明膜支撑的波长选择性多层薄膜形成。 分束器通过薄膜干涉效应共振透射和反射x射线。 薄膜由5-50对间隔20〜250A的Mo / Si层组成。支撑膜为氮化硅或氮化硼的10-200nm。 多层/支撑膜结构通过首先在固体基底上形成结构，然后在基底中形成窗口以在窗口上留下独立的结构，跨越基底中的窗口形成。