公开(公告)号：US20240339797A1

公开(公告)日：2024-10-10

申请号：US18746278

申请日：2024-06-18

Applicant: Gigaphoton Inc.

Inventor： Yoichi SASAKI ,  Hiroshi UMEDA ,  Jeffrey P. SERCEL ,  Michael von DADELSZEN

IPC: H01S3/038 ,  G03F7/00

CPC classification number: H01S3/038 ,  G03F7/70025

Abstract: A gas laser device includes a laser chamber including an opening, an electrical insulating portion blocking the opening, a first electrode, and a second electrode facing the first electrode. The first electrode includes a contact region contacting the surface of the electrical insulating portion, an opposing surface facing the second electrode, and a first curved surface included in a region between the contact region and the opposing surface and convexly curved toward an outer side of the first electrode. In a cross section of the first electrode along a surface extending in a separation direction of the first electrode and the second electrode, the contact region is located on an inner side of the first electrode with respect to the first curved surface, and the first curved surface is a part of a circumference of a circle or an ellipse which does not intersect the electrical insulating portion.

公开(公告)号：US12072507B2

公开(公告)日：2024-08-27

申请号：US16855554

申请日：2020-04-22

Applicant: Gigaphoton Inc. ,  KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION

Inventor： Osamu Wakabayashi ,  Hiroshi Ikenoue ,  Hiroaki Oizumi

IPC: G02B27/09 ,  B23K26/064 ,  B23K26/073 ,  B23K26/08 ,  B23K26/082 ,  B23K26/352 ,  C23C14/18 ,  C23C14/48 ,  C23C14/54 ,  G02B27/14 ,  H01L21/268 ,  H01L21/67 ,  H01S3/00 ,  H01L21/04 ,  H01L29/16 ,  H01L29/167 ,  H01S3/034 ,  H01S3/038 ,  H01S3/10 ,  H01S3/225

CPC classification number: G02B27/0933 ,  B23K26/064 ,  B23K26/0732 ,  B23K26/082 ,  B23K26/0876 ,  B23K26/352 ,  C23C14/18 ,  C23C14/48 ,  C23C14/54 ,  G02B27/0961 ,  G02B27/0966 ,  G02B27/14 ,  H01L21/67115 ,  H01S3/005 ,  H01L21/0455 ,  H01L29/1608 ,  H01L29/167 ,  H01S3/034 ,  H01S3/038 ,  H01S3/10069 ,  H01S3/225

Abstract: A laser radiation optical system for laser doping and post-annealing, the laser radiation system including A. a laser apparatus configured to generate pulsed laser light that belongs to an ultraviolet region, B. a stage configured to move a radiation receiving object in an at least one scan direction, the radiation receiving object being an impurity source film containing at least an impurity element as a dopant and formed on a semiconductor substrate, and C. an optical system including a beam homogenizer configured to shape the beam shape of the pulsed laser light into a rectangular shape and generate a beam for laser doping and a beam for post-annealing that differ from each other in terms of a first beam width in the scan direction but have the same second beam width perpendicular to the scan direction.

公开(公告)号：US20240272444A1

公开(公告)日：2024-08-15

申请号：US18636475

申请日：2024-04-16

Applicant: Gigaphoton Inc.

Inventor： Yasufumi KAWASUJI ,  Osamu WAKABAYASHI ,  Akiyoshi SUZUKI

IPC: G02B27/09 ,  B23K26/06 ,  B23K26/0622 ,  B23K26/067 ,  B23K26/324 ,  B23K26/70 ,  B23K101/36 ,  B23K103/00 ,  H01L21/48 ,  H01L23/00

CPC classification number: G02B27/0988 ,  B23K26/0622 ,  B23K26/0648 ,  B23K26/0665 ,  B23K26/067 ,  B23K26/324 ,  B23K26/705 ,  G02B27/0944 ,  H01L21/486 ,  B23K2101/36 ,  B23K2103/42 ,  B23K2103/54 ,  H01L24/16 ,  H01L2224/16227

Abstract: A laser processing system includes a laser apparatus configured to output a pulse laser beam, a divergence adjuster configured to adjust a first beam divergence in a first direction of the pulse laser beam and a second beam divergence in a second direction which intersects the first direction, a measuring instrument configured to measure the first and second beam divergences of the pulse laser beam having passed through the divergence adjuster, a diffractive optical element configured to branch the pulse laser beam having passed through the measuring instrument, and a processor configured to control the divergence adjuster such that the first and second beam divergences approach respective target values based on measurement results of the first and second beam divergences by the measuring instrument.

公开(公告)号：US20240241448A1

公开(公告)日：2024-07-18

申请号：US18531191

申请日：2023-12-06

Applicant: Gigaphoton Inc.

Inventor： Atsushi UEDA

IPC: G03F7/00 ,  H01J37/32

CPC classification number: G03F7/70033 ,  G03F7/7015 ,  G03F7/7095 ,  H01J37/32357 ,  H01J37/32449

Abstract: An extreme ultraviolet light generation chamber device includes a chamber including a plasma generation region in which plasma is generated from a droplet target of tin irradiated with laser light; a gas supply port supplying an etching gas containing hydrogen to the internal space; a cylindrical partition wall surrounding the plasma generation region, and having an opening on the internal space side as an inlet port of a gas and an opening at the outside of the chamber as an exhaust port of the gas; an exhaust device; and a concentrating mirror. The partition wall has an inner circumferential surface on which tin is more likely to be deposited on a downstream side of a predetermined position on a downstream side of the plasma generation region in a flow direction of the gas inside the partition wall than on an upstream side of the predetermined position.

