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公开(公告)号：US11556853B2
公开(公告)日：2023-01-17
申请号：US16857384
申请日：2020-04-24
Applicant: TOKYO ELECTRON LIMITED
Inventor： Yuki Kataoka , Takehito Watanabe
Abstract: There is provided a learning method. The method includes performing preprocessing on light emission data in a chamber of a plasma processing apparatus, setting a constraint for generating a regression equation representing a relationship between an etching rate of the plasma processing apparatus and the light emission data, selecting a learning target wavelength from the light emission data subjected to the preprocessing, and receiving selection of other sensor data different from the light emission data. The method further includes generating a regression equation based on the set constraint while using, as learning data, the selected wavelength, the received other sensor data, and the etching rate, and outputting the generated regression equation.
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公开(公告)号：US11553844B2
公开(公告)日：2023-01-17
申请号：US17062989
申请日：2020-10-05
Applicant: East Carolina University
Inventor： Thomas Bruce Ferguson, Jr. , Sunghan Kim , William Hempstead , Cheng Chen
Abstract: Methods for calculating a MetaKG signal are provided. The method including illuminating a region of interest in a sample with a near-infrared (NIR) light source and/or a visible light source. The region of interest includes a sample portion and background portion, each having a different set of optical characteristics. Images of the region of interest are acquired and processed to obtain metadata associated with the acquired images. MetaKG signals are calculated for the region of interest and for the background. The MetaKG signal for the background is used to adjust the MetaKG signal for the region of interest to provide a final adjusted MetaKG signal for the region of interest.
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183.发明申请公开(公告)号：US20230008686A1
公开(公告)日：2023-01-12
申请号：US17561276
申请日：2021-12-23
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sungil Choi , Yeeun Park , Kyungbeom Kim , Sungyoon Ryu , Jinwoo Ahn , Sunhong Jun
Abstract: An inspection system includes a main support die configured to receive a target specimen; an auxiliary support die adjacent to the main support die and configured to receive a reference specimen; a cleaning device configured to remove contaminants from the reference specimen; an objective lens unit configured to direct light to main support die from a light source adjacent to the objective lens unit; a spectroscope between the objective lens unit and the light source; a detector adjacent to the objective lens unit; an imaging device between the objective lens unit and the detector; and a computer system in communication with the detector.
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公开(公告)号：US20220413275A1
公开(公告)日：2022-12-29
申请号：US17756226
申请日：2020-11-20
Applicant: SONY GROUP CORPORATION
Inventor： TETSURO KUWAYAMA , HIROKAZU TATSUTA , GAKUJI HASHIMOTO
Abstract: A microscope device includes an opening (31) that includes a first slit and a second slit through which a plurality of pieces of light from an observation target resulting from a plurality of pieces of irradiation light emitted to the observation target and having different wavelengths pass, a dispersion element that wavelength-disperses the plurality of pieces of light passing through the opening (31), and an imaging element (32) that receives the plurality of pieces of light wavelength-dispersed by the dispersion element. The imaging element (32) performs light reception so that, as for the plurality of pieces of light wavelength-dispersed, zeroth-order light of light passing through the second slit and first-order light of light passing through the first slit do not overlap with each other.
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公开(公告)号：US11506539B2
公开(公告)日：2022-11-22
申请号：US17134878
申请日：2020-12-28
Applicant: SEIKO EPSON CORPORATION
Inventor： Takashi Toya
Abstract: Provided is a measurement device including a spectroscope, a movement mechanism configured to relatively move the spectroscope along a first direction with respect to the measurement target, and one or more processors configured to execute detecting a measurement error indicating that spectroscopic measurement processing by the spectroscope is not executed normally, and controlling the spectroscope and the movement mechanism, in which the one or more processors, when the measurement target is a plurality of color patches arranged along the first direction, cause the spectroscope to execute first measurement processing of measuring light with a specific wavelength set in advance while relatively moving the spectroscope in the first direction to acquire a measured value with respect to the specific wavelength obtained by the first measurement processing and a position of the spectroscope, and when the measurement error is detected, move the spectroscope to a position where an amount of variation of the measured value is greater than or equal to a threshold value in a second direction opposite to the first direction and then move the spectroscope in the first direction.
