公开(公告)号：US08249220B2

公开(公告)日：2012-08-21

申请号：US12578667

申请日：2009-10-14

Applicant: Boris Verman ,  Yuriy Platonov ,  Licai Jiang

Inventor： Boris Verman ,  Yuriy Platonov ,  Licai Jiang

IPC: G21K1/02

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: An x-ray optical system includes an x-ray source which emits x-rays, a first optical element which conditions the x-rays to form two beams and at least a second optical element which further conditions at least one of the two beams from the first optical element.

Abstract translation: X射线光学系统包括发射x射线的X射线源，调节X射线以形成两个光束的第一光学元件和至少另外将来自两个光束中的至少一个的条件的第二光学元件 第一光学元件。

公开(公告)号：US08229060B2

公开(公告)日：2012-07-24

申请号：US12999637

申请日：2009-06-17

Applicant: Roland Proksa

Inventor： Roland Proksa

IPC: A61B6/00 ,  G06K9/00

CPC classification number: A61B6/4035 ,  A61B6/032 ,  A61B6/4014 ,  A61B6/4042 ,  A61B6/4241 ,  A61B6/481 ,  A61B6/482 ,  A61B6/504 ,  A61B6/507 ,  A61B6/583 ,  G21K2201/062 ,  G21K2201/064

Abstract: The present invention relates to a medical X-ray examination apparatus and method for performing k-edge imaging of an object of interest including material showing k-edge absorption. To allow the use of conventional detector technology, which does not suffer from the limitation to provide very high k-rate capabilities a method is proposed comprising the steps of: —emitting polychromatic X-ray radiation (4; 4a, 4b), —Bragg filtering said polychromatic X-ray radiation by a Bragg filter such that radiation (16) transmitted through said Bragg filter (14; 14a, 14b) passes through said object (5), —detecting X-ray radiation after passing through said object (5), —acquiring projection data at at least two different Bragg reflection angles of said Bragg filter (14; 14a, 14b), and —reconstructing a k-edge image from the acquired projection data.

Abstract translation: 本发明涉及一种医疗X射线检查装置和方法，用于执行感兴趣对象的k边缘成像，包括显示k边缘吸收的材料。 为了允许使用常规检测器技术，其不受限于提供非常高的k率能力的方法，提出了一种方法，其包括以下步骤： - 发射多色X射线辐射（4; 4a，4b），-Bragg 通过布拉格滤波器对所述多色X射线辐射进行滤波，使得穿过所述布拉格滤波器（14; 14a，14b）的辐射（16）穿过所述物体（5）， - 在穿过所述物体（5）之后检测X射线辐射 ）， - 在所述布拉格滤波器（14; 14a，14b）的至少两个不同的布拉格反射角处获取投影数据，并且从所获取的投影数据重新构造k边缘图像。

公开(公告)号：US20120170012A1

公开(公告)日：2012-07-05

申请号：US13332582

申请日：2011-12-21

Applicant: Fumitaro Masaki ,  Akira Miyake

Inventor： Fumitaro Masaki ,  Akira Miyake

IPC: G03B27/70 ,  B05D5/06 ,  C23C14/54 ,  G02B7/185

CPC classification number: G02B5/0816 ,  B82Y10/00 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.

Abstract translation: 一种制造反射镜的方法包括：在基板上布置具有由热变化的层厚度的形状调整层的第一步骤，在形状调整层上布置包括第一层的反射层的第二步骤， 第二层和布置在第一层和第二层之间的阻挡层，并且防止第一层的材料和第二层的材料的扩散，以及使反射形状的第三步骤 通过在第二步骤之后改变形状调整层的层厚度轮廓，接近目标形状的层，第三步骤包括部分退火形状调节层的过程。

公开(公告)号：US08208602B2

公开(公告)日：2012-06-26

申请号：US12710064

申请日：2010-02-22

Applicant: Susanne Madeline Lee ,  Peter Michael Edic ,  Vanita Mani ,  Forrest Frank Hopkins ,  Eberhard Neuser

Inventor： Susanne Madeline Lee ,  Peter Michael Edic ,  Vanita Mani ,  Forrest Frank Hopkins ,  Eberhard Neuser

IPC: H05G2/00

CPC classification number: G21K1/067 ,  A61N5/1084 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A system for producing at least one high flux photon beam is provided. The system includes two or more photon sources configured to produce photon beams, and at least one first stage optic device coupled to at least one of the photon sources and providing at least one focused photon beam through total internal reflection, wherein at least one of the photon beams and the focused photon beams are combined at a virtual focal spot.