公开(公告)号：US20240184220A1

公开(公告)日：2024-06-06

申请号：US18510706

申请日：2023-11-16

Applicant: Gigaphoton Inc.

Inventor： Yuichi NISHIMURA ,  Yoshifumi UENO ,  Kotaro MIYASHITA

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/706845 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70233 ,  G03F7/70258 ,  G03F7/7065 ,  G03F7/706847 ,  G03F7/706849 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions, and having a geometric centroid located at a position away from the optical axis in a direction toward the EUV light concentrating mirror; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light.

公开(公告)号：US20240160107A1

公开(公告)日：2024-05-16

申请号：US18477089

申请日：2023-09-28

Applicant: Gigaphoton Inc.

Inventor： Yoshiyuki HONDA

IPC: G03F7/00 ,  G21K1/06 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G21K1/06 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet light generation chamber device includes a chamber generating, at an internal space thereof, extreme ultraviolet light by irradiating a droplet target of tin with laser light to turn the droplet target into plasma; a target supply unit supplying the droplet target into the internal space; an extreme ultraviolet light concentrating mirror arranged in the internal space and including a reflection surface which reflects the extreme ultraviolet light; a first etching gas supply unit supplying an etching gas containing a hydrogen gas to the reflection surface having a flow velocity at the reflection surface variable; a data generation unit generating data reflecting reflectance of the extreme ultraviolet concentrating mirror; and a processor controlling the first etching gas supply unit to decrease the flow velocity when the data indicates that an amount of decrease in the reflectance is equal to or more than a reference value.

公开(公告)号：US20240072510A1

公开(公告)日：2024-02-29

申请号：US18505716

申请日：2023-11-09

Applicant: Gigaphoton Inc.

Inventor： Takashi SHIGA

IPC: H01S3/13 ,  G03F7/00 ,  H01S3/10 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/1301 ,  G03F7/70025 ,  G03F7/7055 ,  H01S3/10069 ,  H01S3/225 ,  H01S3/2316

Abstract: A laser device includes a master oscillator configured to output pulse laser light at a first discharge timing synchronized with a repetition frequency; an amplifier configured to amplify the pulse laser light by exciting, with a charge voltage at a second discharge timing, a laser medium through which the pulse laser light passes; and a processor configured to provide a command on the charge voltage to the amplifier based on a charge voltage command value provided from an exposure apparatus, set the second discharge timing by adding a delay time to the first discharge timing, and perform a process of changing the delay time and a process of correcting the charge voltage command value in accordance with a change of the repetition frequency.

公开(公告)号：US20240049378A1

公开(公告)日：2024-02-08

申请号：US18351630

申请日：2023-07-13

Applicant: Gigaphoton Inc.

Inventor： Masaki NAKANO ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G03F7/00

CPC classification number: H05G2/006 ,  H05G2/008 ,  G03F7/70033 ,  G03F7/7065 ,  G03F7/70525

Abstract: An extreme ultraviolet light generation apparatus includes a droplet target generation device and a solid target replenishment device. The droplet target generation device includes a tank configured to melt a solid target substance to generate a liquid target substance, and a nozzle configured to continuously generate a droplet target from the liquid target substance in the tank and output the droplet target toward a plasma generation region to which pulse laser light is concentrated, and is configured to apply a velocity difference between a plurality of droplet targets including the droplet target so that the plurality of droplet targets coalesce. The solid target replenishment device is configured to replenish the tank with a one-time replenishment amount of the solid target substance such that the coalescence of the plurality of droplet targets is completed before the plurality of droplet targets reach the plasma generation region.

公开(公告)号：US20240042544A1

公开(公告)日：2024-02-08

申请号：US18482512

申请日：2023-10-06

Applicant: GIGAPHOTON INC.

Inventor： Takuma YAMANAKA

IPC: B23K26/0622 ,  B23K26/06

CPC classification number: B23K26/0622 ,  B23K26/0643 ,  B23K26/0652 ,  B23K2101/36

Abstract: A laser device includes an oscillator outputting pulse laser light, a wavelength monitor measuring a center wavelength of the pulse laser light, and a processor. The oscillator includes a chamber including discharge electrodes applying a voltage to a laser gas in the chamber, an optical element arranged on an optical path of the pulse laser light, a drive mechanism driving a rotation stage on which the optical element is mounted, a grating, and an output coupling mirror. The processor periodically switches a target value of the center wavelength, controls the center wavelength by outputting a drive command to the drive mechanism to change an incident angle on the grating, and corrects a drive command value of the drive mechanism for outputting the pulse laser light with the same target value in a subsequent cycle based on a deviation between a measurement value of the center wavelength and the target value.

公开(公告)号：US20240027920A1

公开(公告)日：2024-01-25

申请号：US18322131

申请日：2023-05-23

Applicant: GIGAPHOTON INC.

Inventor： Yusuke HOSHINO ,  Yukio WATANABE

IPC: G03F7/20

CPC classification number: G03F7/7065 ,  G03F7/70258 ,  G03F7/70033 ,  H05G2/008

Abstract: An EUV light generation apparatus includes a chamber having internal pressure maintained below atmospheric pressure; a first bellows pipe having one end connected to the chamber; a first cover member which seals the other end under atmospheric pressure; a holder connected to the first cover member and arranged inside the chamber in a state of holding an optical element; a stage mechanism connected to the first cover member outside the chamber and configured to change at least either a position or an angle of the optical element with respect to the EUV light; a fixing member which fixes the stage mechanism to the chamber; and a cancellation mechanism which is connected to the holder to be movable in accordance with change of at least either the position or the angle, and transmits, to the holder, a second load opposite to a first load applied to the first cover member.