公开(公告)号：US20130243164A1

公开(公告)日：2013-09-19

申请号：US13785178

申请日：2013-03-05

Applicant: CANON KABUSHIKI KAISHA

Inventor： Naoya Iizuka ,  Mitsuaki Amemiya ,  Akira Miyake

IPC: G21K1/06

CPC classification number: G21K1/062 ,  G21K1/06 ,  G21K1/067 ,  G21K2201/064

Abstract: The present invention provides a method of adjusting an X-ray optical apparatus which includes: an X-ray source; and a reflective structure where at least three reflective substrate arranged with an interval and X-rays which are incident into a plurality of passages whose both sides are put between the reflective substrates are reflected and parallelized by the reflective substrate at both sides of each passage to be emitted from the passage. When one edge of the reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet side is larger than a pitch at the inlet side. The method comprises adjusting the relative positions of the X-ray source and the reflective structure so as to reduce a penumbra amount formed by the X-ray emitted from each of the passages.

Abstract translation: 本发明提供一种调整X射线光学装置的方法，其包括：X射线源; 以及反射结构，其中以间隔布置的至少三个反射基板和入射到其两侧放置在反射基板之间的多个通道的X射线被每个通道两侧的反射基板反射和平行 从通道排出。 当反射结构的一个边缘是X射线的入口并且另一个边缘是X射线的出口时，出口侧的反射基板的间距大于入口侧的间距。 该方法包括调整X射线源和反射结构的相对位置，以便减少由每个通道发射的X射线形成的半影数量。

公开(公告)号：US08537967B2

公开(公告)日：2013-09-17

申请号：US12879922

申请日：2010-09-10

Applicant: Gerald Todd Seidler

Inventor： Gerald Todd Seidler

IPC: G01N23/223 ,  G01N23/20 ,  G01T1/36 ,  G21K1/06

CPC classification number: G21K1/062 ,  B33Y80/00 ,  B82Y10/00 ,  G01N23/2076 ,  G02B5/0891 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: A spectrometer includes a rigid body having a first planar face with an orientation and a second planar face with a different orientation than the first planar face. The first and second planar faces are configured to position Bragg diffraction elements, and the orientation of the first planar face and the different orientation of the second planar face are arranged to convey a predetermined spectral range of the electromagnetic radiation to non-overlapping regions of the sensor location via the diffraction elements.

Abstract translation: 光谱仪包括具有具有取向的第一平面和具有不同于第一平面的取向的第二平面的刚体。 第一和第二平面被配置为布置布拉格衍射元件，并且第一平面的取向和第二平面的不同取向被布置成将电磁辐射的预定光谱范围传送到非重叠区域 通过衍射元件的传感器位置。

公开(公告)号：US20130195254A1

公开(公告)日：2013-08-01

申请号：US13491969

申请日：2012-06-08

Applicant: Sungyoul CHOI ,  Yoon Ho Song ,  Jin Woo Jeong ,  Jun Tae Kang ,  Jae-woo Kim

Inventor： Sungyoul CHOI ,  Yoon Ho Song ,  Jin Woo Jeong ,  Jun Tae Kang ,  Jae-woo Kim

IPC: G21K3/00

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064

Abstract: An X-ray control unit using a monocrystalline material which controls only a specific wavelength of X-rays, by using the monocrystalline material as a filter. The X-ray control unit includes a light source configured to generate X-rays, an X-ray control filter formed of a monocrystalline material having grown in one direction and configured to filter the X-rays generated by the light source to reflect and transmit characteristic X-rays, and an adjustor configured to adjust the light source and the X-ray control filter to arbitrary angles. Since X-rays having a specific wavelength can be selectively used by using a filter, the X-rays can be easily controlled and their intensity can be easily regulated. A characteristic line of the X-rays can be controlled and their intensity can be regulated without directly controlling an X-ray source.

Abstract translation: 通过使用单晶材料作为过滤器，使用仅控制特定波长的X射线的单晶材料的X射线控制单元。 X射线控制单元包括被配置为产生X射线的光源，由单一晶体材料形成的X射线控制滤波器，该单晶材料在一个方向上生长并且被​​配置为滤除由光源产生的X射线以反射和透射 特征X射线，以及被配置为将光源和X射线控制滤波器调整到任意角度的调节器。 由于可以通过使用滤波器来选择性地使用具有特定波长的X射线，因此可以容易地控制X射线，并且可以容易地调节其强度。 可以控制X射线的特征线，并且可以在不直接控制X射线源的情况下调节其强度。

公开(公告)号：US20130114157A1

公开(公告)日：2013-05-09

申请号：US13373125

申请日：2011-11-04

Applicant: Alex K. Deyhim

Inventor： Alex K. Deyhim

IPC: G02B7/182

CPC classification number: G02B7/182 ,  G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: In this paper we will describe the design of a silicon mirror system. The mirror system consists of five primary subcomponents. The mirror optic itself, its positioning system, the bending mechanism, a vacuum chamber, and the support structure all provided as an integrated package. All subsystems were designed to provide the highest positional stability and structural rigidity with precision motions on all axes.