Abstract translation: 提供了一种用于产生至少一个高通量光子束的系统。 该系统包括被配置为产生光子束的两个或更多个光子源，以及耦合到至少一个光子源的至少一个第一级光学器件，并且通过全内反射提供至少一个聚焦光子束，其中至少一个 光子束和聚焦光子束在虚拟焦斑处组合。

公开(公告)号：US20120154775A1

公开(公告)日：2012-06-21

申请号：US13168495

申请日：2011-06-24

Applicant: Michel François Hubert Klaassen

Inventor： Michel François Hubert Klaassen

IPC: G03B27/54 ,  G21K5/04

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G21K2201/064

Abstract: An EUV radiation source comprising a fuel supply configured to deliver droplets of fuel to a plasma formation location, and a collector configured to collect EUV radiation emitted by a plasma at the plasma formation location, wherein the collector has a reflective surface that is a modified ellipsoid shape, the modified ellipsoid shape providing improved intensity uniformity of collected EUV radiation in the far field compared with a perfect ellipsoid shape.

Abstract translation: EUV辐射源包括被配置为将血液液滴输送到等离子体形成位置的燃料供应器，以及收集器，被配置为收集由等离子体形成位置处的等离子体发射的EUV辐射，其中所述收集器具有作为修改椭圆体的反射表面 形状，与完美的椭球形状相比，改进的椭圆体形状提供了远场中收集的EUV辐射的强度均匀性的改进。

公开(公告)号：US20120081266A1

公开(公告)日：2012-04-05

申请号：US13316654

申请日：2011-12-12

Applicant: Curtis E. Graber

Inventor： Curtis E. Graber

IPC: H01Q15/14

CPC classification number: G02B5/10 ,  G02B19/0019 ,  G02B19/0076 ,  G02B27/143 ,  G02B27/30 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/067 ,  H01Q3/02 ,  H01Q5/22 ,  H01Q15/14 ,  H01Q19/027 ,  H01Q19/17 ,  H01Q21/20

Abstract: An EM energy projector incorporates a final stage radiator including a shaped reflecting spike having a forward radiant axis. The shaped spike defines a set of equivalent, discrete input locations, there being a plurality of such locations. The emitters are arranged in a closed line array, and disposed with all of the emitters oriented inwardly toward the forward radiant axis.

Abstract translation: EM能量投影仪包括最终级辐射器，其包括具有前辐射轴的成形反射尖。 形状的尖峰限定了一组等效的离散输入位置，存在多个这样的位置。 发射器被布置成闭合的线阵列，并且被布置成使得所有发射体朝向前辐射轴向内取向。

公开(公告)号：US20110228245A1

公开(公告)日：2011-09-22

申请号：US13046137

申请日：2011-03-11

Applicant: Hans-Juergen Mann

Inventor： Hans-Juergen Mann

IPC: G03B27/70 ,  G02B5/28

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G02B5/0875 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/064

Abstract: For the use in illumination systems and projection exposure apparatuses for UV or EUV lithography, a reflective optical element is provided for a operating wavelength in the ultraviolet to extreme ultraviolet wavelength ranges. The reflective optical element includes a substrate and a reflective surface on the substrate. The multilayer system has layers of at least two alternating materials having different real parts of the refractive index at the operating wavelength. Radiation in the operating wavelength of a certain incident angle bandwidth distribution can impinge on the reflective optical element. The reflective surface includes one or more first portions, in which the layers have alternating materials of a first period thickness. The reflective surface includes one or more additional portions, in which the layers of alternating materials have a first period thickness and at least one additional period thickness. The arrangement of the first and additional portions (A2) across the reflective surface is adapted to the incident angle bandwidth distribution. Furthermore, a projection system and a projection exposure apparatus including such a reflective optical element are suggested.