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Patent Agency Ranking
公开(公告)号：US11506538B2
公开(公告)日：2022-11-22
申请号：US16551935
申请日：2019-08-27
Inventor： Benjamin Gallinet , Giorgio Quaranta , Guillaume Basset
Abstract: A nano-structured optical wavelength transmission filter is provided. The optical filter includes a patterned substrate on which a high refractive index dielectric waveguide is arranged. A low index dielectric layer is arranged on the high refractive index dielectric waveguide, on which an array of metallic nanostructures is arranged. The layers of the optical filter have conformal shapes defined by a patterned surface of the substrate. An optical filter system includes the optical transmission filter and a detector array fixed to the substrate. A spectrometer includes at least one optical transmission filter and/or at least one said optical transmission filter system, and has a spectral resolution of lower than 30 nm for incident light having a wavelength between 300 nm and 790 nm. A method of fabrication of an optical filter, an optical filter system and a spectrometer is also described.
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公开(公告)号：US20220357204A1
公开(公告)日：2022-11-10
申请号：US17621440
申请日：2020-08-11
Applicant: AMS AG
Inventor： Frederic Roger , Troy Chesler
Abstract: An apparatus includes an integrated sensor module for detection of chemical substances. The sensor module includes a UV radiation source operable to emit UV radiation onto a sample. The sensor module also includes a sensor including dedicated channels disposed so as receive UV radiation reflected by the sample. Each of the channels is selectively sensitive to a different respective portion of the UV spectrum; collectively, the channels cover at least part of the UV spectrum sufficient for reconstruction of a spectral curve of the sample. An electronic control unit can be used to identify a composition of the sample based on signals from the channels.
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公开(公告)号：US20220349752A1
公开(公告)日：2022-11-03
申请号：US17856660
申请日：2022-07-01
Applicant: KLA Corporation
Inventor： Tianhan Wang , Aaron Rosenberg , Dawei Hu , Alexander Kuznetsov , Manh Dang Nguyen , Stilian Pandev , John Lesoine , Qiang Zhao , Liequan Lee , Houssam Chouaib , Ming Di , Torsten R. Kaack , Andrei V. Shchegrov , Zhengquan Tan
Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.
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公开(公告)号：US20220345835A1
公开(公告)日：2022-10-27
申请号：US17811759
申请日：2022-07-11
Applicant: Starkey Laboratories, Inc.
Inventor： Peter Flanagan , Kyle Olson , Michael Karl Sacha , Andy S. Lin , Fa Wang
Abstract: A system may have a rechargeable hearing instrument with a power source, an ultraviolet (UV) sensor configured to convert received UV light into electrical power and charging circuitry coupled to the UV sensor and to the power source. The charging circuitry may use the electrical power to charge the power source. A charger may have a charging cavity configured to receive the rechargeable hearing instrument. A power source within the charger powers a UV light source located within the charger configured to provide UV light to the UV sensor of the rechargeable hearing instrument when the rechargeable hearing instrument is placed within the charging cavity.
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公开(公告)号：US20220341782A1
公开(公告)日：2022-10-27
申请号：US17855313
申请日：2022-06-30
Applicant: HUAWEI TECHNOLOGIES CO., LTD.
Inventor： Youming ZHANG , Lifeng SUN
IPC: G01J3/28 , H01L27/146
Abstract: An image sensor includes an array of metasurface structures and an array of optical-to-electrical conversion units. The array of metasurface structures is located above the array of optical-to-electrical conversion units. A first optical-to-electrical conversion unit in the array of optical-to-electrical conversion units includes a plurality of optical-to-electrical conversion elements, each optical-to-electrical conversion element in the first optical-to-electrical conversion unit corresponds to one frequency band in a spectrum. A first metasurface structure in the array of metasurface structures includes a first substrate and a microstructure located above the first substrate. The first substrate and the microstructure are configured to transmit an optical signal at each frequency band to an optical-to-electrical conversion element corresponding to each frequency band. The microstructure is a rotationally symmetric structure, and a rotation angle of the rotationally symmetric structure is less than or equal to 90 degrees.
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