Abstract translation: 在本文中，我们将介绍硅镜系统的设计。 镜像系统由五个主要子组件组成。 镜面光学器件本身，其定位系统，弯曲机构，真空室和支撑结构都作为集成封装提供。 所有子系统都设计为提供最高的位置稳定性和结构刚度，并在所有轴上进行精确运动。

公开(公告)号：US08411815B2

公开(公告)日：2013-04-02

申请号：US12734829

申请日：2009-01-28

Applicant: Ian Wallhead ,  Fabio Zocchi

Inventor： Ian Wallhead ,  Fabio Zocchi

IPC: H05G2/00 ,  G21K5/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003

Abstract: Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs and LPP sources are also disclosed. A laser beam is directed along the collector axis to a fuel target to form the LPP source, and the collector is arranged to collect the radiation and reflect it to an intermediate focus. The collector may include one or more grazing-incidence mirrors, and these mirrors may be electroformed. lithography systems that employ the source-collector systems as disclosed herein.

Abstract translation: 公开了用于极紫外（EUV）和X射线辐射源的掠入射收集器（GIC），例如激光产生的等离子体（LPP）源。 还公开了包括GIC和LPP源的源收集器系统。 激光束沿着收集器轴线引导到燃料靶以形成LPP源，并且收集器被布置成收集辐射并将其反射到中间焦点。 收集器可以包括一个或多个掠入射镜，并且这些反射镜可以被电铸。 使用如本文所公开的源极 - 收集器系统的光刻系统。

公开(公告)号：US08345822B2

公开(公告)日：2013-01-01

申请号：US12926607

申请日：2010-11-30

Applicant: Christoph Ollinger

Inventor： Christoph Ollinger

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/064

Abstract: An X-ray optical configuration (1), comprising a position for an X-ray source (2), a position for a sample (3), a first focusing element (4) for directing X-ray radiation from the position of the X-ray source (2) via an intermediate focus (5) onto the position of the sample (3), and an X-ray detector (6) that can be moved on a circular arc (7) of radius R around the position of the sample (3), is characterized in that the configuration also comprises a second focusing element (8) for directing part of the X-ray radiation emanating from the intermediate focus (5) onto the position of the sample (3), and an aperture system (9) for selecting between illumination of the position of the sample (3) exclusively and directly from the intermediate focus (5) (=first optical path (10′)), or exclusively via the second focusing element (8) (=second optical path (10″)). The configuration facilitates changing between reflection geometry and transmission geometry, in particular, wherein modification and adjustment devices are minimized or unnecessary.

Abstract translation: 一种X射线光学配置（1），包括用于X射线源（2）的位置，用于样本的位置（3），用于从X射线源的位置引导X射线辐射的第一聚焦元件（4） X射线源（2）经由中间焦点（5）到样品（3）的位置，以及X射线检测器（6），其可以在半径为R的圆弧（7）周围位置 样品（3）的特征在于，该构造还包括用于将从中间焦点（5）发出的X射线辐射的一部分引导到样品（3）的位置的第二聚焦元件（8），以及 一个光圈系统（9），用于选择专用于和直接来自中间聚焦（5）（=第一光路（10'））的样品（3）的位置的照明，或仅通过第二聚焦元件（8） （=第二光路（10“））。 该配置便于在反射几何形状和透射几何之间进行改变，特别地，其中修改和调节装置被最小化或不必要。

公开(公告)号：US08345223B2

公开(公告)日：2013-01-01

申请号：US12919741

申请日：2009-02-24

Applicant: Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

Inventor： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

IPC: G03B27/54 ,  G03B27/42 ,  G02B27/14

CPC classification number: G02B5/208 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/22 ,  G02B5/26 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

Abstract translation: 光学元件包括第一层，其包括第一材料，并且被配置为对于第一波长的辐射基本上是反射的，并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层，其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层，其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射的反射从第二层的顶表面 第二层面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。