Abstract translation: 对于在用于UV或EUV光刻的照明系统和投影曝光装置中的用途，提供反射光学元件用于在紫外至极紫外波长范围内的工作波长。 反射型光学元件包括衬底和衬底上的反射表面。 多层系统具有在工作波长处具有不同实际折射率部分的至少两种交替材料的层。 一定入射角度带宽分布的工作波长的辐射可以撞击在反射光学元件上。 反射表面包括一个或多个第一部分，其中层具有第一周期厚度的交替材料。 反射表面包括一个或多个附加部分，其中交替材料层具有第一周期厚度和至少一个附加周期厚度。 穿过反射表面的第一和附加部分（A2）的布置适于入射角度带宽分布。 此外，提出了包括这种反射光学元件的投影系统和投影曝光装置。

公开(公告)号：US07964858B2

公开(公告)日：2011-06-21

申请号：US12255609

申请日：2008-10-21

Applicant: Yao-Hung Yang ,  Tuan Anh Nguyen ,  Sanjeev Baluja ,  Andrzej Kaszuba ,  Juan Carlos Rocha ,  Thomas Nowak ,  Dustin W. Ho

Inventor： Yao-Hung Yang ,  Tuan Anh Nguyen ,  Sanjeev Baluja ,  Andrzej Kaszuba ,  Juan Carlos Rocha ,  Thomas Nowak ,  Dustin W. Ho

IPC: G01N21/33 ,  B01J19/08 ,  B29C35/08

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.

Abstract translation: 用于紫外灯的反射器可用于基板处理装置。 反射器包括延伸紫外灯长度的纵向条。 纵向条具有弯曲的反射表面，并且包括多个通孔以将冷却剂气体引向紫外线灯。 还描述了使用具有反射器的紫外线灯模块的室以及紫外线处理方法。

公开(公告)号：US20110110499A1

公开(公告)日：2011-05-12

申请号：US13008866

申请日：2011-01-18

Applicant: Kazuhisa MITSUDA ,  Manabu ISHIDA ,  Yuichiro EZOE ,  Kazuo NAKAJIMA

Inventor： Kazuhisa MITSUDA ,  Manabu ISHIDA ,  Yuichiro EZOE ,  Kazuo NAKAJIMA

IPC: G21K1/06 ,  B29D11/00

CPC classification number: G21K1/067 ,  G21K2201/062 ,  G21K2201/064

Abstract: Provided is a technique for X-ray reflection, such as an X-ray reflecting mirror, capable of achieving a high degree of smoothness of a reflecting surface, high focusing (reflecting) performance, stability in a curved surface shape, and a reduction in overall weight. A silicon plate (silicon wafer) is subjected to thermal plastic deformation to form an X-ray reflecting mirror having a reflecting surface with a stable curved surface shape. The silicon wafer can be deformed to any shape by applying a pressure thereto in a hydrogen atmosphere at a high temperature of about 1300° C. The silicon plate may be simultaneously subjected to hydrogen annealing to further reduce roughness of a silicon surface to thereby provide enhanced reflectance.

Abstract translation: 提供了能够实现反射面的高度平滑度，高聚焦（反射）性能，曲面形状的稳定性以及缩小的X射线反射技术，例如X射线反射镜 总重。 硅板（硅晶片）经受热塑性变形，形成具有稳定曲面形状的反射面的X射线反射镜。 硅晶片可以通过在约1300℃的高温下在氢气氛中施加压力而变形为任何形状。硅板可以同时进行氢退火以进一步降低硅表面的粗糙度，从而提供增强的 反射率。

公开(公告)号：US20100303199A1

公开(公告)日：2010-12-02

申请号：US12734829

申请日：2009-01-28

Applicant: Ian Wallhead ,  Fabio Zocchi

Inventor： Ian Wallhead ,  Fabio Zocchi

IPC: H05G2/00 ,  G21K5/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003

Abstract: Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs and LPP sources are also disclosed. A laser beam is directed along the collector axis to a fuel target to form the LPP source, and the collector is arranged to collect the radiation and reflect it to an intermediate focus. The collector may include one or more grazing-incidence mirrors, and these mirrors may be electroformed. lithography systems that employ the source-collector systems as disclosed herein.

Abstract translation: 公开了用于极紫外（EUV）和X射线辐射源的掠入射收集器（GIC），例如激光产生的等离子体（LPP）源。 还公开了包括GIC和LPP源的源收集器系统。 激光束沿着收集器轴线引导到燃料靶以形成LPP源，并且收集器被布置成收集辐射并将其反射到中间焦点。 收集器可以包括一个或多个掠入射镜，并且这些反射镜可以被电铸。 使用如本文所公开的源极 - 收集器系统的光刻系统。