公开(公告)号：US08311184B2

公开(公告)日：2012-11-13

申请号：US12871484

申请日：2010-08-30

Applicant: Susanne Madeline Lee ,  Peter Michael Edic ,  Forrest Frank Hopkins

Inventor： Susanne Madeline Lee ,  Peter Michael Edic ,  Forrest Frank Hopkins

IPC: G21K1/06

CPC classification number: G21K1/062 ,  A61B6/032 ,  A61B6/4021 ,  A61B6/4078 ,  A61B6/482 ,  B82Y10/00 ,  G21K2201/064

Abstract: An X-ray imaging system that produces one or more fan-shaped beams is described. The system includes a target for emitting X rays that includes at least one target focal spot, and one or more graded multilayer optic devices in optical communication with the target. The optics transmits at least a portion of the source X rays to produce the one or more fan-shaped beams. The graded multilayer optic devices include at least a first graded multilayer section for redirecting and transmitting X rays through total internal reflection. The graded multilayer section includes a high-index layer of material having a first complex refractive index n1, a low-index layer of material having a second complex refractive index n2, and a grading zone disposed between the high-index and low-index layers of material. The grading zone includes a grading layer having a third complex refractive index n3 such that Re(n1)>Re(n2)>Re(n3).

Abstract translation: 描述了产生一个或多个扇形光束的X射线成像系统。 该系统包括用于发射包括至少一个目标焦点的X射线的目标，以及与目标光学通信的一个或多个渐变多层光学器件。 光学器件透射源X射线的至少一部分以产生一个或多个扇形光束。 分级多层光学器件至少包括用于通过全内反射重定向和透射X射线的第一渐变多层部分。 分级多层部分包括具有第一复折射率n1的材料的高折射率层，具有第二复折射率n2的材料的低折射率层，以及设置在高折射率层和低折射率层之间的分级区 的材料。 分级区域包括具有第三复折射率n3的分级层，使得Re（n1）> Re（n2）> Re（n3）。

公开(公告)号：US08309944B1

公开(公告)日：2012-11-13

申请号：US12240626

申请日：2008-09-29

Applicant: Mikhail V. Gubarev ,  Brian D. Ramsey ,  Darell E. Engelhaupt

Inventor： Mikhail V. Gubarev ,  Brian D. Ramsey ,  Darell E. Engelhaupt

IPC: G02B5/10 ,  G01N23/09 ,  G01N23/222

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B23/06 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/068

Abstract: Neutron optics based on the two-reflection geometries are capable of controlling beams of long wavelength neutrons with low angular divergence. The preferred mirror fabrication technique is a replication process with electroform nickel replication process being preferable. In the preliminary demonstration test an electroform nickel optics gave the neutron current density gain at the focal spot of the mirror at least 8 for neutron wavelengths in the range from 6 to 20 Å. The replication techniques can be also be used to fabricate neutron beam controlling guides.

Abstract translation: 基于双反射几何的中子光学器件能够以较低的角度散度来控制长波长中子束。 优选的镜面制造技术是具有电铸镍复制工艺的复制方法。 在初步示范测试中，电铸镍光学器件在6到20埃的中子波长处给出了镜面焦点处的中子电流密度增益至少为8。 复制技术也可用于制造中子束控制指导。

公开(公告)号：US08264665B2

公开(公告)日：2012-09-11

申请号：US12657650

申请日：2010-01-25

Applicant: John E. Hill ,  Robert J. Munns

Inventor： John E. Hill ,  Robert J. Munns

IPC: G03B27/52 ,  G02B7/02

CPC classification number: G21K1/067 ,  G02B7/1815 ,  G02B7/182 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/70891 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A cooled spider for grazing-incidence collectors includes an outer ring, an inner ring and spokes that mechanically and fluidly connect the inner and outer rings. Cooling channels in the outer and inner rings and in the spokes define a general cooling-fluid flow path through the spider. The general cooling-fluid flow path has input and output points located substantially 180° apart so that the flow path diverges at the input point into two branch flow paths that flow in opposite directions through the spider, and then converge at the output point. Input and output cooling fluid manifolds are fluidly connected to the outer ring at the input and output points and serve to flow cooling fluid over the cooling-fluid flow path.

Abstract translation: 用于放牧收集器的冷却的蜘蛛包括机械地和流体地连接内圈和外圈的外圈，内圈和轮辐。 外环和内环和轮辐中的冷却通道限定通过该蜘蛛的通用冷却液流动路径。 一般的冷却流体流动路径具有大致相距180°的输入和输出点，使得流动路径在输入点处分叉成两个分支流动路径，该分支流动路径沿相反方向流过蜘蛛，然后在输出点处会聚。 输入和输出冷却流体歧管在输入和输出点处流体地连接到外环，并用于使冷却流体流过冷却流体流动路径。